Electron Cyclotron Resonance Ion Sources And Ecr Plasmas

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Electron Cyclotron Resonance Ion Sources And Ecr Plasmas

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Author : R Geller
language : en
Publisher: CRC Press
Release Date : 1996-01-01

Electron Cyclotron Resonance Ion Sources And Ecr Plasmas written by R Geller and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-01-01 with Science categories.

Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.

Electron Cyclotron Resonance Ion Sources And Ecr Plasmas

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Author : R Geller
language : en
Publisher: Routledge
Release Date : 2018-12-13

Electron Cyclotron Resonance Ion Sources And Ecr Plasmas written by R Geller and has been published by Routledge this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-12-13 with Science categories.

Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

Perturbative Measurements Of Electron Cyclotron Resonance Ion Source Plasmas

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Author : Derek Elwin Neben
language : en
Publisher:
Release Date : 2019

Perturbative Measurements Of Electron Cyclotron Resonance Ion Source Plasmas written by Derek Elwin Neben and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with Electronic dissertations categories.

Heavy ion accelerators are a valuable resource for the nuclear science community to study atomic physics. One such heavy ion accelerator is the Coupled Cyclotron Facility (CCF) at the National Superconducting Cyclotron Laboratory (NSCL) which relies on Electron Cyclotron Resonance (ECR) ion sources to provide the primary beam to the target. ECR ion sources are essential for the efficient operation of research accelerators such as the CCF, providing high currents of highly charged ions. Highly charged ion beams increase the efficiency of the accelerators, but require longer confinement times and higher temperature plasmas in the ion sources than is necessary to produce singly charged beams. The need to use high temperature and low density plasmas creates challenges including those relating to plasma stability. ECR ion sources provide a good platform to accept metallic vapor ovens and sputtering probes allowing the CCF to accelerate up to 30 types of beams ranging from oxygen to uranium. Furthermore, ECR ion sources use no filaments or cathodes providing a high degree of reliability for the accelerator facility. As the intensity frontier demands ever rarer isotopes from accelerator facilities, the heavy ion beam intensity must increase [70], which creates new demands from the ion sources.The work presented within this dissertation set out to better understand the mechanism that confines highly charged ions in the ECR plasma. Specifically, it was explored if hot electrons (energy larger than 50 keV) contribute to ion confinement by generating an electrostatic well in the plasma potential [68]. Perturbative measurements of ECR ion sources are presented with the aim to explore ion confinement times: pulsed sputtering (Chapter 4) and amplitude modulation (Chapter 5). Chapter 3 explores the geometry of the sputtering probe with respect to the magnetic field which was crucial to produce reliable pulsed sputtering results on the ECR ion source. Axial pulsed sputtering, which could be conveniently implemented on fully superconducting sources, incorporated a bias disc effect that highly perturbed the plasma. Radial sputtering was emulated by placing a semi-shielded probe along the plasma chamber wall in between the electron loss surfaces.Ion confinement time was characterized through the decay time of the beam current, which is proportional to ion confinement time. Ion beam decay times were measured for different charge states of gold in an oxygen plasma in Chapter 4. Decay time always increased with increasing charge state. Decay time also increased with hot electron temperature for lower frequency operation (13 GHz), but reached an optimized value for higher frequency operation (18 GHz) due to plasma instabilities. Electrostatic confinement of ions appeared to be the most plausible mechanism to explain the observed decay time behaviors. A novel perturbative measurement technique was developed for ECR ion sources using Amplitude Modulation (AM) of microwave power. The AM measurement was originally motivated by whether or not 50~kHz modulation in microwave power (from the microwave source) would be observable in the beam current. A systematic study was organized on the University of Jyvaskyla Physics Department (JYFL) normal conducting ECR ion source in Jyvaskyla Finland. Chapter 5 presents the beam current response to AM on the 14 GHz ECR ion source for different weights of noble gases, magnetic fields, and vacuum pressures. The beam current amplitude generally decayed exponentially for frequencies higher than around 400 Hz with the modulation highly suppressed at 10 kHz.

