An Automated Defect Detection System For Silicon Carbide Wafers
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An Automated Defect Detection System For Silicon Carbide Wafers
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Author : Parag Talekar
language : en
Publisher:
Release Date : 2002
An Automated Defect Detection System For Silicon Carbide Wafers written by Parag Talekar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with categories.
Automatic Localization And Classification Of Silicon Wafer Defects
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Author : Puneet Gupta
language : en
Publisher:
Release Date : 2002
Automatic Localization And Classification Of Silicon Wafer Defects written by Puneet Gupta and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with categories.
In the semiconductor industry, defect detection and classification is the process of automatically determining the location of a defect on a silicon wafer, determining its characteristics and categorizing it in to one of multiple defect classes. Most defect analysis systems proceed by obtaining a rough initial estimate of the defect's location (detection), followed by a more accurate segmentation to obtain precise information about the coordinates and extent of the defect (localization). This information is used to obtain a description of the defect in terms of pre-defined features which are used for classifying the defect. This analysis is required to monitor the distribution of defects during the manufacturing process and infer their cause(s). The ultimate goal is to increase yields by eliminating problems early in the process. In this report, we explore the use of 2-D hidden Markov models for defect localization using a defect-free reference image; investigate the use of beam search for feature selection and develop a new scheme called smart beam search for addressing its limitations; and apply different classifiers (including nearest neighbor, k-nearest neighbor, linear discriminant analysis, and support vector machine) to the defect classiffication problem. We are able to increase the efficiency and accuracy of existing systems through reliable localization, selection of good features, and application of appropriate classiffiers.
Advances In Natural Computation
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Author : Ke Chen
language : en
Publisher: Springer Science & Business Media
Release Date : 2005-08-17
Advances In Natural Computation written by Ke Chen and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-08-17 with Computers categories.
Annotation The three volume set LNCS 3610, LNCS 3611, and LNCS 3612 constitutes the refereed proceedings of the First International Conference on Natural Computation, ICNC 2005, held in Changsha, China, in August 2005 jointly with the Second International Conference on Fuzzy Systems and Knowledge Discovery FSKD 2005 (LNAI volumes 3613 and 3614). The program committee selected 313 carefully revised full papers and 189 short papers for presentation in three volumes from 1887 submissions. The first volume includes all the contributions related to learning algorithms and architectures in neural networks, neurodynamics, statistical neural network models and support vector machines, and other topics in neural network models; cognitive science, neuroscience informatics, bioinformatics, and bio-medical engineering, and neural network applications as communications and computer networks, expert system and informatics, and financial engineering. The second volume concentrates on neural network applications such as pattern recognition and diagnostics, robotics and intelligent control, signal processing and multi-media, and other neural network applications; evolutionary learning, artificial immune systems, evolutionary theory, membrane, molecular, DNA computing, and ant colony systems. The third volume deals with evolutionary methodology, quantum computing, swarm intelligence and intelligent agents; natural computation applications as bioinformatics and bio-medical engineering, robotics and intelligent control, and other applications of natural computation; hardware implementations of natural computation, and fuzzy neural systems as well as soft computing.
Automated Detection Of Wafer Surface Defects By Laser Scanning
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Author : LK. Galbraith
language : en
Publisher:
Release Date : 1983
Automated Detection Of Wafer Surface Defects By Laser Scanning written by LK. Galbraith and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1983 with Automated inspection categories.
Several systems are presently being marketed that automatically detect and map surface defects on unpatterned wafers by means of light scattering. Applications of these wafer inspection systems in process control and incoming inspection are described. Systems based on scanned laser beams, discussed here in detail, have considerably higher dynamic range and give more reproducible results with non-isotropically-scattering defects than systems using television cameras.
Crack Detection In Silicon Wafers Using Shearography
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Author : Ramak Motamedi
language : en
Publisher:
Release Date : 2008
Crack Detection In Silicon Wafers Using Shearography written by Ramak Motamedi and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with categories.
