Solvent Based Development Of Photoresists For Next Generation Lithography
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Solvent Based Development Of Photoresists For Next Generation Lithography
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Author : Christine Y. Ouyang
language : en
Publisher:
Release Date : 2013
Solvent Based Development Of Photoresists For Next Generation Lithography written by Christine Y. Ouyang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
As feature sizes continue to shrink, the need for new materials and new processes for next-generation lithography becomes more urgent. Although aqueous base development has been the industry standard for over twenty years, there are still several issues that need to be overcome. First, the high surface tension of aqueous base developers can lead to pattern collapse of high aspect ratio patterns and limit resolution. The toxicity of aqueous base developers has also raised concerns about the environment. In order to reduce the problems related to aqueous development, solvents or materials with desirable properties must be used. Recently, there has also been growing interest in solvent-based negative-tone development (NTD) due to its better performance in printing certain feature types. Therefore, solvent-based development of photoresists was investigated in this study. One approach to reduce the pattern collapse problem and environmental issues of the lithographic process is through the use of environmentally friendly solvents with low surface tension. Supercritical carbon dioxide (scCO2) and linear methyl siloxanes (LMS) are green solvents that have low toxicity, low surface tension, low viscosity and can be recycled. Solvent-based development of both polymeric and molecular glass resists with positive- and negative-tone images have been successfully demonstrated in both solvents. High-resolution and high aspect ratio patterns were obtained with no pattern collapse observed using both solvents. As there is little iii understanding about the solvent power of linear methyl siloxanes, the dissolution behavior of polymers and molecular glasses in linear methyl siloxanes was also studied. Besides using low surface tension developers to mitigate pattern collapse problem, another approach is by using materials with high etch resistance that eliminates the use of thick films. Also, because of the low intensity of current EUV light source, the next-generation resists need to demonstrate high sensitivity and optimum absorbance. Inorganic metal oxide nanoparticles based on zirconium oxide (ZrO2) and hafnium oxide (HfO2) with organic ligands have been synthesized for EUV lithography. These nanoparticle resists can be developed as negative-tone patterns using an organic solvent and high-resolution patterns were achieved. The patterning performance of these nanoparticles in different organic solvents was also evaluated. iv.
Materials And Processes For Next Generation Lithography
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Author :
language : en
Publisher: Elsevier
Release Date : 2016-11-08
Materials And Processes For Next Generation Lithography written by and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-11-08 with Technology & Engineering categories.
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Small Molecule Photoresist Materials For Next Generation Lithography
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Author : Marie Elyse Krysak
language : en
Publisher:
Release Date : 2013
Small Molecule Photoresist Materials For Next Generation Lithography written by Marie Elyse Krysak and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit will double every four years. In order to successfully continue this trend of miniaturizing feature sizes, new, smaller sized patterning materials must be studied. Small molecule photoresists are being developed for high resolution patterning. Low molecular weight amorphous materials, or molecular glasses (MGs), have emerged as alternatives to polymeric resist materials. They combine the benefits of small molecular size with the favorable aspects of polymers, such as a high glass transition temperature (Tg) and the ability to form thin films. Inorganic-based nanoparticles are currently being explored as next generation photoresists. These materials are similar in architecture to MGs, but are comprised of an inorganic core that provides excellent thermal stability and resistance to plasma etching. This research focuses on the synthesis and characterization both MG and nanoparticle resist materials for high resolution patterning. The materials studied are designed for use with Extreme Ultraviolet Lithography (EUV-L), using a wavelength of 13.5 nm. This next-generation technique is believed to be the key to extending patterning capabilities to sub 30 nm and beyond. Small molecule resists materials have been specifically designed for use with alternative lithographic processing techniques. Small, rigid structures were designed for vapor deposition, which has been examined as an alternative to spin-coating. This process has been shown to deposit a uniform film, free from defects and impurities, without the use of solvent. Sub-millisecond laser heating is a relatively new technique that is studied as an alternative the post exposure bake. This method has shown the ability to reduce line edge roughness while simultaneously improving resist sensitivity. Systematically designed MG photoacid generators have been used to characterize the acid diffusion behavior during laser heating as compared to traditional hotplate heating. The development of resist materials for these new processes is a critical step in the preparation of these processes for widespread use in lithographic processing. ii.
