Manufacturing In Process Control And Measuring Techniques For Semiconductors
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Manufacturing In Process Control And Measuring Techniques For Semiconductors
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Author :
language : en
Publisher:
Release Date : 1966*
Manufacturing In Process Control And Measuring Techniques For Semiconductors written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1966* with Electronic measurements categories.
Describes nondestructive measurement techniques for modern semiconductor processes and the application of these techniques to provide meaninful information about final electrical characteristics and quality. Cf. Foreword.
Manufacturing In Process Control And Measuring Techniques For Semiconductors
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Author :
language : en
Publisher:
Release Date : 1966
Manufacturing In Process Control And Measuring Techniques For Semiconductors written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1966 with Electronic measurements categories.
Describes nondestructive measurement techniques for modern semiconductor processes and the application of these techniques to provide meaninful information about final electrical characteristics and quality. Cf. Foreword.
Fundamentals Of Semiconductor Manufacturing And Process Control
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Author : Gary S. May
language : en
Publisher: John Wiley & Sons
Release Date : 2006-05-26
Fundamentals Of Semiconductor Manufacturing And Process Control written by Gary S. May and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-05-26 with Technology & Engineering categories.
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Symposium On Manufacturing In Process Control And Measuring Techniques For Semiconductors
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Author : Air Force Materials Laboratory. Manufacturing Technology Division
language : en
Publisher:
Release Date : 1971
Symposium On Manufacturing In Process Control And Measuring Techniques For Semiconductors written by Air Force Materials Laboratory. Manufacturing Technology Division and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1971 with categories.
Symposium On Manufacturing In Process Control And Measuring Techniques For Semiconductors
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Author : Eugene H. Miller
language : en
Publisher:
Release Date : 1966*
Symposium On Manufacturing In Process Control And Measuring Techniques For Semiconductors written by Eugene H. Miller and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1966* with Semiconductors categories.
Manufacturing In Process Control And Measuring Techniques For Integral Electronics
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Author : Roger J. Bourdelais
language : en
Publisher:
Release Date : 1965
Manufacturing In Process Control And Measuring Techniques For Integral Electronics written by Roger J. Bourdelais and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1965 with categories.
This report describes a manufacturing methods program which is designed to apply a microscope-television camera-logic circuitry system to specific optical measurement problems for the in-process control of deposited films and the surfaces of semiconductor devices. The goal of this program was to design a system of this type that would provide a more accurate and/or more economic measurement than is presently available. The result of the program was the development of a system that counted the number of imperfections seen in a microscope's field of view. The surface imperfections were pits, mounds, haze, and scratches. The evaluation of the imperfection counter showed that quantitative data on surface imperfections could be available. Also, the importance of the imperfections on yield could be objectively evaluated. As a consequence, higher standards of quality and better yields could be maintained. (Author).
Manufacturing In Process Control And Measuring Techniques For Integral Electronics Structural Defects In Single Crystal Semiconductors
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Author : Pei Wang
language : en
Publisher:
Release Date : 1965
Manufacturing In Process Control And Measuring Techniques For Integral Electronics Structural Defects In Single Crystal Semiconductors written by Pei Wang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1965 with categories.
The program's purpose is to develop special non-destructive in-process infrared and X-ray measuring techniques for detecting defects in silicon and gallium arsenide used in integrated circuit fabrication. Infrared techniques have been found quite useful for in-process detection of bulk defects, while it has been found that X-ray diffraction methods for detection of crystallographic defects are better suited to quality-sampling-type use. The Second (Evaluation) Phase resulted in the determination of detection sensitivity limits for the Lang X-ray technique for use in the detection of dislocations, plastic deformation, stacking faults, impurity precipitation and segregation, polycrystallinity and presence of grain boundaries, twin boundaries and subgrain boundaries, and surface defects in silicon. Sensitivity limits for bulk defect determination in Gallium Arsenide by the Borrmann X-ray techniques are also discussed. Limits have been determined also for the sensitivity of detection of mechanical defects, residual stress, and impurity content in silicon and gallium arsenide by infrared transmission microscopy, and the use of this tool is discussed. Finally, the detection sensitivity of the infrared birefringence technique is discussed. The Demonstration Phase consisted of processing some 400 slices of silicon integrated circuit wafers through these tests as a part of their standard production process. Slices contained circuits of three types. Distributions of IR and X-ray test results are shown. (Author).
Run To Run Control In Semiconductor Manufacturing
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Author : James Moyne
language : en
Publisher: CRC Press
Release Date : 2018-10-08
Run To Run Control In Semiconductor Manufacturing written by James Moyne and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-10-08 with Technology & Engineering categories.
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
Manufacturing In Process Control And Measuring Techniques For Integral Electronics Geometry And Surface Contamination Control
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Author :
language : en
Publisher:
Release Date : 1964
Manufacturing In Process Control And Measuring Techniques For Integral Electronics Geometry And Surface Contamination Control written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1964 with Electronics categories.
Lithography Process Control
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Author : Harry J. Levinson
language : en
Publisher: SPIE Press
Release Date : 1999
Lithography Process Control written by Harry J. Levinson and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Photography categories.
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.