Ion Beam Modification Of Topological Insulator Bismuth Selenide
![Ion Beam Modification Of Topological Insulator Bismuth Selenide](https://ardhindie.com/assets/pdf.png)
DOWNLOAD
Download Ion Beam Modification Of Topological Insulator Bismuth Selenide PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Ion Beam Modification Of Topological Insulator Bismuth Selenide book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Ion Beam Modification Of Topological Insulator Bismuth Selenide
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 2014
Ion Beam Modification Of Topological Insulator Bismuth Selenide written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.
In this study, we demonstrate chemical doping of a topological insulator Bi2Se3 using ion implantation. Ion beam-induced structural damage was characterized using grazing incidence X-ray diffraction and transmission electron microscopy. Ion damage was reversed using a simple thermal annealing step. Carrier-type conversion was achieved using ion implantation followed by an activation anneal in Bi2Se3 thin films. These two sets of experiments establish the feasibility of ion implantation for chemical modification of Bi2Se3, a prototypical topological insulator. Ion implantation can, in principle, be used for any topological insulator. The direct implantation of dopants should allow better control over carrier concentrations for the purposes of achieving low bulk conductivity. Ion implantation also enables the fabrication of inhomogeneously doped structures, which in turn should make possible new types of device designs.
Optical And Electrical Properties Of Topological Insulator Bi2se3
DOWNLOAD
Author : Jiajun Zhu
language : en
Publisher: diplom.de
Release Date : 2017-07-12
Optical And Electrical Properties Of Topological Insulator Bi2se3 written by Jiajun Zhu and has been published by diplom.de this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-07-12 with Science categories.
Topological insulator is one of the hottest research topics in solid state physics. This is the first book to describe the vibrational spectroscopies and electrical transport of topological insulator Bi2Se3, one of the most exciting areas of research in condensed matter physics. In particular, attempts have been made to summarize and develop the various theories and new experimental techniques developed over years from the studies of Raman scattering, infrared spectroscopy and electrical transport of topological insulator Bi2Se3. It is intended for material and physics researchers and graduate students doing research in the field of optical and electrical properties of topological insulators, providing them the physical understanding and mathematical tools needed to engage research in this quickly growing field. Some key topics in the emerging field of topological insulators are introduced.
Ion Beam Modification Of Insulators
DOWNLOAD
Author : Paolo Mazzoldi
language : en
Publisher: Elsevier Publishing Company
Release Date : 1987
Ion Beam Modification Of Insulators written by Paolo Mazzoldi and has been published by Elsevier Publishing Company this book supported file pdf, txt, epub, kindle and other format this book has been release on 1987 with Electric insulators and insulation categories.
This volume provides a current treatise on the chemical and physical property modifications induced by ion beams in insulators, including applications in astrophysics, geophysics, material technology, optoelectronics, memory devices and polymers. An extensive review is given of experimental methods for the analysis of ion bombarded insulators, including optical and structural methods, resonance, energetic ion methods and surface techniques. An appendix of more than 90 pages presents the most extensive ion-range tables for insulators so far. These tables cover a wide regime of energies and a wide variety of insulating targets, including glasses and many organic and ceramics materials. The book will be of particular value to research physicists, chemists, astrophysicists and geophysicists as well as engineers interested in optoelectronics, polymers, nuclear energy and material technology.
Ion Beam Modification Of Materials
DOWNLOAD
Author : International Conference on Ion Beam Modification of Materials
language : en
Publisher:
Release Date : 1985
Ion Beam Modification Of Materials written by International Conference on Ion Beam Modification of Materials and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1985 with categories.
Measuring Interpreting And Translating Electron Quasiparticle Phonon Interactions On The Surfaces Of The Topological Insulators Bismuth Selenide And Bismuth Telluride
DOWNLOAD
Author : Colin Howard
language : en
Publisher: Springer
Release Date : 2018-06-28
Measuring Interpreting And Translating Electron Quasiparticle Phonon Interactions On The Surfaces Of The Topological Insulators Bismuth Selenide And Bismuth Telluride written by Colin Howard and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-06-28 with Science categories.
The thesis presents experimental and theoretical results about the surface dynamics and the surface Dirac fermion (DF) spectral function of the strong topological insulators Bi2Te3 and Bi2Se3. The experimental results reveal the presence of a strong Kohn anomaly in the measured surface phonon dispersion of a low-lying optical mode, and the absence of surface Rayleigh acoustic phonons. Fitting the experimental data to theoretical models employing phonon Matsubara functions allowed the extraction of the matrix elements of the coupling Hamiltonian and the modifications to the surface phonon propagator that are encoded in the phonon self-energy. This allowed, for the first time, calculation of phonon mode-specific DF coupling λν(q) from experimental data, with average coupling significantly higher than typical values for metals, underscoring the strong coupling between optical surface phonons and surface DFs in topological insulators. Finally, to connect to experimental results obtained from photoemission spectroscopies, an electronic (DF) Matsubara function was constructed using the determined electron-phonon matrix elements and the optical phonon dispersion. This allowed calculation of the DF spectral function and density of states, allowing for comparison with photoemission and scanning tunneling spectroscopies. The results set the necessary energy resolution and extraction methodology for calculating λ from the DF perspective.
