Handbook Of Critical Dimension Metrology And Process Control
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Handbook Of Critical Dimension Metrology And Process Control
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Author : Kevin M. Monahan
language : en
Publisher:
Release Date : 1994
Handbook Of Critical Dimension Metrology And Process Control written by Kevin M. Monahan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Electronic industries categories.
Handbook Of Critical Dimension Metrology And Process Control
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Author : Kevin M. Monahan
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 1994
Handbook Of Critical Dimension Metrology And Process Control written by Kevin M. Monahan and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Technology & Engineering categories.
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Handbook Of Microlithography Micromachining And Microfabrication Microlithography
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Author : P. Rai-Choudhury
language : en
Publisher: IET
Release Date : 1997
Handbook Of Microlithography Micromachining And Microfabrication Microlithography written by P. Rai-Choudhury and has been published by IET this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Technology & Engineering categories.
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
National Semiconductor Metrology Program
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Author : National Semiconductor Metrology Program (U.S.)
language : en
Publisher:
Release Date : 2000
National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Semiconductors categories.
National Semiconductor Metrology Program
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Author : National Institute of Standards and Technology (U.S.)
language : en
Publisher:
Release Date : 2000
National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Semiconductors categories.
Lithography Process Control
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Author : Harry J. Levinson
language : en
Publisher: SPIE Press
Release Date : 1999
Lithography Process Control written by Harry J. Levinson and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Photography categories.
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Publications Of The National Institute Of Standards And Technology Catalog
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Author : National Institute of Standards and Technology (U.S.)
language : en
Publisher:
Release Date : 1994
Publications Of The National Institute Of Standards And Technology Catalog written by National Institute of Standards and Technology (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with categories.
Principles Of Lithography
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Author : Harry J. Levinson
language : en
Publisher: SPIE Press
Release Date : 2005
Principles Of Lithography written by Harry J. Levinson and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Handbook Of Silicon Semiconductor Metrology
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Author : Alain C. Diebold
language : en
Publisher: CRC Press
Release Date : 2001-06-29
Handbook Of Silicon Semiconductor Metrology written by Alain C. Diebold and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-06-29 with Technology & Engineering categories.
Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay