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Fundamentals Of Semiconductor Fabrication


Fundamentals Of Semiconductor Fabrication
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Fundamentals Of Semiconductor Fabrication


Fundamentals Of Semiconductor Fabrication
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Author : Gary S. May
language : en
Publisher: John Wiley & Sons
Release Date : 2004

Fundamentals Of Semiconductor Fabrication written by Gary S. May and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Integrated circuits categories.


"This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Computer Modeling & Simulation tools throughout. Process simulation is used as a tool for what-if analysis and discussion. Comprehensive coverage of process sequence helps readers connect individual steps into a cohesive whole."--



Fundamentals Of Semiconductor Processing Technology


Fundamentals Of Semiconductor Processing Technology
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Author : Badih El-Kareh
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Fundamentals Of Semiconductor Processing Technology written by Badih El-Kareh and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.


The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.



Microchip Fabrication


Microchip Fabrication
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Author :
language : en
Publisher:
Release Date : 2004

Microchip Fabrication written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Integrated circuits categories.




Fundamentals Of Semiconductor Fabrication


Fundamentals Of Semiconductor Fabrication
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Author : Gary S. May
language : en
Publisher: Wiley
Release Date : 2003-04-11

Fundamentals Of Semiconductor Fabrication written by Gary S. May and has been published by Wiley this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-11 with Technology & Engineering categories.


Offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence Presents comprehensive coverage of process sequences Introduces readers to modern simulation tools Addresses the practical aspects of integrated circuit fabrication Clearly explains basic processing theory



Fundamentals Of Iii V Semiconductor Mosfets


Fundamentals Of Iii V Semiconductor Mosfets
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Author : Serge Oktyabrsky
language : en
Publisher: Springer Science & Business Media
Release Date : 2010-03-16

Fundamentals Of Iii V Semiconductor Mosfets written by Serge Oktyabrsky and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-03-16 with Technology & Engineering categories.


Fundamentals of III-V Semiconductor MOSFETs presents the fundamentals and current status of research of compound semiconductor metal-oxide-semiconductor field-effect transistors (MOSFETs) that are envisioned as a future replacement of silicon in digital circuits. The material covered begins with a review of specific properties of III-V semiconductors and available technologies making them attractive to MOSFET technology, such as band-engineered heterostructures, effect of strain, nanoscale control during epitaxial growth. Due to the lack of thermodynamically stable native oxides on III-V's (such as SiO2 on Si), high-k oxides are the natural choice of dielectrics for III-V MOSFETs. The key challenge of the III-V MOSFET technology is a high-quality, thermodynamically stable gate dielectric that passivates the interface states, similar to SiO2 on Si. Several chapters give a detailed description of materials science and electronic behavior of various dielectrics and related interfaces, as well as physics of fabricated devices and MOSFET fabrication technologies. Topics also include recent progress and understanding of various materials systems; specific issues for electrical measurement of gate stacks and FETs with low and wide bandgap channels and high interface trap density; possible paths of integration of different semiconductor materials on Si platform.



Fundamental Principles Of Optical Lithography


Fundamental Principles Of Optical Lithography
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Author : Chris Mack
language : en
Publisher: John Wiley & Sons
Release Date : 2008-03-11

Fundamental Principles Of Optical Lithography written by Chris Mack and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-03-11 with Technology & Engineering categories.


The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.



Iii V Integrated Circuit Fabrication Technology


Iii V Integrated Circuit Fabrication Technology
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Author : Shiban Tiku
language : en
Publisher: CRC Press
Release Date : 2016-04-27

Iii V Integrated Circuit Fabrication Technology written by Shiban Tiku and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-04-27 with Science categories.


GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III-V processing, with emphasis on HBTs. It is aimed at practicing



Process Engineering Analysis In Semiconductor Device Fabrication


Process Engineering Analysis In Semiconductor Device Fabrication
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Author : Stanley Middleman
language : en
Publisher: McGraw-Hill Companies
Release Date : 1993

Process Engineering Analysis In Semiconductor Device Fabrication written by Stanley Middleman and has been published by McGraw-Hill Companies this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Technology & Engineering categories.


Written primarily for chemical engineering students, the material included in this new text is an extension of upper level chemical engineering courses. Covering a range of processes in semiconductor device fabrication, the authors try to present traditional chemical engineering methodology in a non-traditional context. The text covers such topics as crystal growth and filtration and contains over 300 worked examples and problems.



Vlsi Fabrication Principles


Vlsi Fabrication Principles
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Author : Sorab Khushro Ghandhi
language : en
Publisher: John Wiley & Sons
Release Date : 1983

Vlsi Fabrication Principles written by Sorab Khushro Ghandhi and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 1983 with Science categories.


Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.



The Science And Engineering Of Microelectronic Fabrication


The Science And Engineering Of Microelectronic Fabrication
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Author : Stephen A. Campbell
language : en
Publisher: Oxford University Press, USA
Release Date : 1996

The Science And Engineering Of Microelectronic Fabrication written by Stephen A. Campbell and has been published by Oxford University Press, USA this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Technology & Engineering categories.


The Science and Engineering of Microelectronic Fabrication provides an introduction to microelectronic processing. Geared towards a wide audience, it may be used as a textbook for both first year graduate and upper level undergraduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, nonoptical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The book also makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest.