Atomic Layer Deposition For Nanotechnology
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Atomic Layer Deposition
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Author : Tommi Kääriäinen
language : en
Publisher: John Wiley & Sons
Release Date : 2013-05-28
Atomic Layer Deposition written by Tommi Kääriäinen and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-28 with Technology & Engineering categories.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Atomic Layer Deposition For Nanotechnology
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Author : Arthur Sherman
language : en
Publisher:
Release Date : 2008-01-01
Atomic Layer Deposition For Nanotechnology written by Arthur Sherman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-01-01 with Atomic layer deposition categories.
Atomic Layer Deposition Of Nanostructured Materials
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Author : Nicola Pinna
language : en
Publisher: John Wiley & Sons
Release Date : 2012-09-19
Atomic Layer Deposition Of Nanostructured Materials written by Nicola Pinna and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-09-19 with Technology & Engineering categories.
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Atomic Layer Deposition
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Author :
language : en
Publisher:
Release Date : 2013
Atomic Layer Deposition written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with Nanotechnology categories.
Chemical Vapor Deposition For Nanotechnology
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Author : Pietro Mandracci
language : en
Publisher: BoD – Books on Demand
Release Date : 2019-01-10
Chemical Vapor Deposition For Nanotechnology written by Pietro Mandracci and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-01-10 with Technology & Engineering categories.
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Chemical Vapor Deposition For Nanotechnology
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Author : Pietro Mandracci
language : en
Publisher:
Release Date : 2019
Chemical Vapor Deposition For Nanotechnology written by Pietro Mandracci and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with Materials of engineering and construction. Mechanics of materials categories.
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Atomic Layer Deposition Applications 2
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Author : Ana Londergan
language : en
Publisher: The Electrochemical Society
Release Date : 2007
Atomic Layer Deposition Applications 2 written by Ana Londergan and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Atomic layer deposition categories.
This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.
Ceramic Nanocomposites
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Author : X. Liang
language : en
Publisher: Elsevier Inc. Chapters
Release Date : 2013-07-31
Ceramic Nanocomposites written by X. Liang and has been published by Elsevier Inc. Chapters this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-07-31 with Technology & Engineering categories.
Ultra-thin films can be coated on primary fine particles without significant aggregation by atomic layer deposition (ALD) in a fluidized bed reactor. Precursor doses can be delivered to the bed of particles sequentially and, in most cases, can be utilized at nearly 100% efficiency without precursor breakthrough and loss, with the assistance of an inline downstream mass spectrometer. A multitude of applications can be addressed in a competitive fashion using fine particles that have been surface-modified using ALD in scalable, high-throughput unit operations. Several examples of the applications of conformal ALD coatings have been discussed, including oxidation-resistant metals or ceramics, coatings that enable biomedical applications including tissue engineering, and corrosion-resistant particles for next-generation batteries, capacitors or fuel cells. It is expected that the technology of thin film coating by particle ALD will play a major role in the field of advanced materials.
Advances In Nanotechnology Research And Application 2013 Edition
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Author :
language : en
Publisher: ScholarlyEditions
Release Date : 2013-06-21
Advances In Nanotechnology Research And Application 2013 Edition written by and has been published by ScholarlyEditions this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-06-21 with Technology & Engineering categories.
Advances in Nanotechnology Research and Application: 2013 Edition is a ScholarlyEditions™ book that delivers timely, authoritative, and comprehensive information about Atomic Layer Deposition. The editors have built Advances in Nanotechnology Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Atomic Layer Deposition in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Advances in Nanotechnology Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Growth And Transport In Nanostructured Materials
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Author : Angel Yanguas-Gil
language : en
Publisher: Springer
Release Date : 2016-11-30
Growth And Transport In Nanostructured Materials written by Angel Yanguas-Gil and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-11-30 with Technology & Engineering categories.
This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.