Improving The Performance Of The Actinic Inspection Tool With An Optimized Alignment Procedure
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Improving The Performance Of The Actinic Inspection Tool With An Optimized Alignment Procedure
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Author :
language : en
Publisher:
Release Date : 2009
Improving The Performance Of The Actinic Inspection Tool With An Optimized Alignment Procedure written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
Extreme ultraviolet (EUV) microscopy is an important tool for the investigation of the performance of EUV masks, for detecting the presence and the characteristics of defects, and for evaluating the effectiveness of defect repair techniques. Aerial image measurement bypasses the difficulties inherent to photoresist imaging and enables high data collection speed and flexibility. It provides reliable and quick feedback for the development of masks and lithography system modeling methods. We operate the SEMATECH Berkeley Actinic Inspection Tool (AIT), a EUV microscope installed at the Advanced Light Source at Lawrence Berkeley National Laboratory. The AIT is equipped with several high-magnification Fresnel zoneplate lenses, with various numerical aperture values, that enable it image the reflective mask surface with various resolution and magnification settings. Although the AIT has undergone significant recent improvements in terms of imaging resolution and illumination uniformity, there is still room for improvement. In the AIT, an off-axis zoneplate lens collects the light coming from the sample and an image of the sample is projected onto an EUV-sensitive CCD camera. The simplicity of the optical system is particularly helpful considering that the AIT alignment has to be performed every time that a sample or a zoneplate is replaced. The alignment is sensitive to several parameters such as the lens position and orientation, the illumination direction and the sample characteristics. Since the AIT works in high vacuum, there is no direct access to the optics or to the sample during the alignment and the measurements. For all these reasons the alignment procedures and feedback can be complex, and in some cases can reduce the overall data throughput of the system. In this paper we review the main strategies and procedures that have been developed for quick and reliable alignments, and we describe the performance improvements we have achieved, in terms of aberration magnitude reduction.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Nasa Tech Brief
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Author :
language : en
Publisher:
Release Date : 1970
Nasa Tech Brief written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with Aeronautics categories.
Cumulative Index To Nasa Tech Briefs
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Author : United States. National Aeronautics and Space Administration
language : en
Publisher:
Release Date : 1970
Cumulative Index To Nasa Tech Briefs written by United States. National Aeronautics and Space Administration and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with NASA tech briefs categories.
The Engineering Index Annual
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Author :
language : en
Publisher:
Release Date : 1988
The Engineering Index Annual written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Engineering categories.
Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Electrical Electronics Abstracts
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Author :
language : en
Publisher:
Release Date : 1997
Electrical Electronics Abstracts written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Electrical engineering categories.
Nasa Sp
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Author :
language : en
Publisher:
Release Date : 1962
Nasa Sp written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1962 with Aeronautics categories.
Index To Nasa Tech Briefs
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Author : United States. National Aeronautics and Space Administration. Technology Utilization Division
language : en
Publisher:
Release Date : 1970
Index To Nasa Tech Briefs written by United States. National Aeronautics and Space Administration. Technology Utilization Division and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with Technology categories.
Cumulative Index To Nasa Tech Briefs 1970 1975
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Author :
language : en
Publisher:
Release Date : 1979
Cumulative Index To Nasa Tech Briefs 1970 1975 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1979 with categories.
Using Aberration Test Patterns To Optimize The Performance Of Euv Aerial Imaging Microscopes
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Author :
language : en
Publisher:
Release Date : 2009
Using Aberration Test Patterns To Optimize The Performance Of Euv Aerial Imaging Microscopes written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a prototype EUV-wavelength zoneplate microscope that provides high quality aerial image measurements of EUV reticles. To simplify and improve the alignment procedure we have created and tested arrays of aberration-sensitive patterns on EUV reticles and we have compared their images collected with the AIT to the expected shapes obtained by simulating the theoretical wavefront of the system. We obtained a consistent measure of coma and astigmatism in the center of the field of view using two different patterns, revealing a misalignment condition in the optics.