Finite Element Methods For Process Simulation Application To Silicon Oxidation
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Finite Element Methods For Process Simulation Application To Silicon Oxidation
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Author : Pantas Sutardja
language : en
Publisher:
Release Date : 1988
Finite Element Methods For Process Simulation Application To Silicon Oxidation written by Pantas Sutardja and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with CREEP (Computer program) categories.
Finite Elemnt Methods For Process Simulation Application To Silicon Oxidation
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Author : Pantas Sutardja
language : en
Publisher:
Release Date : 1989
Finite Elemnt Methods For Process Simulation Application To Silicon Oxidation written by Pantas Sutardja and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with categories.
Modeling Of Thermal Oxidation And Stress Effects
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Author : Christian Hollauer
language : de
Publisher: Sudwestdeutscher Verlag Fur Hochschulschriften AG
Release Date : 2009
Modeling Of Thermal Oxidation And Stress Effects written by Christian Hollauer and has been published by Sudwestdeutscher Verlag Fur Hochschulschriften AG this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Science categories.
Thermal Oxidation is one of the most important process steps in semiconductor fabrication to produce high quality isolation layers. A chemical reaction converts silicon into silicon dioxide which has more than twice of the original volume. This is the main source for stress and displacements in the oxidized structure. Stress in copper interconnects can be essential for the life time of an integrated circuit, because it can support material transport and lead to void formation. During the fabrication of sensors, where thin film deposition is often used, an intrinsic stress is generated in the layers which can cause unwanted deformation in free standing structures. After an introduction the author describes the advanced oxidation model and shows by means of pictures the verified simulation results. A highlight of this book is the chapter about the Finite Element Method (FEM) which is used to solve the mathematical formulation numerically. In a comprehensible way the author describes how to apply FEM in practice, so that the reader of this book should be able to discretize many other kinds of differential equations and solve them with a computer, which is basic for simulation.
Silicon Oxidation Simulation
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Author : Gabriel Matthew Cuka
language : en
Publisher:
Release Date : 1990
Silicon Oxidation Simulation written by Gabriel Matthew Cuka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with categories.
Memorandum
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Author :
language : en
Publisher:
Release Date : 2002
Memorandum written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Electrical engineering categories.
3 Dimensional Process Simulation
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Author : J. Lorenz
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
3 Dimensional Process Simulation written by J. Lorenz and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Computers categories.
Whereas two-dimensional semiconductor process simulation has achieved a certain degree of maturity, three-dimensional process simulation is a newly emerging field in which most efforts are dedicated to necessary basic developments. Research in this area is promoted by the growing demand to obtain reliable information on device geometries and dopant distributions needed for three-dimensional device simulation, and challenged by the great algorithmic problems caused by moving interfaces and by the requirement to limit computation times and memory requirements. A workshop (Erlangen, September 5, 1995) provided a forum to discuss the industrial needs, technical problems, and solutions being developed in the field of three-dimensional semiconductor process simulation. Invited presentations from leading semiconductor companies and research Centers of Excellence from Japan, the USA, and Europe outlined novel numerical algorithms, physical models, and applications in this rapidly emerging field.
Circuit Device And Process Simulation
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Author : Graham F. Carey
language : en
Publisher:
Release Date : 1996-06-19
Circuit Device And Process Simulation written by Graham F. Carey and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-06-19 with Computers categories.
This book presents for the first time a unified treatment of the physical processes, mathematical models and numerical techniques for circuit, device and process simulation. At the macroscopic level linear and nonlinear circuit elements are introduced to yield a mathematical model of an integrated circuit. Numerical techniques used to solve this coupled system of ODEs are described. Microscopically, current flow within a transistor is modeled using the drift-diffusion and hydrodynamic PDE systems. Finite difference and finite element methods for spatial discretizations are treated, as are grid generation and refinement, upwinding, and multilevel schemes. At the fabrication level, physical processes such as diffusion, oxidation, and crystal growth are modeled using reaction-diffusion-convection equations. These models require multistep integration techniques and Krylov projection methods for successful implementation. Exercises, programming assignments, and an extensive bibliography are included to reinforce and extend the treatment.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Process Modelling And Simulation With Finite Element Methods
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Author : William B. J. Zimmerman
language : en
Publisher:
Release Date : 2004
Process Modelling And Simulation With Finite Element Methods written by William B. J. Zimmerman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Chemical processes categories.
Two Dimensional Oxidation
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Author : Stanford University. Stanford Electronics Laboratories. Integrated Circuits Laboratory
language : en
Publisher:
Release Date : 1983
Two Dimensional Oxidation written by Stanford University. Stanford Electronics Laboratories. Integrated Circuits Laboratory and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1983 with Crystal growth categories.