Nanoporous Thin Films Made By Atomic Layer Deposition And Molecular Layer Deposition
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Nanoporous Thin Films Made By Atomic Layer Deposition And Molecular Layer Deposition
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Author : Lilit Ghazaryan
language : en
Publisher:
Release Date : 2017
Nanoporous Thin Films Made By Atomic Layer Deposition And Molecular Layer Deposition written by Lilit Ghazaryan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with categories.
Thin Films Atomic Layer Deposition And 3d Printing
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Author : Kingsley Ukoba
language : en
Publisher: CRC Press
Release Date : 2023-11-29
Thin Films Atomic Layer Deposition And 3d Printing written by Kingsley Ukoba and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-11-29 with Technology & Engineering categories.
Thin Films, Atomic Layer Deposition, and 3D Printing explains the concept of thin films, atomic layers deposition, and the Fourth Industrial Revolution (4IR) with an aim to illustrate existing resources and give a broader perspective of the involved processes as well as provide a selection of different types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavors for both experts/nonexperts. The book includes figures, diagrams, and their applications in real-life situations. Features: Provides comprehensive material on conventional and emerging thin film, atomic layer, and additive technologies. Discusses the concept of Industry 4.0 in thin films technology. Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications. Explores detailed bibliometric analyses on pertinent applications. Interconnects atomic layer deposition and additive manufacturing. This book is aimed at researchers and graduate students in mechanical, materials, and metallurgical engineering.
Nanostructured Materials Prepared By Atomic Layer Deposition For Catalysis And Lithium Ion Battery Applications
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Author : Rajankumar L Patel
language : en
Publisher:
Release Date : 2016
Nanostructured Materials Prepared By Atomic Layer Deposition For Catalysis And Lithium Ion Battery Applications written by Rajankumar L Patel and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with categories.
"Atomic/molecular layer deposition (ALD/MLD) has emerged as an important technique for depositing thin films in both scientific research and industrial applications. In this dissertation, ALD/MLD was used to create novel nanostructures for two different applications, catalysis and lithium-ion batteries. MLD was used to prepare ultra-thin dense hybrid organic/inorganic polymer films. Oxidizing the hybrid films removed the organic components and produced the desired nanoporous films. Both porous alumina and titania films can be prepared by such a way. A novel nanostructured catalyst (Pt/SiO2) with an ultra-thin porous alumina shell obtained from the thermal decomposition of an aluminium alkoxide film deposited by MLD for size-selective reactions was developed. The molecular sieving capability of the porous metal oxide films was verified by examining the liquid-phase hydrogenation of n-hexene versus cis-cyclooctene. For lithium-ion battery cathodes, two different approaches are presented. Firstly, ultrathin and highly-conformal conductive CeO2 films were coated on LiMn2O4 particles using ALD process. The initial capacity of the 3 nm CeO2-coated sample showed 24% increment compared to the capacity of the uncoated one, and 96% and 95% of the initial capacity was retained after 1,000 cycles with 1C rate at room temperature (RT) and 55 °C, respectively. The study of ionic and electronic conductivities of the coated and uncoated materials helped explain the improved performance of CeO2 coated materials. Secondly, iron oxide films were deposited using ALD on LiMn[sub 1.5]Ni[sub 0.5]O4 particles for the synergetic effect of performance enhancing by iron doping and conformal iron oxide film coating. With an optimal film thickness of ~0.6 nm, the initial capacity improved by 25% at RT and by ~26% at 55 °C at 1C cycling rate. The synergy of doping of LiMn[sub 1.5]Ni[sub 0.5]O4 with Fe near surface combined with the conductive and protective nature of the optimal iron oxide film led to high capacity retention (~93% at RT and ~91% at 55 °C) even after 1,000 cycles at 1C cycling rate"--Abstract, page iv.
Thin Films
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Author : Dongfang Yang
language : en
Publisher: BoD – Books on Demand
Release Date : 2023-03-29
Thin Films written by Dongfang Yang and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-03-29 with Technology & Engineering categories.
A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.
