Block Copolymer Self Assembly A Computational Approach Towards Novel Morphologies
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Block Copolymer Self Assembly A Computational Approach Towards Novel Morphologies
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Author : Karim Raafat Gadelrab
language : en
Publisher:
Release Date : 2019
Block Copolymer Self Assembly A Computational Approach Towards Novel Morphologies written by Karim Raafat Gadelrab and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with categories.
Spontaneous self-assembly of materials is a phenomenon exhibited by different molecular systems. Among many, Block copolymers (BCPs) proved to be particularly interesting due to their ability to microphase separate into periodic domains. Nonetheless, the rising need for arbitrary, complex, 3D nanoscale morphology shows that what is commonly achievable is quite limited. Expanding the range of BCPs morphologies could be attained through the implementation of a host of strategies that could be used concurrently. Using directed self-assembly (DSA), a sphere forming BCP was assembled in a randomly displaced post template to study system resilience towards defect creation. Template shear-like distortion seemed to govern local defect generation. Defect clusters with symmetries compatible with that of the BCP showed enhanced stability. Using 44 and 32434 Archimedean tiling templates that are incompatible with BCP six-fold symmetry created low symmetry patterns with an emergent behavior dependent on pattern size and shape. A variation of DSA is studied using modulated substrates. Layer-by-layer deposition of cylinder forming BCPs was investigated. Self-consistent field theory (SCFT) and strong segregation theory SST were employed to provide the understanding and the conditions under which particular orientations of consecutive layers were produced. Furthermore, deep functionalized trenches were employed to create vertically standing high-[chi] BCP structures. Changing annealing conditions for a self-assembled lamellar structure evolved the assembled pattern to a tubular morphology that is non-native to diblock copolymers. A rather fundamental but challenging strategy to go beyond the standard motifs common to BCPs is to synthesize multiblock molecules with an expanded design space. Triblock copolymers produced bilayer perforated lamellar morphology. SCFT analysis showed a large window of stability of such structures in thin films. In addition, a model for bottlebrush BCPs (BBCPs) was constructed to investigate the characteristics of BBCPs self-assembly. Pre-stacked diblock sidechains showed improved microphase separation while providing domain spacing relevant to lithography applications. A rich phase diagram was constructed at different block concentrations. The ability to explore new strategies to discover potential equilibrium morphologies in BCPs is supported by strong numerical modeling and simulations efforts. Accelerating SCFT performance would greatly benefit BCP phase discovery. Preliminary work discussed the first attempt to Neural Network (NN) assisted SCFT. The use of NN was able to cut on the required calculations steps to reach equilibrium morphology, demonstrating accelerated calculation, and escaping trapped states, with no effect on final structure.
Computational Study Of Self Assembly In Block Copolymer Superparamagnetic Nanoparticle Composites Under External Magnetic Fields
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Author : Vinay Raman
language : en
Publisher:
Release Date : 2014
Computational Study Of Self Assembly In Block Copolymer Superparamagnetic Nanoparticle Composites Under External Magnetic Fields written by Vinay Raman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.
This computational and theoretical study investigates the self-assembly of superparamagnetic nanoparticles and block copolymers under external magnetic fields. A variety of morphological transitions are observed based on the field orientation, nanoparticle loading, and selectivity of the nanoparticles for the blocks. For symmetric block copolymers, chaining of superparamagnetic nanoparticles under in-plane magnetic fields is shown to achieve long range orientational order of the block copolymer nanodomains and is found to be dependent on nanoparticle size, volume fraction and magnetization strength. A critical selectivity of the particles for one nanodomain is observed, above which strong alignment results and below which comparatively disordered structures are formed. Higher magnetization strengths are found to reduce equilibrium defect densities in the nematic-isotropic ordering of lamellar thin films, as corroborated by scaling arguments. For asymmetric coil fractions forming hexagonal block copolymer nanostructure, the inplane field induced chaining of the nanoparticles selective for the minority block, leads to the formation of stripe phases oriented parallel to the magnetic field. Furthermore, in-plane field induced chaining of nanoparticles selective for the majority block leads to alignment of hexagonal morphology with 100 direction oriented parallel to the external magnetic field. Out of plane magnetic fields induce repulsive dipolar interactions between the nanoparticles that annihilate the defects in the hexagonal morphology of the block copolymer when the nanoparticle is selective for the minority block. Honeycomb lattices are obtained using nanoparticles selective for majority block under out of plane magnetic fields for certain specific nanoparticle loadings. Commensurability of nanoparticle size and loadings with the block copolymer structure is critical in optimizing the ordering of the final composite. Kinetics of alignment in block copolymer nanocomposites is studied using External Potential Dynamics (EPD) method, wherein an equivalent evolution equation for potential fields is solved instead of conservation equation for the monomer segments. The dynamics study reveals an interesting interplay of nanoparticle mobility, dipolar interaction strength and nanoparticle-polymer interaction strength on the rate of alignment of domains.