Automated Defect Detection In Textured Materials
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Author : Ajay Kumar Pathak
language : en
Publisher: Open Dissertation Press
Release Date : 2017-01-27
Automated Defect Detection In Textured Materials written by Ajay Kumar Pathak and has been published by Open Dissertation Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-01-27 with categories.
This dissertation, "Automated Defect Detection in Textured Materials" by Ajay Kumar, Pathak, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. DOI: 10.5353/th_b3124222 Subjects: Materials - Texture - Inspection Materials - Defects Engineering inspection - Mathematical models
Context Based Automated Defect Classification System Using Multiple Morphological Masks
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Author :
language : en
Publisher:
Release Date : 2002
Context Based Automated Defect Classification System Using Multiple Morphological Masks written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with categories.
Automatic detection of defects during the fabrication of semiconductor wafers is largely automated, but the classification of those defects is still performed manually by technicians. This invention includes novel digital image analysis techniques that generate unique feature vector descriptions of semiconductor defects as well as classifiers that use these descriptions to automatically categorize the defects into one of a set of pre-defined classes. Feature extraction techniques based on multiple-focus images, multiple-defect mask images, and segmented semiconductor wafer images are used to create unique feature-based descriptions of the semiconductor defects. These feature-based defect descriptions are subsequently classified by a defect classifier into categories that depend on defect characteristics and defect contextual information, that is, the semiconductor process layer(s) with which the defect comes in contact. At the heart of the system is a knowledge database that stores and distributes historical semiconductor wafer and defect data to guide the feature extraction and classification processes. In summary, this invention takes as its input a set of images containing semiconductor defect information, and generates as its output a classification for the defect that describes not only the defect itself, but also the location of that defect with respect to the semiconductor process layers.
Automated Surface Defect Detection Using Line Scan Area Scan Cameras
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Author : M Nacy Somer
language : en
Publisher: LAP Lambert Academic Publishing
Release Date : 2015-05-11
Automated Surface Defect Detection Using Line Scan Area Scan Cameras written by M Nacy Somer and has been published by LAP Lambert Academic Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-05-11 with categories.
Development in industry is an important factor to increasing the production rate and quality inspection time. The automatic inspection vision system gives the real-time inspection for product. This work shows the design of an automatic inspection vision system. The principle work of area scan camera is to compare image capturing with the base image for product surface which already stored in the host-computer. This comparison will decide if the product will pass or will be rejected. The required results then can be implemented by using the Matlab software to compare the images. The accepted and rejected operations are controlled by the microcontroller (PIC16F84A) that regulates the product rejection after the image processing. The principle work of line scan camera is scanning the product surface via multi-line capturing through multi-triggers generated by the encoder. The defect detection is obtained by the difference in the light intensity for the surface of product with defect or not; Where the results are shown graphically by the LabVIEW software. The results of the line scan and the area scan are dependent on the intensity of light reflected from the product surface.
Textural Analysis For Defect Detection In Automated Inspection Systems
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Author : Jenelle Armstrong Piepmeier
language : en
Publisher:
Release Date : 1995
Textural Analysis For Defect Detection In Automated Inspection Systems written by Jenelle Armstrong Piepmeier and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Poultry categories.
Simulation Of Defect Detection Schemes For Wafer Inspection In Vlsi Manufacturing
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Author : Aaron Swecker
language : en
Publisher:
Release Date : 1997
Simulation Of Defect Detection Schemes For Wafer Inspection In Vlsi Manufacturing written by Aaron Swecker and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Fault location (Engineering) categories.
Abstract: "The detection of critical defects on modern VLSI wafers is a challenging and complex problem. Simulation of these critical defects allows for rapid characterization and optimization of in-line detection schemes. In this paper we introduce a 3-D electromagnetic field simulator (METRO 3-D) that calculates the scattering of light from wafer topographies. An approach that allows highly absorptive materials to be investigated is discussed for the three dimensional topography simulator. With this enhancement to the simulator, several defect studies were performed and the results of these studies illustrate the ability of the simulator to model wafer topographies and defects that occur in modern fab lines."