Morphological And Electrical Variance In Polysilicon Thin Film Transistors Crystallized By Flash Lamp Annealing
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Morphological And Electrical Variance In Polysilicon Thin Film Transistors Crystallized By Flash Lamp Annealing
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Author : Glenn Packard
language : en
Publisher:
Release Date : 2023
Morphological And Electrical Variance In Polysilicon Thin Film Transistors Crystallized By Flash Lamp Annealing written by Glenn Packard and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023 with Annealing of crystals categories.
"This work is a wide-reaching study of the factors that impact the in-situ crystallization of thin films of amorphous silicon into low-temperature polycrystalline silicon (LTPS) by flash lamp annealing (FLA) on glass substrates, which is used to develop thin film transistors (TFTs) with an eye towards display applications. The body of research surrounding FLA LTPS is thus advanced by identifying several challenges towards industrial integration and exploring solutions involving device configuration, novel methods of dopant introduction and activation, and novel TFT material systems. It is unlikely that FLA will ever produce LTPS superior to the laser-annealing techniques currently dominating the market, but its significant improvements in throughput and roll-to-roll compatibility make it an attractive complementary technology. In this work, existing FLA LTPS TFT research is expanded into complementary metal-oxide-semiconductor (CMOS) logic to take advantage of the n- and p- channel compatibility of LTPS over competing amorphous oxide technology. A processing alternative is developed for scaling these devices down to current dimensions of liquid crystal display (LCD) transistor backplanes and then further improved by exploring a silicon ion self-implant to preamorphize the polycrystalline lattice structure, allowing enhanced dopant activation at temperatures compatible with thermally-fragile substrates. This method is also shown to be compatible with a self-aligned device configuration for ease of processing and reduced parasitic capacitance. Additionally, a new strategy for producing bottom-gate LTPS devices (a consistent challenge for laser-annealed LTPS) is presented by incorporating a transparent conductive oxide as a gate structure. The increased thermal mass provided by the bottom gate is harnessed to improve the impact of channel crystallization at lower pulse intensity, producing devices with extremely high channel mobility at low drain voltage. Monolayer Doping (MLD) is demonstrated to be compatible with FLA LTPS, utilizing a simultaneous anneal to both crystallize amorphous silicon and activate selectively self-assembled MLD-adhered dopants. MLD phosphorus n-channel TFTs are presented with activation on par with that of ultra-shallow MLD junctions on bulk silicon. Further, Gallium MLD is demonstrated for the first time, successfully producing p-channel TFTs with FLA. The material system of FLA-crystallized silicon on chromium, already well established in the micrometer-thick film range for PV applications, is given an in-depth investigation in the nanometer thin film range for TFT applications. A unique set of crystallization patterns and texture on the nanometer scale is revealed and characterized to determine the extent, cause, and impact of chromium redistribution in this material, which is also explored as a predictable and edge-directed morphology of FLA LTPS for a wide variety of device configurations. Finally, the individual advancements in this work are explored in many combinations in a wide multi-process study to determine their efficacy as techniques for producing FLA LTPS TFTs. Using this broad information, the field of flash-lamp crystallized TFTs is advanced and several challenges are more specifically identified as a foundation for future research."--Abstract.
Wafer Bonding
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Author : Marin Alexe
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Wafer Bonding written by Marin Alexe and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.
The topics include bonding-based fabrication methods of silicon-on-insulator, photonic crystals, VCSELs, SiGe-based FETs, MEMS together with hybrid integration and laser lift-off. The non-specialist will learn about the basics of wafer bonding and its various application areas, while the researcher in the field will find up-to-date information about this fast-moving area, including relevant patent information.
Atomic Layer Deposition For Semiconductors
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Author : Cheol Seong Hwang
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-10-18
Atomic Layer Deposition For Semiconductors written by Cheol Seong Hwang and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-18 with Science categories.
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Photovoltaic And Photoactive Materials
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Author : Joseph M. Marshall
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Photovoltaic And Photoactive Materials written by Joseph M. Marshall and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.
Amorphous Oxide Semiconductors
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Author : Hideo Hosono
language : en
Publisher: John Wiley & Sons
Release Date : 2022-05-17
Amorphous Oxide Semiconductors written by Hideo Hosono and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022-05-17 with Technology & Engineering categories.
AMORPHOUS OXIDE SEMICONDUCTORS A singular resource on amorphous oxide semiconductors edited by a world-recognized pioneer in the field In Amorphous Oxide Semiconductors: IGZO and Related Materials for Display and Memory, the Editors deliver a comprehensive account of the current status of—and latest developments in—transparent oxide semiconductor technology. With contributions from leading international researchers and exponents in the field, this edited volume covers physical fundamentals, thin-film transistor applications, processing, circuits and device simulation, display and memory applications, and new materials relevant to amorphous oxide semiconductors. The book makes extensive use of structural diagrams of materials, energy level and energy band diagrams, device structure illustrations, and graphs of device transfer characteristics, photographs and micrographs to help illustrate the concepts discussed within. It also includes: A thorough introduction to amorphous oxide semiconductors, including discussions of commercial demand, common challenges faced during their manufacture, and materials design Comprehensive explorations of the electronic structure of amorphous oxide semiconductors, structural randomness, doping limits, and defects Practical discussions of amorphous oxide semiconductor processing, including oxide materials and interfaces for application and solution-process metal oxide semiconductors for flexible electronics In-depth examinations of thin film transistors (TFTs), including the trade-off relationship between mobility and reliability in oxide TFTs Perfect for practicing scientists, engineers, and device technologists working with transparent semiconductor systems, Amorphous Oxide Semiconductors: IGZO and Related Materials for Display and Memory will also earn a place in the libraries of students studying oxides and other non-classical and innovative semiconductor devices. WILEY SID Series in Display Technology Series Editor: Ian Sage, Abelian Services, Malvern, UK The Society for Information Display (SID) is an international society which has the aim of encouraging the development of all aspects of the field of information display. Complementary to the aims of the society, the Wiley-SID series is intended to explain the latest developments in information display technology at a professional level. The broad scope of the series addresses all facets of information displays from technical aspects through systems and prototypes to standards and ergonomics.