Synthesis Characterization And Self Assembly Of Amphiphilic Block Copolymers
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Author : Xiaojun Wang
language : en
Publisher:
Release Date : 2012
Synthesis Characterization And Self Assembly Of Amphiphilic Block Copolymers written by Xiaojun Wang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012 with categories.
This dissertation presents a review on state-of-the-art research of well-defined charged block copolymers, including synthesis, characterization, bulk morphology and self-assembly in aqueous solution of amphiphilic block polyelectrolytes. In Chapter 1, as a general introduction, experimental observations and theoretical calculations devoted towards understanding morphological behavior in charged block copolymer systems are reviewed along with some of the new emerging research directions. Further investigation of charged systems is urged in order to fully understand their morphological behavior and to directly target structures for the tremendous potential in technological applications. Following this background, in Chapters 2, 3, 4 and 5 are presented the design and synthesis of a series of well-defined block copolymers composed of charged and neutral block copolymers with full characterization: sulfonated polystyrene-b-fluorinated polyisoprene (sPS-b-fPI) and polystyrene-b-sulfonated poly(1,3-cyclohexadiene) (PS-b-sPCHD). Their bulk morphological behaviors in melts and self-assembly of sPS-b-fPI, PS-b-sPCHD in water were investigated. Some unique behaviors of sPS-b-fPI were discovered. The mechanisms for formation of novel nanostructures in aqueous solution are discussed in details in Chapter 4. Spherical and vesicular structures were formed from strong electrolyte block copolymers, e.g. PS-bsPCHD. Detailed light scattering and transmission electron microscopy were applied to characterize these structures. The abnormal formation of vesicles as well as microstructure effects on self-assembly is discussed in Chapter 5. In Chapter 6, we describe the successful synthesis of a well-defined acid-based block copolymers containing polyisoprene while maintaining the integrity of the functionality (double bonds) of polyisoprene. A general purification method is also presented in order to remove homo polyisoprene, polystyrene, and PS-b-PI in the di-, and tri-block copolymers. The self-assembly of PS-b-PI-b-PAA triblock terpolymers was studied in order to form multicompartmental structures in aqueous environments. In the last Chapter 7, detailed synthesis and characterization of a novel conjugate: poly(L-leucine) grafted hyaluronan (HA) (HA-g-PLeu) are presented. This work describes a new method to synthesize HA-g-PLeu via a "grafting onto" strategy. Due to the amphiphilic nature of this graft copolymers, a "local network" formed by self-assembly which was characterized by atomic force microscopy and light scattering. The secondary structure of the polypeptide was revealed by circular dichroism.
Block Copolymer Self Assembly
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Author : Gayashani Kanchana Ginige
language : en
Publisher:
Release Date : 2022
Block Copolymer Self Assembly written by Gayashani Kanchana Ginige and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022 with Block copolymers categories.
Molecular self-assembly is the basis of structure in nature. While of far less complexity than a natural system, the same physical rules apply to simple synthetic designed systems that spontaneously form self-assembled structures and patterns. The self-assembly of block copolymers (BCPs) is an interesting example, as it can be harnessed to form both 2D (in thin films) and 3D (in bulk) porous and chemically controlled morphologies at scale. The self-assembly of BCPs on surfaces is of interest for a range of applications, but due to the enormous economic driver that is the computer industry, this direction has been pushed most strongly. Self-assembly of BCPs has been described in the International Technology Roadmap for Semiconductors (the ITRS, and now the IDRS) for almost two decades for lithography on semiconductors and for patterning the magnetic material of hard drives. As a result, there has been much academic interest, both fundamental and applied, to meet the challenges as outlined in the ITRS/IDRS due to the promise of this scalable and low-cost nanopatterning approach. More recently, the remarkable work harnessing BCP self-assembly has been directed to other applications, one being optical metamaterials; this thesis will add to this growing body of science. One aspect holding BCP self-assembly back is the defectivity in the patterned material or surface; some applications are more defect tolerant than others, but hard drive and other computer-industry applications have very low tolerance for defects. It is, therefore, important to have systematic control over the self-assembly process as well as quality of the final patterns generated by BCP self-assembly for these applications and others not yet imagined. This thesis examines the defectivity of the hexagonal nanoscale patterns derived from BCP self-assembly and looks at extending them to produce nanoscale patterns of native and non-native morphologies that have plasmonic properties. This thesis is divided into two parts. The first part deals with optimization of solvent vapor annealing of BCP self-assembly, the critical step in which the actual nanoscale phase segregation takes place; in this case, it uses a controlled solvent vapor flow annealing apparatus, design of experiment and machine learning approaches. In this work, it was discovered that slight variations in the initial film thickness on the order of even a couple of nanometers and the final swelling degree have a huge influence on the defectivity and the quality of the resulting patterns. Next, machine learning approaches are applied to compile qualitative and quantitative defect analysis into a single