Nanostructure Engineering Using Electron Beam Lithography
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Nanostructure Engineering Using Electron Beam Lithography
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Author : Paul Bernard Fischer
language : en
Publisher:
Release Date : 1993
Nanostructure Engineering Using Electron Beam Lithography written by Paul Bernard Fischer and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with categories.
This Ph. D. thesis addresses nanostructure fabrication techniques based on electron beam lithography and their application to: the creation of ultra-fast metal-semiconductor-metal photodetectors and quantum effect transistors, the investigation of light emission from silicon, and the enhancement of resolution in magnetic force microscopy. Specifically, this thesis covers the following topics. (1) The implementation and characterization of an ultra-high resolution electron beam lithography (EBL) system created by modifying a scanning electron microscope. (2) The exploration of minimum achievable feature sizes using ultra-high resolution EBL and a lift-off process with polymethyl-methacrylate resists. 10 nm features, which are among the smallest ever achieved using EBL, have been obtained using a double shadow evaporation technique, a ultra-high resolution EBL technique, and a technique utilizing EBL, reactive ion etching, and subsequent wet etching. (3) The application of ultra-high resolution EBL technology to the fabrication of ultra-fast metal-semiconductor-metal (MSM) photodetectors. The fastest response time reported to date has been achieved in this project. (4) The fabrication and characterization of modulation doped field effect transistors. Quantum effects have been observed in a point contact device. (5) The fabrication of sub-50 nm Si structures using EBL, reactive ion etching (RIE) and subsequent wet etching for the study of photoluminescence (PL) from Si. PL has been observed from an array of 20 nm diameter pillars. And finally, (6) the application of high resolution EBL to the study of magnetic materials. Single domain magnetic particles and novel MFM tips have been fabricated.
Nanofabrication
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Author : Zheng Cui
language : en
Publisher: Springer Science & Business Media
Release Date : 2009-01-01
Nanofabrication written by Zheng Cui and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-01-01 with Technology & Engineering categories.
This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
Nanofabrication
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Author : Ampere A. Tseng
language : en
Publisher: World Scientific
Release Date : 2008
Nanofabrication written by Ampere A. Tseng and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with Science categories.
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
Nanofabrication Using Focused Ion And Electron Beams
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Author : Ivo Utke
language : en
Publisher: OUP USA
Release Date : 2012-05
Nanofabrication Using Focused Ion And Electron Beams written by Ivo Utke and has been published by OUP USA this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-05 with Technology & Engineering categories.
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Methodologies To Enhance The Resolution Of Electron Beam Lithography For Nanostructure Fabrication
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Author :
language : en
Publisher:
Release Date : 2007
Methodologies To Enhance The Resolution Of Electron Beam Lithography For Nanostructure Fabrication written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with categories.
Electron beam lithography, benefiting from the electron's shorter wavelength, is believed to be the next generation of lithography that will be used for manufacturing of ultra-large scale integrated circuits. In this dissertation, we investigated methodologies to enhance the resolution of electron beam lithography for nanostructure fabrication. The research was conducted at a writing voltage of 15 kV in order to demonstrate technologies that can be readily adapted to the future generations of commercialized electron beam lithography tools. It is expected that these new instrument will use low writing voltages in order to minimize the substrate damage and to reduce the instrument cost. Based on the studies presented in this dissertation, we demonstrate sub-10 nm linewidth isolated patterns and sub-10 nm linewidth dense patterns writing at a voltage of 15 kV. In addition, we successfully demonstrated a nano-pattern transfer process by using electron beam direct writing on a "modified" resist (in our case, a mixture of nanoparticles and PMMA photo resist). The successful demonstration of the electron beam direct writing on a modified resist can potentially open a new window of resist modification engineering for lithographic applications. The details of the development of novel methodologies will be presented in this thesis. We also demonstrate a 5 nm gold nano-gap, which can be used to study the electronic properties of nanoparticles trapped in the gap. Metal molds with minimum linewidths of 10 nm can be used for nanoimprint lithography was also demonstrated. In addition, silicon nanowires with a minimum linewidth of 10 nm that can be used for the fabrication of single electron transistor working at a high temperature were demonstrated. Finally, a 5 nm gold nanoparticle confined in a 30 nm resist island, which can be used for the single/multiple dot spectroscopy study was fabricated.
Nanofabrication
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Author : Maria Stepanova
language : en
Publisher: Springer Science & Business Media
Release Date : 2011-11-08
Nanofabrication written by Maria Stepanova and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-11-08 with Technology & Engineering categories.
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Nanostructure Engineering
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Author : Peter Robert Krauss
language : en
Publisher:
Release Date : 1997
Nanostructure Engineering written by Peter Robert Krauss and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with categories.
Nanoimprint Lithography An Enabling Process For Nanofabrication
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Author : Weimin Zhou
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-01-04
Nanoimprint Lithography An Enabling Process For Nanofabrication written by Weimin Zhou and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-01-04 with Technology & Engineering categories.
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Nanostructures In Electronics And Photonics
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Author : Faiz Rahman
language : en
Publisher: CRC Press
Release Date : 2016-04-19
Nanostructures In Electronics And Photonics written by Faiz Rahman and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-04-19 with Science categories.
This book provides a broad overview of nanotechnology as applied to contemporary electronics and photonics. The areas of application described are typical of what originally set off the nanotechnology revolution. An account of original research contributions from researchers all over the world, the book is extremely valuable for gaining an understa
Three Dimensional Nanofabrication By Electron Beam Lithography And Directed Self Assembly
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Author : Hyung Wan Do
language : en
Publisher:
Release Date : 2014
Three Dimensional Nanofabrication By Electron Beam Lithography And Directed Self Assembly written by Hyung Wan Do and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.
In this thesis, we investigated three-dimensional (3D) nanofabrication using electron-beam lithography (EBL), block copolymer (BCP) self-assembly, and capillary force-induced self-assembly. We first developed new processes for fabricating 3D nanostructures using a hydrogen silsesquioxane (HSQ) and poly(methylmeth-acrylate) (PMMA) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures. Next, we used the 3D nanostructures as topographical templates guiding the self-assembly of polystyrene-b-polydimethylsiloxane (PS-b-PDMS) block copolymer thin films. We observed parallel cylinders, mesh-shaped structures, and bar-shaped structures in PDMS. Finally, we studied capillary force-induced self-assembly of linear nanostructures using a spin drying process. We developed a computation schema based on the pairwise collapse of nanostructures. We achieved propagation of information and built a proof of concept logic gate.