Handbook Of Ion Sources

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Author : Bernhard Wolf
language : en
Publisher: CRC Press
Release Date : 2017-07-12

Handbook Of Ion Sources written by Bernhard Wolf and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-07-12 with Technology & Engineering categories.

The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Nuclear Physics And Astrophysics In Plasma Traps

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Author : David Mascali
language : en
Publisher: Frontiers Media SA
Release Date : 2023-01-04

Nuclear Physics And Astrophysics In Plasma Traps written by David Mascali and has been published by Frontiers Media SA this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-01-04 with Science categories.

Plasma Sources For Thin Film Deposition And Etching

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Author : Maurice H. Francombe
language : en
Publisher: Academic Press
Release Date : 2013-10-22

Plasma Sources For Thin Film Deposition And Etching written by Maurice H. Francombe and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-22 with Technology & Engineering categories.

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. - Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed - Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils - Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology - Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination

Advances In Imaging And Electron Physics

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Author : Peter W. Hawkes
language : en
Publisher: Elsevier
Release Date : 2011-07-29

Advances In Imaging And Electron Physics written by Peter W. Hawkes and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-07-29 with Technology & Engineering categories.

Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Scientific And Technical Aerospace Reports

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Author :
language : en
Publisher:
Release Date : 1995

Scientific And Technical Aerospace Reports written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Aeronautics categories.

Modern Microwave And Millimeter Wave Power Electronics

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Author : Gregory S. Nusinovich
language : en
Publisher: John Wiley & Sons
Release Date : 2005-04-19

Modern Microwave And Millimeter Wave Power Electronics written by Gregory S. Nusinovich and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-04-19 with Technology & Engineering categories.

A comprehensive study of microwave vacuum electronic devices and their current and future applications While both vacuum and solid-state electronics continue to evolve and provide unique solutions, emerging commercial and military applications that call for higher power and higher frequencies to accommodate massive volumes of transmitted data are the natural domain of vacuum electronics technology. Modern Microwave and Millimeter-Wave Power Electronics provides systems designers, engineers, and researchers-especially those with primarily solid-state training-with a thoroughly up-to-date survey of the rich field of microwave vacuum electronic device (MVED) technology. This book familiarizes the R&D and academic communities with the capabilities and limitations of MVED and highlights the exciting scientific breakthroughs of the past decade that are dramatically increasing the compactness, efficiency, cost-effectiveness, and reliability of this entire class of devices. This comprehensive text explores a wide range of topics: Traveling-wave tubes, which form the backbone of satellite and airborne communications, as well as of military electronic countermeasures systems Microfabricated MVEDs and advanced electron beam sources Klystrons, gyro-amplifiers, and crossed-field devices "Virtual prototyping" of MVEDs via advanced 3-D computational models High-Power Microwave (HPM) sources Next-generation microwave structures and circuits How to achieve linear amplification Advanced materials technologies for MVEDs A Web site appendix providing a step-by-step walk-through of a typical MVED design process Concluding with an in-depth examination of emerging applications and future possibilities for MVEDs, Modern Microwave and Millimeter-Wave Power Electronics ensures that systems designers and engineers understand and utilize the significant potential of this mature, yet continually developing technology. SPECIAL NOTE: All of the editors' royalties realized from the sale of this book will fund the future research and publication activities of graduate students in the vacuum electronics field.

Compact Plasma And Focused Ion Beams

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Author : Sudeep Bhattacharjee
language : en
Publisher: Taylor & Francis
Release Date : 2013-12-12

Compact Plasma And Focused Ion Beams written by Sudeep Bhattacharjee and has been published by Taylor & Francis this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-12-12 with Science categories.

Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wave propagation in waveguides and plasma diagnostics, the author goes on to explain in detail the plasma production by microwaves in a compact geometry and narrow tubes. He then thoroughly discusses wave interaction with bounded plasmas and provides a deeper understanding of the physics. The book concludes with an up-to-date account of recent research on pulsed microwaves and the application of compact microwave plasmas for multi-element FIB. It provides a consolidated and unified description of the emerging areas in plasma science and technology utilizing wave-based plasma sources based on the author’s own work and experience. The book will be useful not only to established researchers in this area but will also serve as an excellent introduction to those interested in applying these ideas to various current and new applications.