Alternative Lithography
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Alternative Lithography
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Author : Clivia M. Sotomayor Torres
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Alternative Lithography written by Clivia M. Sotomayor Torres and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Alternative Lithography
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Author : Clivia M Sotomayor Torres
language : en
Publisher:
Release Date : 2003-12-01
Alternative Lithography written by Clivia M Sotomayor Torres and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-12-01 with categories.
Principles Of Lithography
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Author : Harry J. Levinson
language : en
Publisher: SPIE Press
Release Date : 2005
Principles Of Lithography written by Harry J. Levinson and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Alternative Lithographic Technologies Vii
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Author : Douglas J. Resnick
language : en
Publisher:
Release Date : 2015-03
Alternative Lithographic Technologies Vii written by Douglas J. Resnick and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-03 with Extreme ultraviolet lithography categories.
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Alternative Lithographic Technologies Iv
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Author : William M. Tong
language : en
Publisher:
Release Date : 2012-03-05
Alternative Lithographic Technologies Iv written by William M. Tong and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-03-05 with Extreme ultraviolet lithography categories.
Includes Proceedings Vol. 7821
Lithography
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Author : Theodore C. Hennessy
language : en
Publisher: Nova Science Pub Incorporated
Release Date : 2011-01-01
Lithography written by Theodore C. Hennessy and has been published by Nova Science Pub Incorporated this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-01-01 with Technology & Engineering categories.
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nonfabrication technologies and manufacturing of integrated circuits (IC). Optical lithography was the first and the earliest microfabrication technology used in semiconductor IC manufacturing. It is still the main tool of lithography in today's very large scale integrated circuits and MEMS. This book presents topical research from across the globe in the study of lithography; its principles, processes and materials. Topics discussed herein include nanofabrication in electron beam lithography; submicron gratings prepared by laser interference lithography; thermal electric field imprinting lithography; local anodic oxidation and other alternative lithography techniques; as well as nanosphere lithography to enable plasmonic applications.
Nanofabrication
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Author : Zheng Cui
language : en
Publisher: Springer
Release Date : 2016-08-10
Nanofabrication written by Zheng Cui and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-08-10 with Technology & Engineering categories.
This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges.
Nanotechnology And Tissue Engineering
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Author : Cato T. Laurencin
language : en
Publisher: CRC Press
Release Date : 2008-06-16
Nanotechnology And Tissue Engineering written by Cato T. Laurencin and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-06-16 with Medical categories.
Nanofabrication gives us the ability to mimic biological structures with molecular level precision. Offering a natural progression of topics, Nanotechnology and Tissue Engineering: The Scaffold provides a state-of-the-art account of groundbreaking research in this rapidly emerging area of biomedical engineering. Emphasizing the importance of scaffo
Materials And Processes For Next Generation Lithography
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Author :
language : en
Publisher: Elsevier
Release Date : 2016-11-08
Materials And Processes For Next Generation Lithography written by and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-11-08 with Technology & Engineering categories.
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Principles Of Lithography
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Author : Harry J. Levinson
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 2001
Principles Of Lithography written by Harry J. Levinson and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Technology & Engineering categories.
The ability to pack large numbers of individual transistors in a small area of silicon has enabled the functionality of modern microelectronics, specifically integrated circuits. This work focuses on photolithography - the method used for patterning nearly all integrated circuits fabricated at present, in which optical methods are used to transfer circuit patterns from master images, called masks or reticles, to silicon wafers. This work can serve as an introduction to the science of microlithography for someone who is unfamiliar with the subject. The reader is expected to have a foundation in basic physics, chemistry, and elementary calculus. The text covers a number of advanced subjects and may be useful to experienced lithographers who seek a better understanding of topics outside their areas of expertise. #Conoverview Of Lithography; Optical Pattern Formation; Photoresist; Modelling And Thin Film Effects; Wafer Steppers; Overlay; Masks And Reticles; Overcoming The Diffraction Limit; Metrology; The Limits Of Optical Lithography; Lithography Costs; Alternative Lithography Techniques. Appendix: Coherence.