figure of merit that is mapped across an experimental parameter space. This approach enables faster convergence of results to arrive at the optimum annealing conditions for the annealing of thin films of BCPs of PS-b-PDMS that generate nanoscale hexagonal patterns of silica dots with a minimum number of defects. In the second part of the thesis, mixed metal/oxide double layer patterning was studied using sequential self-assembly of BCPs. The second part of the thesis starts with optimization of reactive ion etching (RIE) for producing single layer metal nanopatterns from metal ion-loaded thin films of PS-b-P2VP BCPs to generate single layers of hexagonal metal nanopatterns that can withstand a second consecutive reactive ion etching step. The goal of this work is to enable density doubled and/or Moiré pattern formation via self-assembly of a second layer of BCP on the initial pattern prepared by self assembly of either the same or different BCP, as will be described in Chapter 4. Therefore, the initial pattern produced via BCP self-assembly and RIE etching would need to withstand a second treatment step of BCP self-assembly and RIE. While single layer nanopatterns of Au and Pt nanoparticles can be produced without much trouble, these resulting patterns could not be applied for density multiplication of metal-metal nanopatterns since the metal dots become too small and disordered. To demonstrate that metal nanoparticles derived from BCPs could be used, at least, to produce a mixed metal oxide/metal patterns, arrays of SiOx dots were first produced from PS-b-PDMS BCPs and then layered a BCP of PS-b-P2VP that was subsequently loaded with gold or platinum ions. Upon RIE etching, the BCP is removed and the SiOx/Au or Pt nanoparticle arrays were produced. Based upon the outcomes of the optimization of the etching work, mixed Au-Pt commensurate and incommensurate hexagonal lattice patterns were produced on both silicon and quartz substrates. Finally, the optical properties of these mixed metal Pt-Au bilayer patterns were studied. They demonstrated interesting plasmonic properties of the bilayer patterns, including consistent observation of extended plasmon bands that suggest coupling of the localized surface plasmon resonances (LSPRs) of the gold nanoparticles through proximal platinum nanoparticles when arrayed in periodic patterns.
Part I Morphology Transformation Of Block Copolymer Micelles Containing Quantum Dots In The Corona
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Author : Meng Zhang
language : en
Publisher:
Release Date : 2013
Part I Morphology Transformation Of Block Copolymer Micelles Containing Quantum Dots In The Corona written by Meng Zhang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
Investigating The Role Of Topological Frustration On Morphology Of Novel Multiblock Copolymers
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Author : Rohit Gupta
language : en
Publisher:
Release Date : 2018
Investigating The Role Of Topological Frustration On Morphology Of Novel Multiblock Copolymers written by Rohit Gupta and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018 with categories.
Multiblock copolymers have gained considerable attention due to their ability to offer immense potential for designing soft materials with complex architectures for diverse applications. The enlarged parameter space offered by these multiblock copolymers gives access to a wide variety of multiply continuous morphologies which can be used to produce highly ordered nanostructures. The investigation on multiblock copolymers has been subjected to two critical limitations: (i) A suitable synthetic strategy for accessing these structures and (ii) computational tools which can help in application driven design of these molecules. In this dissertation, the goal was to develop methodologies for the synthesis of multiblock copolymers with different architectures and understand how the variations in molecular architecture can influence macromolecular self-assembly. In chapter 2, the concept of single molecule insertion (SMI) for precise insertion of functional molecules is presented. The molecule precisely inserts once within the polymer chain with high chain fidelity and provides functionalities for post-insertion modifications. A series of molecules satisfying the criteria for SMI based on their reactivity ratios with styrene and methyl methacrylate were examined and used to synthesize a series of multiblock polymers with complex architectures. In chapter 3, a highly efficient synthetic methodology for synthesis of graft copolymers which lie along the continuum of a 3-arm star and A-B-C linear triblock copolymer has been described. The morphological characterization of the synthesized continuum graft copolymers is performed using SAXS, TEM, and DPD simulations. Interesting morphologies are observed for these continuum copolymers and projects them as interesting candidates to access new morphologies. Contrary to most of the work done on block copolymers, these structures are novel as their morphologies can be tuned keeping the [phi] and [chi] constant. This study helps in understanding of the effect of polymer architecture on the phase behavior of these graft copolymers and provides a novel pathway to tune the block copolymer morphologies. In chapter 4, a series of PMMA-b-PtBS-b-P2VP and PtBA-b-PtBS-b-P2VP triblock copolymers with extending P2VP arm has been synthesized. The study helps in extending the concept of high [chi]-low N block copolymer system from diblock to triblock copolymers. The morphologies of the synthesized triblock copolymers were characterized using SAXS and TEM and morphologies with multiple domains and smaller feature size were observed. Also, the effect of extending chain length of P2VP arm on the phase diagram on these highly frustrated triblock copolymer systems was studied and the observed morphologies using SAXS and TEM were mapped with the theoretical predictions.