Topological Insulator And Magnetically Doped Topological Insulator Thin Films By Molecular Beam Epitaxy
DOWNLOAD
Author : Shuang Li
language : en
Publisher:
Release Date : 2013
Topological Insulator And Magnetically Doped Topological Insulator Thin Films By Molecular Beam Epitaxy written by Shuang Li and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
Searching for energy dissipation-less systems has become increasingly important for low power electronic devices. Topological insulators, a new topological state of quantum matter, have recently been proposed as an emerging material for use in low power electronics, because of the unique transport along its topologically protected edge/surface states. In addition, it has been predicted that the incorporation of magnetic elements into topological insulators could lead to the quantum anomalous Hall state, which is a truly dissipation-less system. However, the material quality of topological insulator thin films remains as a major stumbling block for exploring the novel physics of topological insulators and their proposed applications. In the first part of this thesis, I will first describe an advanced thin film deposition technique, molecular beam epitaxy (MBE) and the mini-MBE system we designed and built for topological insulator thin film growth. Then I will briefly illustrate some basic principles and sample preparation methods for a variety of characterization techniques we used for the material property investigation. In the second part of this thesis, I will present the growth and characterization of topological insulator bismuth telluride thin films grown by a two-step MBE process developed as part of this research. By optimizing the growth recipe and particularly developing the two-step growth method, defect densities were significantly reduced and higher crystal and surface quality bismuth telluride thin films were achieved. The existence of a topological surface state on our bismuth telluride thin films was also confirmed. The Fermi level of our bismuth telluride thin film was tuned to very close to the bulk gap region. The successful growth of centimeter-sized, uniform, high quality topological insulator thin films provides an excellent platform for both fundamental studies of the properties of topological insulators and fabrications of mesoscopic devices. Finally, I will report on the first successful growth of gadolinium substituted bismuth telluride thin films with high Gd concentrations by MBE. We systematically investigated the crystal structure, band structure, magnetic, and electronic properties of gadolinium substituted bismuth telluride thin films. The topological surface state was found to remain intact by Gd substitution into bismuth telluride. Although ferromagnetic behavior in gadolinium substituted bismuth telluride thin films was not observed above 2K by both magnetic and magneto-transport measurements, gadolinium substituted bismuth telluride thin films were found to have a Curie susceptibility due to the paramagnetic Gd ions with an atomic magnetic moment of 6.93 Bohr magneton per Gd ion, which suggests that it is possible to realize dissipation-less transport with a small external magnetic field or with a ferromagnetic layer on top of gadolinium substituted bismuth telluride thin films.
Ion Beam Modification Of Metals
DOWNLOAD
Author : Fadeĭ Fadeevich Komarov
language : en
Publisher: Routledge
Release Date : 1992
Ion Beam Modification Of Metals written by Fadeĭ Fadeevich Komarov and has been published by Routledge this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Science categories.
Translated from the 1990 Russian work published by Metallurgiya (Moscow). Komarov draws largely on his own research (and 590 references) to address the problems associated with directional ion beam modification of the physicochemical properties of the near- surface regions of metal and alloys. He examines the primary processes accompanying the passage of fast ions in crystals and secondary processes such as annealing and ageing; and he shows the possibilities for using ion beam alloying for controlling the mechanical, tribological, corrosion, and catholytic properties of metals and alloys. Annotation copyrighted by Book News, Inc., Portland, OR
Tuning The Electron Phonon Interaction In Bismuth Selenide Bi2se3 Topological Insulator Nanostructures
DOWNLOAD
Author : Christian Ikechukwu Nweze
language : en
Publisher:
Release Date : 2022
Tuning The Electron Phonon Interaction In Bismuth Selenide Bi2se3 Topological Insulator Nanostructures written by Christian Ikechukwu Nweze and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022 with categories.
Ion Beam Modification Of Materials
DOWNLOAD
Author : T. E. Felter
language : en
Publisher:
Release Date : 2005
Ion Beam Modification Of Materials written by T. E. Felter and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
This volume contains the proceedings of the 14th International Conference on Ion Beam Modification of Materials, IBMM 2004, and is published by Elsevier-Science Publishers as a special issue of Nuclear Instruments and Methods B. The conference series is the major international forum to present and discuss recent research results and future directions in the field of ion beam modification, synthesis and characterization of materials. The first conference in the series was held in Budapest, Hungary, 1978, and subsequent conferences were held every two years at locations around the Globe, most recently in Japan, Brazil, and the Netherlands. The series brings together physicists, materials scientists, and ion beam specialists from all over the world. The official conference language is English. IBMM 2004 was held on September 5-10, 2004. The focus was on materials science involving both basic ion-solid interaction processes and property changes occurring either during or subsequent to ion bombardment and ion beam processing in relation to materials and device applications. Areas of research included Nanostructures, Multiscale Modeling, Patterning of Surfaces, Focused Ion Beams, Defects in Semiconductors, Insulators and Metals, Cluster Beams, Radiation Effects in Materials, Photonic Devices, Ion Implantation, Ion Beams in Biology and Medicine including New Materials, Imaging, and Treatment.
Proceedings Of The Third International Conference On Ion Beam Modification Of Materials Grenoble
DOWNLOAD
Author : International Conference on Ion Beam Modification of Materials
language : en
Publisher:
Release Date : 1983
Proceedings Of The Third International Conference On Ion Beam Modification Of Materials Grenoble written by International Conference on Ion Beam Modification of Materials and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1983 with categories.