High Efficiency Crystalline Silicon Solar Cells
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Author : Eun-Chel Cho
language : en
Publisher:
Release Date : 2021
High Efficiency Crystalline Silicon Solar Cells written by Eun-Chel Cho and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021 with categories.
This book is composed of 6 papers. The first paper reports a novel technique for the selective emitter formation by controlling the surface morphology of Si wafers. Selective emitter (SE) technology has attracted renewed attention in the Si solar cell industry to achieve an improved conversion efficiency of passivated-emitter rear-contact (PERC) cells. In the second paper, the temperature dependence of the parameters was compared through the PERC of the industrial-scale solar cells. As a result of their analysis, PERC cells showed different temperature dependence for the fill factor loss as temperatures rose. The third paper reports the effects of carrier selective front contact layer and defect state of hydrogenated amorphous silicon passivation layer/n-type crystalline silicon interface. The results demonstrated the effects of band offset determined by band bending at the interface of the passivation layer and carrier selective front contact layer. In addition, the nc-SiOx: H CSFC layer not only reduces parasitic absorption loss but also has a tunneling effect and field-effect passivation. The fourth paper reports excimer laser annealing of hydrogenated amorphous silicon film for TOPCon solar cell application. This paper analyzes the crystallization of a-Si:H via excimer laser annealing (ELA) and compared this process with conventional thermal annealing. The fifth paper reports the contact mechanism between Ag-Al and Si and the change in contact resistance (Rc) by varying the firing profile. Rc was measured by varying the belt speed and peak temperature of the fast-firing furnace. The sixth paper reports a silicon tandem heterojunction solar cell based on a ZnO/Cu2O subcell and a c-Si bottom subcell using electro-optical numerical modeling. The buffer layer affinity and mobility together with a low conduction band offset for the heterojunction are discussed, as well as spectral properties of the device model.
Silicon On Insulator Technology Materials To Vlsi
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Author : J.-P. Colinge
language : en
Publisher: Springer Science & Business Media
Release Date : 2004-02-29
Silicon On Insulator Technology Materials To Vlsi written by J.-P. Colinge and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-02-29 with Science categories.
Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis. Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, also describes the properties of other SOI devices, such as multiple gate MOSFETs, dynamic threshold devices and power MOSFETs. The advantages and performance of SOI circuits used in both niche and mainstream applications are discussed in detail. The SOI specialist will find this book invaluable as a source of compiled references covering the different aspects of SOI technology. For the non-specialist, the book serves an excellent introduction to the topic with detailed, yet simple and clear explanations. Silicon-on-Insulator Technology: Materials to VLSI, Third Edition is recommended for use as a textbook for classes on semiconductor device processing and physics at the graduate level.
Physics And Technology Of Crystalline Oxide Semiconductor Caac Igzo
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Author : Shunpei Yamazaki
language : en
Publisher: John Wiley & Sons
Release Date : 2017-02-06
Physics And Technology Of Crystalline Oxide Semiconductor Caac Igzo written by Shunpei Yamazaki and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-02-06 with Technology & Engineering categories.
This book highlights the display applications of c-axis aligned crystalline indium–gallium–zinc oxide (CAAC-IGZO), a new class of oxide material that challenges the dominance of silicon in the field of thin film semiconductor devices. It is an enabler for displays with high resolution and low power consumption, as well as high-productivity manufacturing. The applications of CAAC-IGZO focus on liquid crystal displays (LCDs) with extremely low power consumption for mobile applications, and high-resolution and flexible organic light-emitting diode (OLED) displays, and present a large number of prototypes developed at the Semiconductor Energy Laboratory. In particular, the description of LCDs includes how CAAC-IGZO enables LCDs with extremely low refresh rate that provides ultra-low power consumption in a wide range of use cases. Moreover, this book also offers the latest data of IGZO. The IGZO has recently achieved a mobility of 65.5 cm2ƒ}V-s, and it is expected to potentially exceed 100 cm2ƒ}V-s as high as that of LTPS. A further two books in the series will describe the fundamentals of CAAC-IGZO, and the application to LSI devices. Key features: • Introduces different oxide semiconductor field-effect transistor designs and their impact on the reliability and performance of LCDs and OLED displays, both in pixel and panel-integrated driving circuits. • Reviews fundamentals and presents device architectures for high-performance and flexible OLED displays, their circuit designs, and oxide semiconductors as an enabling technology. • Explains how oxide semiconductor thin-film transistors drastically can improve resolution and lower power consumption of LCDs.
Crc Handbook Of Metal Etchants
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Author : Perrin Walker
language : en
Publisher: CRC Press
Release Date : 1990-12-11
Crc Handbook Of Metal Etchants written by Perrin Walker and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990-12-11 with Science categories.
This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.
Silicon
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Author : Paul Siffert
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Silicon written by Paul Siffert and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Technology & Engineering categories.
With topics ranging from epitaxy through lattice defects and doping to quantum computation, this book provides a personalized survey of the development and use of silicon, the basis for the revolutionary changes in our lives sometimes called "The Silicon Age." Beginning with the very first developments more than 50 years ago, this reports on all aspects of silicon and silicon technology up to its use in exciting new technologies, including a glance at possible future developments.
