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Compound Semiconductor Surface Passivation And Novel Device Processing


Compound Semiconductor Surface Passivation And Novel Device Processing
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Compound Semiconductor Surface Passivation And Novel Device Processing Volume 573


Compound Semiconductor Surface Passivation And Novel Device Processing Volume 573
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Author : H. Hasegawa
language : en
Publisher:
Release Date : 1999-07-13

Compound Semiconductor Surface Passivation And Novel Device Processing Volume 573 written by H. Hasegawa and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-07-13 with Technology & Engineering categories.


Compound semiconductors, such as GaAs and InP, typically have relatively high surface recombination velocities compared to silicon, and are subject to disruption of the surface during device processing. These two themes formed the basis for the April 1999 symposium. The 34 papers are divided into five broad topics areas: fundamentals of surfaces and their passivation, novel approaches for surface passivation and device processing, the structural, transport and optical properties of oxides, compound semiconductor surface passivation and novel device processing, and electronic devices and processing. Annotation copyrighted by Book News, Inc., Portland, OR



Compound Semiconductor Surface Passivation And Novel Device Processing


Compound Semiconductor Surface Passivation And Novel Device Processing
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Author : H. Hasegawa
language : en
Publisher: Cambridge University Press
Release Date : 2014-06-05

Compound Semiconductor Surface Passivation And Novel Device Processing written by H. Hasegawa and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-06-05 with Technology & Engineering categories.


This book covers a wide range of activity in the field of passivation and control of compound semiconductor surfaces and associated novel processing techniques for electronic and photonic devices. The markets for GaAs and InP-based electronics cover wireless communication, mobile phones, defense applications where radiation-hardness is critical, automobile collision avoidance radar and satellites. On the photonics side, displays, communications systems, infrared and UV detectors and lighting applications are prime markets. In all of these devices there is a critical need for control of the surface properties and for reliable long-term encapsulation/passivation of the surface. Compound semiconductors typically have relatively high surface recombination velocities and novel processing methods which minimize surface damage are, therefore, extremely important. Surface passivation and novel device processing form the basis for the book. Topics include: fundamentals of surfaces and their passivation; novel approaches for surface passivation and device processing; oxides - structural, transport and optical properties; compound semiconductor surface passivation and novel device processing and electronic devices and processing.



State Of The Art Program On Compound Semiconductors Xxxvi And Wide Bandgap Semiconductors For Photonic And Electronic Devices And Sensors Ii


State Of The Art Program On Compound Semiconductors Xxxvi And Wide Bandgap Semiconductors For Photonic And Electronic Devices And Sensors Ii
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Author : Electrochemical Society. Electronics Division
language : en
Publisher: The Electrochemical Society
Release Date : 2002

State Of The Art Program On Compound Semiconductors Xxxvi And Wide Bandgap Semiconductors For Photonic And Electronic Devices And Sensors Ii written by Electrochemical Society. Electronics Division and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Technology & Engineering categories.




Microelectronics Technology And Devices


Microelectronics Technology And Devices
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Author :
language : en
Publisher: The Electrochemical Society
Release Date : 2005

Microelectronics Technology And Devices written by and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Electrochemistry categories.




Silicon Nitride And Silicon Dioxide Thin Insulating Films


Silicon Nitride And Silicon Dioxide Thin Insulating Films
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Author : Electrochemical Society. Dielectric Science and Technology Division
language : en
Publisher: The Electrochemical Society
Release Date : 2001

Silicon Nitride And Silicon Dioxide Thin Insulating Films written by Electrochemical Society. Dielectric Science and Technology Division and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Science categories.




Silicon Nitride And Silicon Dioxide Thin Insulating Films


Silicon Nitride And Silicon Dioxide Thin Insulating Films
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Author :
language : en
Publisher:
Release Date : 2001

Silicon Nitride And Silicon Dioxide Thin Insulating Films written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Silicon dioxide categories.




Control Of Semiconductor Interfaces


Control Of Semiconductor Interfaces
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Author : I. Ohdomari
language : en
Publisher: Elsevier
Release Date : 2017-05-03

Control Of Semiconductor Interfaces written by I. Ohdomari and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-05-03 with Science categories.


This book focuses exclusively on control of interfacial properties and structures for semiconductor device applications from the point of view of improving and developing novel electrical properties. The following topics are covered: metal-semiconductors, semiconductor hetero-interfaces, characterization, semiconducting new materials, insulator-semiconductor, interfaces in device, control of interface formation, control of interface properties, contact metallization.A variety of up-to-date research topics such as atomic layer epitaxy, atomic layer passivation, atomic scale characterization including STM and SR techniques, single ion implementation, self-organization crystal growth, in situ measurements for process control and extremely high-spatial resolution analysis techniques, are also included. Furthermore it bridges the macroscopic, mesoscopic, and atomic-scale regimes of semicondutor interfaces, describing the state of the art in forming, controlling and characterizating unique semiconductor interfaces, which will be of practical importance in advanced devices. Intended for both technologists who require an up-to-date assessment of methods for interface formation, processing and characterization, and solid state researchers who desire the latest developments in understanding the basic mechanisms of interface physics, chemistry and electronics, this book will be a welcome addition to the existing literature.



Scientific And Technical Aerospace Reports


Scientific And Technical Aerospace Reports
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Author :
language : en
Publisher:
Release Date : 1995

Scientific And Technical Aerospace Reports written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Aeronautics categories.




Ultrathin Sio2 And High K Materials For Ulsi Gate Dielectrics Volume 567


Ultrathin Sio2 And High K Materials For Ulsi Gate Dielectrics Volume 567
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Author : H. R. Huff
language : en
Publisher:
Release Date : 1999-09

Ultrathin Sio2 And High K Materials For Ulsi Gate Dielectrics Volume 567 written by H. R. Huff and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-09 with Technology & Engineering categories.


Device scaling has been the engine driving the continued pervasiveness of the microelectronics revolution. The SIA roadmap calls for 4-5nm films (oxide equivalent thickness) in 2000, and



Multicomponent Oxide Films For Electronics Volume 574


Multicomponent Oxide Films For Electronics Volume 574
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Author : Marilyn Hawley
language : en
Publisher:
Release Date : 1999-10-06

Multicomponent Oxide Films For Electronics Volume 574 written by Marilyn Hawley and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-06 with Science categories.


The exceptional properties of multicomponent oxides, combined with the inability of simpler materials to meet the increasing demands of the electronics industry, have motivated tremendous interest and activity in utilizing multicomponent oxides for electronic applications. For these applications, it is often desirable to integrate complex oxides in thin-film form with other materials. This book focuses on common materials issues involved in the processing and characterization of multicomponent oxides and how these issues relate to device applications. Papers range from theoretical explanations of the magnetic and electronic properties of transition metal oxides, to integration with silicon technology. Noteworthy is the progress being made in the deposition and characterization of these complex materials, as well as their applicability in ferroelectric memories, MOSFETs, optical devices, infrared imaging arrays, etc. Topics include: epitaxial multicomponent oxide film growth; properties, characterization and modeling; properties of multicomponent oxides; and multicomponent oxide devices.