Cleaning Technology In Semiconductor Device Manufacturing Viii
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Cleaning Technology In Semiconductor Device Manufacturing Viii
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Author : Jerzy Rużyłło
language : en
Publisher: The Electrochemical Society
Release Date : 2004
Cleaning Technology In Semiconductor Device Manufacturing Viii written by Jerzy Rużyłło and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.
Cleaning Technology In Semiconductor Device Manufacturing
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Author :
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Cleaning Technology In Semiconductor Device Manufacturing written by and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
Cleaning Technology In Semiconductor Device Manufacturing
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Author :
language : en
Publisher:
Release Date : 2003
Cleaning Technology In Semiconductor Device Manufacturing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Semiconductor wafers categories.
Handbook Of Silicon Wafer Cleaning Technology
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Author : Karen Reinhardt
language : en
Publisher: William Andrew
Release Date : 2018-03-16
Handbook Of Silicon Wafer Cleaning Technology written by Karen Reinhardt and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-03-16 with Technology & Engineering categories.
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Proceedings Of The Fourth International Symposium On Cleaning Technology In Semiconductor Device Manufacturing
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Author : Richard E. Novak
language : en
Publisher: The Electrochemical Society
Release Date : 1996
Proceedings Of The Fourth International Symposium On Cleaning Technology In Semiconductor Device Manufacturing written by Richard E. Novak and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Technology & Engineering categories.
Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 10
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Author : Takeshi Hattori
language : en
Publisher: The Electrochemical Society
Release Date : 2007
Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 10 written by Takeshi Hattori and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Microelectronics categories.
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 11
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Author : Takeshi Hattori
language : en
Publisher: The Electrochemical Society
Release Date : 2009-09
Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 11 written by Takeshi Hattori and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-09 with Semiconductor wafers categories.
This issue of ECS Transactions includes papers presented during the 11th International Symposium on Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing held during the ECS Fall Meeting in Vienna, Austria, October 4-9, 2009.
Handbook For Cleaning For Semiconductor Manufacturing
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Author : Karen A. Reinhardt
language : en
Publisher: John Wiley & Sons
Release Date : 2011-04-12
Handbook For Cleaning For Semiconductor Manufacturing written by Karen A. Reinhardt and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-04-12 with Technology & Engineering categories.
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Semiconductor Cleaning Technology 1989
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Author : Jerzy Ruzyllo
language : en
Publisher:
Release Date : 1990
Semiconductor Cleaning Technology 1989 written by Jerzy Ruzyllo and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with categories.
Handbook Of Semiconductor Wafer Cleaning Technology
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Author : Werner Kern
language : en
Publisher: William Andrew
Release Date : 1993-12-31
Handbook Of Semiconductor Wafer Cleaning Technology written by Werner Kern and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993-12-31 with Science categories.
Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field.