Electron Microscopy Of Semiconducting Materials And Ulsi Devices
DOWNLOAD
Download Electron Microscopy Of Semiconducting Materials And Ulsi Devices PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Electron Microscopy Of Semiconducting Materials And Ulsi Devices book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Electron Microscopy Of Semiconducting Materials And Ulsi Devices
DOWNLOAD
Author : Clive Hayzelden
language : en
Publisher:
Release Date : 1998
Electron Microscopy Of Semiconducting Materials And Ulsi Devices written by Clive Hayzelden and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Technology & Engineering categories.
The first symposium on electron microscopy and materials for ultra-large scale integration (ULSI) at the Society's meeting attracted 34 papers by contributors from Asia, North America, and Europe. They cover specimen preparation and defect analysis in semiconductor devices; metallization, silicides, and diffusion barriers; the advanced characterization of ULSI structures, and semiconductor epitaxy and heterostructures. Annotation copyrighted by Book News, Inc., Portland, OR
Microscopy Of Semiconducting Materials
DOWNLOAD
Author : A.G Cullis
language : en
Publisher: CRC Press
Release Date : 2000-01-01
Microscopy Of Semiconducting Materials written by A.G Cullis and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-01-01 with Science categories.
With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigat
Ulsi Semiconductor Technology Atlas
DOWNLOAD
Author : Chih-Hang Tung
language : en
Publisher: John Wiley & Sons
Release Date : 2003-10-06
Ulsi Semiconductor Technology Atlas written by Chih-Hang Tung and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-10-06 with Technology & Engineering categories.
More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) refers to semiconductor chips with more than 10 million devices per chip. Written by three renowned pioneers in their field, ULSI Semiconductor Technology Atlas uses examples and TEM (Transmission Electron Microscopy) micrographs to explain and illustrate ULSI process technologies and their associated problems. The first book available on the subject to be illustrated using TEM images, ULSI Semiconductor Technology Atlas is logically divided into four parts: * Part I includes basic introductions to the ULSI process, device construction analysis, and TEM sample preparation * Part II focuses on key ULSI modules--ion implantation and defects, dielectrics and isolation structures, silicides/salicides, and metallization * Part III examines integrated devices, including complete planar DRAM, stacked cell DRAM, and trench cell DRAM, as well as SRAM as examples for process integration and development * Part IV emphasizes special applications, including TEM in advanced failure analysis, TEM in advanced packaging development and UBM (Under Bump Metallization) studies, and high-resolution TEM in microelectronics This innovative guide also provides engineers and managers in the microelectronics industry, as well as graduate students, with: * More than 1,100 TEM images to illustrate the science of ULSI * A historical introduction to the technology as well as coverage of the evolution of basic ULSI process problems and issues * Discussion of TEM in other advanced microelectronics devices and materials, such as flash memories, SOI, SiGe devices, MEMS, and CD-ROMs
National Semiconductor Metrology Program Nist List Of Publications Lp 103 May 2000
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 2000
National Semiconductor Metrology Program Nist List Of Publications Lp 103 May 2000 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with categories.
National Semiconductor Metrology Program Semiconductor Electronics Division Nist List Of Publications Lp 103 March 1999
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1999
National Semiconductor Metrology Program Semiconductor Electronics Division Nist List Of Publications Lp 103 March 1999 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with categories.
National Semiconductor Metrology Program
DOWNLOAD
Author : National Institute of Standards and Technology (U.S.)
language : en
Publisher:
Release Date : 2000
National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Semiconductors categories.
National Semiconductor Metrology Program
DOWNLOAD
Author : National Semiconductor Metrology Program (U.S.)
language : en
Publisher:
Release Date : 2000
National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Semiconductors categories.
Microscopy Of Semiconducting Materials 1987 Proceedings Of The Institute Of Physics Conference Oxford University April 1987
DOWNLOAD
Author : Cullis
language : en
Publisher: CRC Press
Release Date : 1987-10-01
Microscopy Of Semiconducting Materials 1987 Proceedings Of The Institute Of Physics Conference Oxford University April 1987 written by Cullis and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1987-10-01 with Technology & Engineering categories.
The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Microscopy Of Semiconducting Materials 1987 Proceedings Of The Institute Of Physics Conference Oxford University April 1987
DOWNLOAD
Author : A.G. Cullis
language : en
Publisher: CRC Press
Release Date : 2021-02-01
Microscopy Of Semiconducting Materials 1987 Proceedings Of The Institute Of Physics Conference Oxford University April 1987 written by A.G. Cullis and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-02-01 with Science categories.
The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Semiconductor Material And Device Characterization
DOWNLOAD
Author : Dieter K. Schroder
language : en
Publisher: John Wiley & Sons
Release Date : 2015-06-29
Semiconductor Material And Device Characterization written by Dieter K. Schroder and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-06-29 with Technology & Engineering categories.
This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.