Low Temperature Polysilicon Thin Film Transistors In Advanced Display Technologies
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Low Temperature Polysilicon Thin Film Transistors In Advanced Display Technologies
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Author :
language : en
Publisher:
Release Date : 2000
Low Temperature Polysilicon Thin Film Transistors In Advanced Display Technologies written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with categories.
In this final project report, we detail the work completed in developing a polysilicon thin film transistor (TFT) technology that was successfully applied in fabricating a working VGA Active Matrix Organic Light Emitting Diode (AMOLED) display prototype. Using the high throughput, low cost method of Rapid Thermal Processing (RTP), we achieved glass compatible crystallization temperatures of polysilicon. We identify that RTP results in superior TFT performance uniformity, which is critical for fabrication of AMOLEDs. We successfully developed and integrated novel microelectronic processes and techniques while fabricating AMOLED displays, culminating in the demonstration of a VGA AMOLED prototype display operated at a brightness of 101 nits. Using our high throughput, low cost process polysilicon TFT technology, we fabricated display driver circuits, including low temperature shift registers that run at clock frequencies as high as 20 MHz. Finally, several processing issues that were investigated in order to improve the performance of AMOLED displays are described. This includes work on low temperature silicides for TFTs, a novel hillock-free aluminum metallization, and the ability of this aluminum metallization to form ohmic contacts to indium tin oxide.
Polycrystalline Silicon For Integrated Circuits And Displays
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Author : Ted Kamins
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Polycrystalline Silicon For Integrated Circuits And Displays written by Ted Kamins and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians working with polycrystalline silicon in the integrated circuit and display industries.
Thin Film Materials For Large Area Electronics
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Author : B. Equer
language : en
Publisher: Elsevier Science Limited
Release Date : 1999
Thin Film Materials For Large Area Electronics written by B. Equer and has been published by Elsevier Science Limited this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.
The symposium brought together more than a hundred attendees from many countries including a significant participation from Japan and other East-Asia countries. Many of the trends observed in the 1st Symposium held in 1996 were confirmed: displays are indeed the main application in LAE (photovoltaics were not included in the topics of this symposium) and active matrix display (AMLCD) is still the leading technology. Future AMLCDs integrating the display drivers onto the same substrate require much faster thin-film transistors (TFTs) than those used for LCD addressing, therefore putting a strong demand on polysilicon performances. As a consequence the quest for an improved low temperature, large area (and low cost) polysilicon process is intensive and the competitors, including direct plasma deposition and excimer laser crystallization of amorphous layers, are reporting significant steps forward. With the tremendous demand for efficient colour flat panel displays, other display technologies are gaining interest. Field emission display (FED) is one of them. FEDs based on amorphous tetrahedral carbon thin-films are stimulating intensive studies on the optoelectronic properties of this complex material. Large area pixellized sensors for x-ray radiography and document scanning is another field of application in LAE which has recently reached initial production. Using a TFT or diode pixel addressing similar to AMLCD, this kind of device benefits from most of the AMLCD technology. However these devices present an increased complexity and stringent specifications on noise which in turn means materials with improved electronic transport properties. Finally, LAE is a fast developing area in thin-film research and technology. Initially an all-silicon domain, it now involves a large range of thin-film semiconductors and dielectrics, whose properties need to be fully understood and for which flexible and efficient processes have still to be developed.
Bridged Grain Small Grain Low Temperature Polycrystalline Silicon Thin Film Transistors For Active Matrix Displays
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Author : Wei Zhou
language : en
Publisher:
Release Date : 2013
Bridged Grain Small Grain Low Temperature Polycrystalline Silicon Thin Film Transistors For Active Matrix Displays written by Wei Zhou and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with Electroluminescent display systems categories.
Thin Film Transistor Technologies Tftt Vii
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Author : Yue Kuo
language : en
Publisher: The Electrochemical Society
Release Date : 2005
Thin Film Transistor Technologies Tftt Vii written by Yue Kuo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Proceedings Of The Second Symposium On Thin Film Transistor Technologies
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Author : Yue Kuo
language : en
Publisher: The Electrochemical Society
Release Date : 1995
Proceedings Of The Second Symposium On Thin Film Transistor Technologies written by Yue Kuo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Technology & Engineering categories.
Thin Film Transistors Polycrystalline Silicon Thin Film Transistors
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Author : Yue Kuo
language : en
Publisher: Springer Science & Business Media
Release Date : 2004
Thin Film Transistors Polycrystalline Silicon Thin Film Transistors written by Yue Kuo and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Thin film transistors categories.
This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Thin Film Transistor Technologies Vi
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Author : Yue Kuo
language : en
Publisher: The Electrochemical Society
Release Date : 2003
Thin Film Transistor Technologies Vi written by Yue Kuo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Thin film transistors categories.
Polycrystalline Silicon For Integrated Circuits And Displays
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Author : Theodore Kamins
language : en
Publisher: Springer
Release Date : 1998-07-31
Polycrystalline Silicon For Integrated Circuits And Displays written by Theodore Kamins and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-07-31 with Technology & Engineering categories.
Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians working with polycrystalline silicon in the integrated circuit and display industries.
Thin Film Transistor Technologies
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Author : Yue Kuo
language : en
Publisher: The Electrochemical Society
Release Date : 1999
Thin Film Transistor Technologies written by Yue Kuo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.