Glow Discharge Processes
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Glow Discharge Processes
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Author : Brian Chapman
language : en
Publisher: Wiley-Interscience
Release Date : 1980
Glow Discharge Processes written by Brian Chapman and has been published by Wiley-Interscience this book supported file pdf, txt, epub, kindle and other format this book has been release on 1980 with Science categories.
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Electron Kinetics And Applications Of Glow Discharges
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Author : Uwe Kortshagen
language : en
Publisher: Springer
Release Date : 2006-04-11
Electron Kinetics And Applications Of Glow Discharges written by Uwe Kortshagen and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-04-11 with Science categories.
This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.
Analysis Of Glow Discharges For Understanding The Process Of Film Formation
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Author : Mundiyath Venugopalan
language : en
Publisher:
Release Date : 1984
Analysis Of Glow Discharges For Understanding The Process Of Film Formation written by Mundiyath Venugopalan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1984 with Glow discharges categories.
Plasma Surface Metallurgy
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Author : Zhong Xu
language : en
Publisher: Springer
Release Date : 2017-09-21
Plasma Surface Metallurgy written by Zhong Xu and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-09-21 with Technology & Engineering categories.
This book provides a comprehensive introduction to and technical description of a unique patented surface-modification technology: plasma surface metallurgy with double-glow discharge plasma process, known as the Xu-Tec process. As such it promotes further attention and interest in scientific research and engineering development in this area, as well as industrial utilization and product commercialization. The Xu-Tec process has opened up a new material engineering field of “Plasma Surface Metallurgy”. This surface-modification process can transform many low-grade and low-cost industrial engineering materials into “gold” materials with a high value and high grade or special functions. This improved material can be widely used in industrial production to improve the surface performance and quality of mechanical parts and manufacturing products, and to conserve expensive alloying elements for the benefit of all mankind. “This book will be valuable to those in the general area of surface metallurgy. The substantial description of the Xu-Tec process is very important and should assist in expanding the use of this superior technique. The in-depth explanation of glow discharges and their use in general will also serve as a valuable reference in the field.” James E. Thompson, Prof. Fellow of the IEEE Dean of Engineering Emeritus University of Missouri, Columbia, Missouri, USA November, 2016 "A BREAKTHROUGH IN MAKING METAL TOUGHER". ---- SCIENCE & TECHNOLOGY Business Week, July 24, 1989 “NOVEL SURFACE ALLOYING PROCESS” --- THE LEADING EDGE TECHNOLOGY WORDWIDE Materials and Processing Report, Dec. 1987
Glow Discharge Spectroscopies
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Author : R. Kenneth Marcus
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-06-29
Glow Discharge Spectroscopies written by R. Kenneth Marcus and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-06-29 with Science categories.
In response to the demands of contemporary solid material analysis-greater powers of detection, speed, depth, and precision-glow devices are receiving increased attention by specialists. This volume covers fundamental plasma processes, laser-based methods, thin film analysis, and many other processes to provide the researcher with an extensive technical reference of these devices.
Glow Discharge Material Processing
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Author : R. A. Dugdale
language : en
Publisher:
Release Date : 1971
Glow Discharge Material Processing written by R. A. Dugdale and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1971 with Electron beams categories.
High Power Impulse Magnetron Sputtering
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Author : Daniel Lundin
language : en
Publisher:
Release Date : 2019-09-13
High Power Impulse Magnetron Sputtering written by Daniel Lundin and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-09-13 with Technology & Engineering categories.
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
Plasma Surface Metallurgy
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Author : David Zhong Xu
language : en
Publisher:
Release Date : 2017
Plasma Surface Metallurgy written by David Zhong Xu and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with Metals categories.
Microelectronic Materials And Processes
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Author : Roland Levy
language : en
Publisher: Springer Science & Business Media
Release Date : 1989-01-31
Microelectronic Materials And Processes written by Roland Levy and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989-01-31 with Technology & Engineering categories.
The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.
Introduction To The Kinetics Of Glow Discharges
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Author : Chengxun Yuan
language : en
Publisher: Morgan & Claypool Publishers
Release Date : 2018-08-20
Introduction To The Kinetics Of Glow Discharges written by Chengxun Yuan and has been published by Morgan & Claypool Publishers this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-08-20 with Science categories.
Electric glow discharges (glows) can be found almost everywhere, from atmospheric electricity to modern plasma technologies, and have long been the object of research. The main purpose of this book is to provide simple illustrations of the basic physical mechanisms and principles that determine the properties of electric glow discharges. It should enable readers to successfully participate in scientific and technical progress.