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Ion Beam Modification Of Materials

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Ion Beam Modification Of Materials

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Author : International Conference on Ion Beam Modification of Materials
language : en
Publisher:
Release Date : 1985

Ion Beam Modification Of Materials written by International Conference on Ion Beam Modification of Materials and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1985 with categories.

Ion Beam Modification Of Materials

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Author : Bob Averback
language : en
Publisher:
Release Date : 2006

Ion Beam Modification Of Materials written by Bob Averback and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with categories.

Ion Beam Modification Of Materials

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Author :
language : en
Publisher:
Release Date :

Ion Beam Modification Of Materials written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.

Ion Beam Modification Of Materials

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Author : J.S. Williams
language : en
Publisher: Newnes
Release Date : 2012-12-02

Ion Beam Modification Of Materials written by J.S. Williams and has been published by Newnes this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Science categories.

This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.

Conference On Ion Beam Modification Of Materials 6

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Author :
language : en
Publisher:
Release Date : 1988

Conference On Ion Beam Modification Of Materials 6 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with categories.

Ion Implantation And Synthesis Of Materials

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Author : Michael Nastasi
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-05-16

Ion Implantation And Synthesis Of Materials written by Michael Nastasi and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-05-16 with Science categories.

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.