Ion Implantation Science And Technology
DOWNLOAD
Download Ion Implantation Science And Technology PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Ion Implantation Science And Technology book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Ion Implantation Science And Technology
DOWNLOAD
Author : J.F. Ziegler
language : en
Publisher: Elsevier
Release Date : 2012-12-02
Ion Implantation Science And Technology written by J.F. Ziegler and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Science categories.
Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Ion Implantation
DOWNLOAD
Author : James F. Ziegler
language : en
Publisher:
Release Date : 2004
Ion Implantation written by James F. Ziegler and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with categories.
Ion Implantation
DOWNLOAD
Author : Ion Implantation Technology, Incorporated
language : en
Publisher:
Release Date : 2000-01-01
Ion Implantation written by Ion Implantation Technology, Incorporated and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-01-01 with categories.
Ion Implantation 1988
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1988
Ion Implantation 1988 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with categories.
The volume presents 24 invited contributions.
Ion Implantation In Semiconductors
DOWNLOAD
Author : Susumu Namba
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Ion Implantation In Semiconductors written by Susumu Namba and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.
Ion Implantation Basics To Device Fabrication
DOWNLOAD
Author : Emanuele Rimini
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-27
Ion Implantation Basics To Device Fabrication written by Emanuele Rimini and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-27 with Technology & Engineering categories.
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.
Ion Implantation Technology 92
DOWNLOAD
Author : D.F. Downey
language : en
Publisher: Elsevier
Release Date : 2012-12-02
Ion Implantation Technology 92 written by D.F. Downey and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
Ion Implantation Technology 94
DOWNLOAD
Author : S. Coffa
language : en
Publisher: Newnes
Release Date : 1995-05-16
Ion Implantation Technology 94 written by S. Coffa and has been published by Newnes this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-05-16 with Science categories.
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Ion Implantation
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1971
Ion Implantation written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1971 with categories.
Ion Implantation
DOWNLOAD
Author : Ishaq Ahmad
language : en
Publisher: BoD – Books on Demand
Release Date : 2017-06-14
Ion Implantation written by Ishaq Ahmad and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-06-14 with Science categories.
Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.