Using Supercritical Carbon Dioxide And Cosolvents To Develop E Beam And Euv Photoresists
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Author : Peter Thang Nguyen
language : en
Publisher:
Release Date : 2003
Using Supercritical Carbon Dioxide And Cosolvents To Develop E Beam And Euv Photoresists written by Peter Thang Nguyen and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with categories.
Advances In Resist Technology And Processing
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Author :
language : en
Publisher:
Release Date : 2003
Advances In Resist Technology And Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Photoresists categories.
Lithography
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Author : MicroChemicals GmbH
language : en
Publisher:
Release Date : 2006
Lithography written by MicroChemicals GmbH and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with categories.
Advanced Materials For Next Generation Lithography
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Author : Evan Lawrence Schwartz
language : en
Publisher:
Release Date : 2011
Advanced Materials For Next Generation Lithography written by Evan Lawrence Schwartz and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with categories.
The constant demand for increased circuit density and higher resolution patterning calls for simultaneous advancements in materials chemistry. A variety of possible approaches for next-generation lithography are explored, centering on the use of directly patternable self-assembling block copolymers, along with hafnium oxidebased nanoparticle photoresists. In one example of the first approach, a random copolymer brush layer of poly(styrene-ran-hydroxystyrene) was designed and synthesized to precisely tune the substrate/polymer surface energy for a lithographically patternable poly([alpha]methylstyrene-block-4-hydroxystyrene) (P[alpha]MS-b-PHOST) block copolymer. The surface was designed to avoid preferential wetting of either P[alpha]MS or PHOST domains to the substrate and orient the block copolymer domains vertically relative to the substrate. To neutralize the polymer/ vapor interface during solvent vapor processing, the film was exposed to a mixed solvent vapor of a defined polarity, creating vertical microdomains with long-range order. In the latter approach, hafnium oxide nanoparticles were covalently coated with a photo-reactive ligand, which allowed neighboring nanoparticles to form a crosslinked network upon exposure to ultraviolet light. The basic science of this new class of resist material is discussed. These negative-tone resists have so far demonstrated sub-50 nm resolution using 193nm interference lithography, and plasma etch resistance over thirteen times greater than PHOST under standard silicon etching conditions. In a combination of the two approaches, the co-assembly of the inorganic nanoparticles with the PHOST phase of P[alpha]MS-b-PHOST is shown. TEM and SAXS studies indicated the expansion of the microdomain periodicity upon nanoparticle incorporation. These block copolymer nanocomposite films offer enhanced functionality and a larger process window for subsequent pattern transfer into semiconductor substrates. In another example of co-assembly, phenolic molecular glass photoresists were blended with low molecular weight, triblock copolymer surfactants based on poly(ethylene oxide)(PEO). The miscibility of these blend components is shown to be a result of preferential hydrogen bonding between the hydroxyl groups attached to the molecular glass and the alkyl ether group of the PEO block, as shown by FTIR and DSC analysis. The blending resulted in an enhancement in segregation strength that led to the formation of sub-10nm self-assembled morphologies, as verified by SAXS. Options for the lithographic patterning of these blends are explored. Lastly, a combined additive and subtractive patterning technique is demonstrated that allows the deposition of multiple block copolymer films, of different domain sizes and pitches, on the same layer of the substrate. The approach used a semifluorinated negative-tone photoresist which is designed to resist intermixing when spin coated on top of a block copolymer film.
Conjugated Polymers For Next Generation Applications Volume 1
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Author : Vijay Kumar
language : en
Publisher: Woodhead Publishing
Release Date : 2022-06-24
Conjugated Polymers For Next Generation Applications Volume 1 written by Vijay Kumar and has been published by Woodhead Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022-06-24 with Technology & Engineering categories.
