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Rapid Thermal And Other Short Time Processing Technologies Iii


Rapid Thermal And Other Short Time Processing Technologies Iii
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Rapid Thermal And Other Short Time Processing Technologies Iii


Rapid Thermal And Other Short Time Processing Technologies Iii
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Author : Paul J. Timans
language : en
Publisher: The Electrochemical Society
Release Date : 2002

Rapid Thermal And Other Short Time Processing Technologies Iii written by Paul J. Timans and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Technology & Engineering categories.




Rapid Thermal And Other Short Time Processing Technologies Ii


Rapid Thermal And Other Short Time Processing Technologies Ii
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Author : Dim-Lee Kwong
language : en
Publisher: The Electrochemical Society
Release Date : 2001

Rapid Thermal And Other Short Time Processing Technologies Ii written by Dim-Lee Kwong and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Technology & Engineering categories.


"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."



Rapid Thermal And Other Short Time Processing Technologies


Rapid Thermal And Other Short Time Processing Technologies
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 2000

Rapid Thermal And Other Short Time Processing Technologies written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.


The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.



Advanced Short Time Thermal Processing For Si Based Cmos Devices 2


Advanced Short Time Thermal Processing For Si Based Cmos Devices 2
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Author : Mehmet C. Öztürk
language : en
Publisher: The Electrochemical Society
Release Date : 2004

Advanced Short Time Thermal Processing For Si Based Cmos Devices 2 written by Mehmet C. Öztürk and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.




Rapid Thermal Processing For Future Semiconductor Devices


Rapid Thermal Processing For Future Semiconductor Devices
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Author : H. Fukuda
language : en
Publisher: Elsevier
Release Date : 2003-04-02

Rapid Thermal Processing For Future Semiconductor Devices written by H. Fukuda and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-02 with Science categories.


This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.



Ion Beams In Materials Processing And Analysis


Ion Beams In Materials Processing And Analysis
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Author : Bernd Schmidt
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-13

Ion Beams In Materials Processing And Analysis written by Bernd Schmidt and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-13 with Technology & Engineering categories.


A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.



Handbook Of Semiconductor Manufacturing Technology


Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19

Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.


Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.



Ulsi Process Integration Iii


Ulsi Process Integration Iii
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Author : Electrochemical Society. Meeting
language : en
Publisher: The Electrochemical Society
Release Date : 2003

Ulsi Process Integration Iii written by Electrochemical Society. Meeting and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Technology & Engineering categories.




Ulsi Process Integration Ii


Ulsi Process Integration Ii
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Author : Cor L. Claeys
language : en
Publisher: The Electrochemical Society
Release Date : 2001

Ulsi Process Integration Ii written by Cor L. Claeys and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Technology & Engineering categories.




Rapid Thermal And Related Processing Techniques


Rapid Thermal And Related Processing Techniques
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Author : Rajendra Singh
language : en
Publisher:
Release Date : 1991

Rapid Thermal And Related Processing Techniques written by Rajendra Singh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with Science categories.