Molecular Layer Deposition Of Polymeric Thin Films For Applications In Semiconductor Fabrication
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Author : Han Zhou
language : en
Publisher:
Release Date : 2013
Molecular Layer Deposition Of Polymeric Thin Films For Applications In Semiconductor Fabrication written by Han Zhou and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
The electronics industry has been developing improvements in its products at a rapid pace for five decades, an achievement that stems from its ability to continuously decrease the smallest feature sizes in microelectronic devices. To keep step with the miniaturization of next-generation devices, the constituent polymeric films of microelectronics need to meet requirements such as providing conformal, uniform, pinhole-free and ultrathin coatings. Molecular layer deposition (MLD), as an analogue to atomic layer deposition, is a layer-by-layer technique that utilizes sequential, self-limiting reactions of organic precursors to deposit films with one molecular unit at a time, which in turn allows for fine tuning of the position and concentration of various functionalities in the deposited film. Hence MLD can be a powerful method for deposition of polymer films used in semiconductor device fabrication. In this thesis, novel MLD processes are developed for fabricating ultrathin films and improving the film properties with applications in semiconductor manufacturing. The first part of this thesis explores the application of MLD films as chemically amplified photoresist materials. Acid-labile groups are embedded in the backbone of the precursor and incorporated into the photoresist film with a uniform distribution. Two methods of incorporating photo acid generator (PAG) are employed. The first method is to directly soak the PAG into the resist film after deposition and the second approach is to form in-situ polymer-bound PAG. By this novel synthetic approach, several polyurea films were deposited by MLD and tested for patterning, including an aromatic polyurea film with a soaked-in PAG, an aromatic polyurea film with an in-situ polymer-bound PAG, and an aliphatic polyurea film with soaked-in PAG. All these films were successfully deposited and characterized for both materials properties and resist response. Ellipsometry measurements show that the film thicknesses have a linear dependence on the number of MLD cycles. The presence of the urea linkage is confirmed by infrared (IR) spectroscopy, and x-ray photoelectron spectroscopy (XPS) show that the films are deposited with stoichiometric composition. Both of the aromatic films show cross-linking behavior under e-beam exposure, probably due to reaction at the aromatic rings. Moreover, the in-situ polymer-bound aromatic PAG has a lower activity than the soaked-in aromatic PAG, likely due to a lower photoacid yield. Finally, among the three MLD films studied, the aliphatic film performs best as a photoresist material and good sensitivity and resolution are achieved. To be applied in semiconductor device fabrication, polymeric thin films need to be thermally stable. Two approaches are investigated to improve the thermal stability of the MLD films. First, a series of cross-linked polyurea thin films are deposited by using multifunctional precursors. The cross-linked films show constant growth rate, urea chemical bonding, and stoichiometric compositions. More importantly, they exhibit higher film density and thermal stability compared to the non-cross-linked polyurea film. Second, a MLD process for depositing inorganic-organic hybrid carbosiloxane films is developed. Characteristic MLD growth behavior such as a constant growth rate and saturation behaviors are observed with this process as well. Significant improvement of film stability is achieved with the carbosiloxane films. This thesis concludes with thoughts and perspectives on the future of MLD in semiconductor device fabrication.
Atomic Layer Deposition And Characterization Of Metal Oxide Thin Films
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Author : Ali Mahmoodinezhad
language : en
Publisher:
Release Date : 2022
Atomic Layer Deposition And Characterization Of Metal Oxide Thin Films written by Ali Mahmoodinezhad and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022 with categories.
Surface Modification For Thin Film Deposition Nanocable Fabrication And Molecular Gates In Nanoporous Templates
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Author : Jie-Ren Ku
language : en
Publisher:
Release Date : 2005
Surface Modification For Thin Film Deposition Nanocable Fabrication And Molecular Gates In Nanoporous Templates written by Jie-Ren Ku and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Atomic Layer Deposition Of Metal Oxide Thin Films
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Author : Dennis Michael Hausmann
language : en
Publisher:
Release Date : 2002
Atomic Layer Deposition Of Metal Oxide Thin Films written by Dennis Michael Hausmann and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Thin film devices categories.
Thin Film Organic Photonics
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Author : Tetsuzo Yoshimura
language : en
Publisher:
Release Date : 2011
Thin Film Organic Photonics written by Tetsuzo Yoshimura and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with Electronic book categories.
"This book describes how photonic/electronic properties of thin films can be improved by precise control of atomic and molecular arrangements, and demonstrates the prospect of the artificial materials with atomic/molecular-level tailored structures, especially featuring MLD and conjugated polymers with multiple quantum dots (MQDs) called as polymer MQDs. It also describes other related topics including organic electro-optic materials, optical switches, optical circuits, the selforganized lightwave network (SOLNET), a resource-saving heterogeneous integration process, etc. Some applications of the artificial organic thin films to photonics/ electronics are proposed in the fields of optical interconnects within boxes of computers, optical switching systems, solar energy conversion systems, and bio/medicalphotonics like the photodynamic therapy. I would like to thank Prof. K. Asama of Tokyo University of Technology for his helpful advice and encouragement, Drs. K. Kiyota, A. Matsuura, T. Hayano, W. Sotoyama, and S. Tatsuura of Fujitsu Laboratories, Ltd., and students who joined Yoshimura Laboratory in Tokyo University of Technology for their collaboration in the research work that contributes to the writing of this book. I would also like to thank colleagues in Fujitsu Computer Packaging Technologies (FCPT), Inc., San Jose, California. Finally, I would like to express my sincere gratitude to Ms. Ashley Gasque and Ms. Catherine Giacari of CRC Press/Taylor & Francis for giving me the great opportunity to write this book, and Ms. Amy Blalock, Mr. John Edwards, and Mr. Michael Davidson for their help in completing this book"--
Atomic Layer Deposition Of Metal Oxide And Nitride Thin Films Microform
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Author : Becker, Jill Svenja
language : en
Publisher: Ann Arbor, Mich. : University Microfilms International
Release Date : 2002
Atomic Layer Deposition Of Metal Oxide And Nitride Thin Films Microform written by Becker, Jill Svenja and has been published by Ann Arbor, Mich. : University Microfilms International this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Thin film devices categories.