Conjugated Polymers for Next-Generation Applications, Volume One: Synthesis, Properties and Optoelectrochemical Devices describes the synthesis and characterization of varied conjugated polymeric materials and their key applications, including active electrode materials for electrochemical capacitors and lithium-ion batteries, along with new ideas of functional materials for next-generation high-energy batteries, a discussion of common design procedures, and the pros and cons of conjugated polymers for certain applications. The book’s emphasis lies in the underlying electronic properties of conjugated polymers, their characterization and analysis, and the evaluation of their effectiveness for utilization in energy and electronics applications. This book is ideal for researchers and practitioners in the area of materials science, chemistry and chemical engineering. Provides an overview of the synthesis and functionalization of conjugated polymers and their composites Reviews important photovoltaics applications of conjugated polymeric materials, including their use in energy storage, batteries and optoelectronic devices Discusses conjugated polymers and their application in electronics for sensing, bioelectronics, memory, and more
Nanolithography
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Author : M Feldman
language : en
Publisher: Woodhead Publishing
Release Date : 2014-02-13
Nanolithography written by M Feldman and has been published by Woodhead Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-02-13 with Technology & Engineering categories.
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Polymer Science A Comprehensive Reference
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Author :
language : en
Publisher: Newnes
Release Date : 2012-12-05
Polymer Science A Comprehensive Reference written by and has been published by Newnes this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-05 with Technology & Engineering categories.
The progress in polymer science is revealed in the chapters of Polymer Science: A Comprehensive Reference, Ten Volume Set. In Volume 1, this is reflected in the improved understanding of the properties of polymers in solution, in bulk and in confined situations such as in thin films. Volume 2 addresses new characterization techniques, such as high resolution optical microscopy, scanning probe microscopy and other procedures for surface and interface characterization. Volume 3 presents the great progress achieved in precise synthetic polymerization techniques for vinyl monomers to control macromolecular architecture: the development of metallocene and post-metallocene catalysis for olefin polymerization, new ionic polymerization procedures, and atom transfer radical polymerization, nitroxide mediated polymerization, and reversible addition-fragmentation chain transfer systems as the most often used controlled/living radical polymerization methods. Volume 4 is devoted to kinetics, mechanisms and applications of ring opening polymerization of heterocyclic monomers and cycloolefins (ROMP), as well as to various less common polymerization techniques. Polycondensation and non-chain polymerizations, including dendrimer synthesis and various "click" procedures, are covered in Volume 5. Volume 6 focuses on several aspects of controlled macromolecular architectures and soft nano-objects including hybrids and bioconjugates. Many of the achievements would have not been possible without new characterization techniques like AFM that allowed direct imaging of single molecules and nano-objects with a precision available only recently. An entirely new aspect in polymer science is based on the combination of bottom-up methods such as polymer synthesis and molecularly programmed self-assembly with top-down structuring such as lithography and surface templating, as presented in Volume 7. It encompasses polymer and nanoparticle assembly in bulk and under confined conditions or influenced by an external field, including thin films, inorganic-organic hybrids, or nanofibers. Volume 8 expands these concepts focusing on applications in advanced technologies, e.g. in electronic industry and centers on combination with top down approach and functional properties like conductivity. Another type of functionality that is of rapidly increasing importance in polymer science is introduced in volume 9. It deals with various aspects of polymers in biology and medicine, including the response of living cells and tissue to the contact with biofunctional particles and surfaces. The last volume is devoted to the scope and potential provided by environmentally benign and green polymers, as well as energy-related polymers. They discuss new technologies needed for a sustainable economy in our world of limited resources. Provides broad and in-depth coverage of all aspects of polymer science from synthesis/polymerization, properties, and characterization methods and techniques to nanostructures, sustainability and energy, and biomedical uses of polymers Provides a definitive source for those entering or researching in this area by integrating the multidisciplinary aspects of the science into one unique, up-to-date reference work Electronic version has complete cross-referencing and multi-media components Volume editors are world experts in their field (including a Nobel Prize winner)