Block Copolymer Self Assembly And Application For Polymer Electrodes
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Author : Sirikorn Chasvised
language : en
Publisher:
Release Date : 2021
Block Copolymer Self Assembly And Application For Polymer Electrodes written by Sirikorn Chasvised and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021 with categories.
This thesis is part of the global effort to find alternative energies to those generating CO2, a greenhouse gas. Indeed, electrodes are herein developed to produce hydrogen from the electrolysis of water. Specifically, block copolymers were developed for use as a binder in ink formulations for electrode screen printing. After presenting a state of the art in the first chapter, we decided to study the effect of microwaves on the self-assembly and the hierarchical structuration of our first polymer binder, a block copolymer (MBM) based on methyl methacrylate (MMA) and butyl acrylate (BuA). The polymer films were annealed under microwave irradiation of 60 seconds at 10 watts. Atomic force microscopy (AFM) was used to study the orientation of the nano-segregation without destruction of the microstructure. Then this MBM copolymer was used as a binder to produce polymer electrodes by screen printing. The MBM is mixed with conductive graphite particles and then printed on the NAFION substrate to produce an electrode. These electrodes were functionalized with a ruthenium catalyst supplied by the group of Prof. Antoni Llobet and were used in the water oxidation process. We then worked on the synthesis and film structuration of a second block copolymer based on poly (3-hexylthiophene) (P3HT). The conjugated copolymer P3HT-b-PMMA was synthesized by coupling reaction via "click" chemistry. We demonstrate changes in the self-assembly morphology of the copolymer, by introducing an ionic group at the binding unit between the two blocks. Second, we use microwave annealing to destroy the P3HT fibrils. We observe that after annealing at 30W for 1 minute the fibrils disappear and highly ordered morphologies are successfully created. Finally, we present the synthesis of a new macromolecular catalyst based on P3HT to be integrated into the electrode for the production of hydrogen (reduction of protons). A simple, copper-free cycloaddition process is presented to couple a complex cobalt catalyst (provided by Vincent Artero's group) and the polymer. The electrochemical properties of the P3HT-Co catalyst were characterized by cyclic voltammetry.
Selective Directed Self Assembly Of Coexisting Morphologies Using Block Copolymer Blends
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Author :
language : en
Publisher:
Release Date : 2016
Selective Directed Self Assembly Of Coexisting Morphologies Using Block Copolymer Blends written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with categories.
Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.
Directed Self Assembly Of Block Co Polymers For Nano Manufacturing
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Author : Roel Gronheid
language : en
Publisher: Woodhead Publishing
Release Date : 2015-07-17
Directed Self Assembly Of Block Co Polymers For Nano Manufacturing written by Roel Gronheid and has been published by Woodhead Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-07-17 with Technology & Engineering categories.
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
Block Copolymer Self Assembly And Templating Strategies
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Author : Wubin Bai
language : en
Publisher:
Release Date : 2016
Block Copolymer Self Assembly And Templating Strategies written by Wubin Bai and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with categories.
Block copolymers microphase separate to form periodic patterns with period of a few nm and above without the need for lithographic guidance. These self-assembled nanostructures have a variety of bulk geometries (alternating lamellae, gyroids, cylinder or sphere arrays, tiling patterns, core-shell structures) depending on the molecular architecture of the polymer and the volume fraction of its blocks. And in thin films, surface interaction and commensurability effect influence the self-assembly and result in more diverse morphologies including hexagonal-packed perforated lamellae, square array of holes. The progress of self-assembly can be tracked in situ using Grazing Incidence Small Angle X-ray Scattering, and the annealed morphology can be revealed in 3D using TEM tomography. Moreover, non-bulk morphologies can be produced, the ordering of the microdomains can be improved and their locations directed using various templates and processing strategies. The blocks can themselves constitute a functional material, such as a photonic crystal, or they can be used as a mask to pattern other functional materials, functionalized directly by various chemical approaches, or used as a scaffold to assemble nanoparticles or other nanostructures. Block copolymers therefore offer tremendous flexibility in creating nanostructured materials with a range of applications in microelectronics, photovoltaics, filtration membranes and other devices.