Plasma Techniques For Film Deposition

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Film Deposition By Plasma Techniques

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Author : Mitsuharu Konuma
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Film Deposition By Plasma Techniques written by Mitsuharu Konuma and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.

Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.

Plasma Techniques For Film Deposition

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Author : Mitsuharu Konuma
language : en
Publisher: Alpha Science International, Limited
Release Date : 2005

Plasma Techniques For Film Deposition written by Mitsuharu Konuma and has been published by Alpha Science International, Limited this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Science categories.

Plasma Techniques for Film Deposition describes the technology and applications of cold plasma for thin-film deposition. The plasma is generated under low pressure and characterized by a non-thermal equilibrium. An attempt has been made to not only provide an introductory text but also to present the latest techniques and recent results: Fundamentals of plasma science such as its characterization, chemical and physical reactions in plasmas, basic techniques to generate and to diagnose plasmas. Techniques for generating high-density plasmas are outlined like the conventional electrical and magnetic methods, and the modern schemes for inductively coupled and helicon-wave plasmas. Plasma diagnostic methods, such as optical spectroscopy, electrical probes, mass and energy analysis of excited molecules and ions in plasma. Specific techniques are treated for thin-film formation: sputter deposition, ion plating, plasma enhanced chemical vapor deposition and plasma surface modification. Films, like amorphous, nano- and micro-crystalline silicon, polymorphs of carbon, i.e. amorphous phase, diamond, fullerenes and nanotubes, boron and carbon nitrides can be deposited.

Film Deposition By Plasma Techniques

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Author : M. Konuma
language : it
Publisher:
Release Date :

Film Deposition By Plasma Techniques written by M. Konuma and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.

Handbook Of Deposition Technologies For Films And Coatings

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Author : Rointan Framroze Bunshah
language : en
Publisher: William Andrew
Release Date : 1994

Handbook Of Deposition Technologies For Films And Coatings written by Rointan Framroze Bunshah and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Science categories.

This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Plasma Deposition Treatment And Etching Of Polymers

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Author : Riccardo d'Agostino
language : en
Publisher: Elsevier
Release Date : 2012-12-02

Plasma Deposition Treatment And Etching Of Polymers written by Riccardo d'Agostino and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.

Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. Appeals to a broad range of industries from microelectronics to space technology Discusses a wide array of new uses for plasma polymers Provides a tutorial introduction to the field Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization Interests scientists, engineers, and students alike

Thin Films By Chemical Vapour Deposition

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Author : C.E. Morosanu
language : en
Publisher: Elsevier
Release Date : 2016-06-22

Thin Films By Chemical Vapour Deposition written by C.E. Morosanu and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-06-22 with Technology & Engineering categories.

The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Low Temperature Pulsed Plasma Deposition Part 1 A New Technique For Thin Film Deposition With Complete Gas Dissociation

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Author : G. A. Scarsbrook
language : en
Publisher:
Release Date : 1988

Low Temperature Pulsed Plasma Deposition Part 1 A New Technique For Thin Film Deposition With Complete Gas Dissociation written by G. A. Scarsbrook and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with categories.

Conventional continuous plasma processes, for both deposition and etching, have three limitations. Theses limitations are: 1) incomplete gas dissociation, 2) gas depletion effects, and 3) substrate heating, either by the plasma itself or as a requirement of good film quality during deposition. However, all three of these disadvantages can be overcome in a novel process, where high power Radiofrequency energy is pulsed. In this paper the pulsed plasma process and equipment is described in detail, and applications of its unique capabilities are discussed. Keywords: Pulsed plasma; This film deposition; Complete gas dissociation. (jhd).

Plasma Polymer Films

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Author : Hynek Biederman
language : en
Publisher: World Scientific
Release Date : 2004

Plasma Polymer Films written by Hynek Biederman and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.

Plasma Polymer Films examines the current status of the deposition and characterization of fluorocarbon-, hydrocarbon- and silicon-containing plasma polymer films and nanocomposites, with plasma polymer matrix. It introduces plasma polymerization process diagnostics such as optical emission spectroscopy (OES, AOES), and describes special deposition techniques such as atmospheric pressure glow discharge. Important issues for applications such as degradation and stability are treated in detail, and structural characterization, basic electrical and optical properties and biomedical applications are discussed.

Plasma Deposited Thin Films

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Author : Mort
language : en
Publisher: CRC Press
Release Date : 2018-05-04

Plasma Deposited Thin Films written by Mort and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-05-04 with Technology & Engineering categories.

In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.

Handbook Of Thin Film Deposition Processes And Techniques

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Author : Klaus K. Schuegraf
language : en
Publisher: William Andrew
Release Date : 1988

Handbook Of Thin Film Deposition Processes And Techniques written by Klaus K. Schuegraf and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Technology & Engineering categories.

The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.