Handbook Of Multilevel Metallization For Integrated Circuits
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Handbook Of Multilevel Metallization For Integrated Circuits
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Author : Syd R. Wilson
language : en
Publisher: William Andrew
Release Date : 1993
Handbook Of Multilevel Metallization For Integrated Circuits written by Syd R. Wilson and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Technology & Engineering categories.
It is widely recognized that the successful design, development, and integration of multilevel metallization (MLM) systems is and will continue to be key to current and future VLSI technologies. All major semiconductor companies have significant ongoing research teams focused in this area. These teams must view multilevel metallization as a system rather than a collection of isolated process modules.
Handbook Of Thin Film Deposition
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Author : Krishna Seshan
language : en
Publisher: William Andrew
Release Date : 2012-12-06
Handbook Of Thin Film Deposition written by Krishna Seshan and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. - A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications - Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries - The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics - Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM - Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned 'Moore's Law' relating to the technology development cycle in the semiconductor industry
Handbook Of Vacuum Arc Science Technology
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Author : Raymond L. Boxman
language : en
Publisher: William Andrew
Release Date : 1996-12-31
Handbook Of Vacuum Arc Science Technology written by Raymond L. Boxman and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-12-31 with Technology & Engineering categories.
This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
Handbook Of Vlsi Microlithography 2nd Edition
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Author : John N. Helbert
language : en
Publisher: Cambridge University Press
Release Date : 2001-04
Handbook Of Vlsi Microlithography 2nd Edition written by John N. Helbert and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Handbook Of Compound Semiconductors
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Author : Paul H. Holloway
language : en
Publisher: Cambridge University Press
Release Date : 2008-10-19
Handbook Of Compound Semiconductors written by Paul H. Holloway and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-10-19 with Technology & Engineering categories.
This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.
Handbook Of Vlsi Microlithography
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Author : John N. Helbert
language : en
Publisher: William Andrew
Release Date : 2001-04-01
Handbook Of Vlsi Microlithography written by John N. Helbert and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04-01 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon
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Author : Krishna Seshan
language : en
Publisher: CRC Press
Release Date : 2002-02-01
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon written by Krishna Seshan and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-02-01 with Science categories.
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Handbook Of Magneto Optical Data Recording
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Author : Terry W. McDaniel
language : en
Publisher: Elsevier
Release Date : 1995-12-31
Handbook Of Magneto Optical Data Recording written by Terry W. McDaniel and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-12-31 with Technology & Engineering categories.
This handbook brings together in a single volume expert contributions on the many aspects of MO data recording, including the materials in use, techniques for achieving recording function, and storage device subsystems. As a multiple author treatment, it brings perspective from many viewpoints and institutions. The insights delivered should be valuable to a wide audience from students to practitioners in all areas of information storage.
Handbook Of Silicon Wafer Cleaning Technology
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Author : Karen Reinhardt
language : en
Publisher: William Andrew
Release Date : 2008-12-10
Handbook Of Silicon Wafer Cleaning Technology written by Karen Reinhardt and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-12-10 with Technology & Engineering categories.
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. - Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits - As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process - Editors are two of the top names in the field and are both extensively published - Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol
Semiconductor Industrial Hygiene Handbook
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Author : David G. Baldwin
language : en
Publisher: William Andrew
Release Date : 1995-12-31
Semiconductor Industrial Hygiene Handbook written by David G. Baldwin and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-12-31 with Science categories.
This book provides a comprehensive review of the primary industrial hygiene topics relevant to semiconductor processing: chemical and physical agents, and ventilation systems. The book also has excellent chapters on newer industrial hygiene concerns that are not specific to the semiconductor industry: ergonomics, indoor air quality, personal protective equipment, plan review, and records retention. While much of the information in these chapters can be applied to all industries, the focus and orientation is specific to issues in the semiconductor industry.