Growth And Printability Of Multilayer Phase Defects On Euv Maskblanks

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Growth And Printability Of Multilayer Phase Defects On Euv Maskblanks
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Author :
language : en
Publisher:
Release Date : 2007
Growth And Printability Of Multilayer Phase Defects On Euv Maskblanks written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with categories.
The ability to fabricate defect-free mask blanks is a well-recognized challenge in enabling extreme ultraviolet lithography (EUVL) for semiconductor manufacturing. Both the specification and reduction of defects necessitate the understanding of their printability and how they are generated and grow during Mo-Si multilayer (ML) deposition. A ML phase defect can be depicted by its topographical profile on the surface as either a bump or pit, which is then characterized by height or depth and width. The complexity of such seemingly simple phase defects lies in the many ways they can be generated and the difficulties of measuring their physical shape/size and optical effects on printability. An effective way to study phase defects is to use a programmed defect mask (PDM) as 'model' test sample where the defects are produced with controlled growth on a ML blank and accurate placement in varying proximity to absorber patterns on the mask. This paper describes our recent study of ML phase defect printability with resist data from exposures of a ML PDM on the EUV micro-exposure tool (MET, 5X reduction with 0.3NA).
Acoustic Scanning Probe Microscopy
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Author : Francesco Marinello
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-10-04
Acoustic Scanning Probe Microscopy written by Francesco Marinello and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-10-04 with Technology & Engineering categories.
The combination of atomic force microscopy with ultrasonic methods allows the nearfield detection of acoustic signals. The nondestructive characterization and nanoscale quantitative mapping of surface adhesion and stiffness or friction is possible. The aim of this book is to provide a comprehensive review of different scanning probe acoustic techniques, including AFAM, UAFM, SNFUH, UFM, SMM and torsional tapping modes. Basic theoretical explanations are given to understand not only the probe dynamics but also the dynamics of tip surface contacts. Calibration and enhancement are discussed to better define the performance of the techniques, which are also compared with other classical techniques such as nanoindentation or surface acoustic wave. Different application fields are described, including biological surfaces, polymers and thin films.
Emlc 2005
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Author : Uwe Behringer
language : en
Publisher: Margret Schneider
Release Date : 2005
Emlc 2005 written by Uwe Behringer and has been published by Margret Schneider this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Extreme Ultraviolet Euv Holographic Metrology For Lithography Applications
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Author : Sang-hun Yi
language : en
Publisher:
Release Date : 2000
Extreme Ultraviolet Euv Holographic Metrology For Lithography Applications written by Sang-hun Yi and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with categories.
Handbook Of Nanophysics
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Author : Klaus D. Sattler
language : en
Publisher: CRC Press
Release Date : 2010-09-17
Handbook Of Nanophysics written by Klaus D. Sattler and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-09-17 with Science categories.
Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Annual Symposium On Photomask Technology
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Author :
language : en
Publisher:
Release Date : 1999
Annual Symposium On Photomask Technology written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Integrated circuits categories.
European Conference On Mask Technology For Integrated Circuits And Microcomponents
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Author :
language : en
Publisher:
Release Date : 1999
European Conference On Mask Technology For Integrated Circuits And Microcomponents written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Integrated circuits categories.
Japanese Journal Of Applied Physics
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Author :
language : en
Publisher:
Release Date : 2006
Japanese Journal Of Applied Physics written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Physics categories.
Photomask And Next Generation Lithography Mask Technology Xi
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Author :
language : en
Publisher:
Release Date : 2004
Photomask And Next Generation Lithography Mask Technology Xi written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Integrated circuits categories.
Memorandum
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Author :
language : en
Publisher:
Release Date : 2000
Memorandum written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Electric engineering categories.