Ion Implantation Sputtering And Their Applications
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Ion Implantation Sputtering And Their Applications
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Author : Peter David Townsend
language : en
Publisher:
Release Date : 1976
Ion Implantation Sputtering And Their Applications written by Peter David Townsend and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1976 with Science categories.
Optical Effects Of Ion Implantation
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Author : P. D. Townsend
language : en
Publisher: Cambridge University Press
Release Date : 1994-06-23
Optical Effects Of Ion Implantation written by P. D. Townsend and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-06-23 with Science categories.
This book describes the use of ion implantation to control the optical properties of solid state materials.
Ion Implantation In Semiconductors
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Author : Susumu Namba
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Ion Implantation In Semiconductors written by Susumu Namba and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.
Ion Implantation Techniques
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Author : H. Ryssel
language : en
Publisher: Springer
Release Date : 1982-09
Ion Implantation Techniques written by H. Ryssel and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982-09 with Science categories.
In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University,' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.
High Energy And High Dose Ion Implantation
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Author : S.U. Campisano
language : en
Publisher: Elsevier
Release Date : 1992-06-16
High Energy And High Dose Ion Implantation written by S.U. Campisano and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992-06-16 with Technology & Engineering categories.
Ion beam processing is a means of producing both novel materials and structures. The contributions in this volume strongly focus on this aspect and include many papers reporting on the modification of the electrical and structural properties of the target materials, both metals and semiconductors, as well as the synthesis of buried and surface compound layers. Many examples on the applications of high energy and high dose ion implantation are also given. All of the papers from Symposia C and D are presented in this single volume because the interests of many of the participants span both topics. Additionally many of the materials science aspects, including experimental methods, equipment and processing problems, diagnostic and analytical techniques are common to both symposia.
Ion Implantation And Beam Processing
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Author : J. S. Williams
language : en
Publisher: Academic Press
Release Date : 2014-06-28
Ion Implantation And Beam Processing written by J. S. Williams and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-06-28 with Technology & Engineering categories.
Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
Ion Implantation
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Author : Geoffrey Dearnaley
language : en
Publisher: North-Holland
Release Date : 1973
Ion Implantation written by Geoffrey Dearnaley and has been published by North-Holland this book supported file pdf, txt, epub, kindle and other format this book has been release on 1973 with Science categories.
Ion Beams In Materials Processing And Analysis
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Author : Bernd Schmidt
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-13
Ion Beams In Materials Processing And Analysis written by Bernd Schmidt and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-13 with Technology & Engineering categories.
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Ion Beams
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Author : Robert G. Wilson
language : en
Publisher:
Release Date : 1979
Ion Beams written by Robert G. Wilson and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1979 with Science categories.
Applications Of Ion Beams To Metals
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Author : S. Picraux
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Applications Of Ion Beams To Metals written by S. Picraux and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Conferences have been held in the past on atomic collision phenomena and on the applications of ion beams to semiconductors. However, within the past year it became apparent that there is a growing new area of active research involving the use of ion beams to modify and study the basic properties of metals. As a result a topical conference was organized to bring together for the first time scientists with a wide range of backgrounds and interests related to this field. This book contains the proceed ings of the International Conference on Applications of Ion Beams to Metals which was held in Albuquerque, New Mexico, October 2-4, 1973. Much of the work presented herein represents ideas and concepts which have had little or no previous exposure in the open literature. The application of ion beams to superconducting prop erties for example is quite new, as is the chapter on ion induced surface reactions, which includes primarily oxidation and corrosion studies of implanted materials. These areas, as well as the chapter on implantation alloy formation, indicate important future areas of the application of ion beams to metals. A reading of the chapters on superconductivity and on oxida tion and corrosion can serve to bring one up to date on nearly all the existing information in these areas of the ion beam mod ification of metals. A broad perspective of the oxidation area is given in the invited paper by G. Dearnaley.