Lithographer 1 C
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Lithographer 1 C
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Author : David A. Murray
language : en
Publisher:
Release Date : 1981
Lithographer 1 C written by David A. Murray and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1981 with Lithography categories.
Lithographer 1 C
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Author : United States. Bureau of Naval Personnel
language : en
Publisher:
Release Date : 1958
Lithographer 1 C written by United States. Bureau of Naval Personnel and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1958 with Lithography categories.
Semiconductor Lithography
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Author : Wayne M. Moreau
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Semiconductor Lithography written by Wayne M. Moreau and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Naval Reservist
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Author :
language : en
Publisher:
Release Date : 1971
Naval Reservist written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1971 with United States categories.
List Of Training Manuals And Nonresident Training Courses
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Author : United States. Naval Education and Training Command
language : en
Publisher:
Release Date : 1988
List Of Training Manuals And Nonresident Training Courses written by United States. Naval Education and Training Command and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Naval education categories.
Materials And Processes For Next Generation Lithography
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Author :
language : en
Publisher: Elsevier
Release Date : 2016-11-08
Materials And Processes For Next Generation Lithography written by and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-11-08 with Science categories.
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
All Hands
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Author :
language : en
Publisher:
Release Date : 1969
All Hands written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1969 with categories.
List Of Training Manuals And Correspondence Courses
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Author : United States. Naval Education and Training Command
language : en
Publisher:
Release Date : 1968-06
List Of Training Manuals And Correspondence Courses written by United States. Naval Education and Training Command and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1968-06 with Naval education categories.
List Of Training Manuals And Correspondence Courses
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Author : United States. Bureau of Naval Personnel
language : en
Publisher:
Release Date : 1969
List Of Training Manuals And Correspondence Courses written by United States. Bureau of Naval Personnel and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1969 with categories.
Fine Line Lithography
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Author : R Newman
language : en
Publisher: Elsevier
Release Date : 2012-12-02
Fine Line Lithography written by R Newman and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Science categories.
Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.