Lithographic Technology In Transition
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Emerging Lithographic Technologies
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Author :
language : en
Publisher:
Release Date : 2007
Emerging Lithographic Technologies written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Lithography categories.
Proceedings Of The International Symposium On Research Of Arts Design And Humanities Isradh 2014
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Author : Oskar Hasdinor Hassan
language : en
Publisher: Springer
Release Date : 2015-09-22
Proceedings Of The International Symposium On Research Of Arts Design And Humanities Isradh 2014 written by Oskar Hasdinor Hassan and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-09-22 with Education categories.
This book examines the interaction between art, design, technology and the social sciences. It features 56 papers that were presented at the International Symposium on Research of Arts, Design and Humanities, ISRADH 2014, held at Sutera Harbour Resort, Kota Kinabalu, Malaysia. Complete with helpful diagrams and tables, the papers cover such topics as artificial reef development, racial discourse in the social media, stoneware as a replacement material for modern ventilation walls, and factors contributing to internet abuse in the workplace. Overall, the coverage focuses on global design trends and demands with an emphasis on people, business and technology. Inside, readers will find information on art and science in industrial applications; art management and entrepreneurship; cognitive, psychological and behavioral science; design technology and sustainable development; humanities and social applications in quality of life; social implications of technology; and visual communication and technologies. Taking a multi-disciplinary approach, the book features insightful discussions among academicians and industrial practitioners on the evolution of design that will appeal to researchers, designers and students.
Direct Write Technologies For Rapid Prototyping Applications
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Author : Alberto Pique
language : en
Publisher: Elsevier
Release Date : 2001-11-20
Direct Write Technologies For Rapid Prototyping Applications written by Alberto Pique and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-11-20 with Technology & Engineering categories.
Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. - An overview of the different direct write techniques currently available - A comparison between the strengths and special attributes for each of the techniques - An overview of the state-of-the-art technology involved in this field
Lithographic Technology In Transition
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Author : Ervin A. Dennis
language : en
Publisher: Singular
Release Date : 1996
Lithographic Technology In Transition written by Ervin A. Dennis and has been published by Singular this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Art categories.
Designed for the serious graphic communications student, this text examines both the traditional and cutting-edge technologies of lithography. Technology, business and career topics are discussed in depth as the text assists the reader in making the transition from traditional lithography to the high technology printing, processes of the present and the future.
Microelectronics Manufacturing Technology
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Author : Richard H. Van Atta
language : en
Publisher:
Release Date : 1988
Microelectronics Manufacturing Technology written by Richard H. Van Atta and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Microelectronics industry categories.
Trade And Technology Promotion Act
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Author : United States. Congress. Senate. Committee on Governmental Affairs
language : en
Publisher:
Release Date : 1990
Trade And Technology Promotion Act written by United States. Congress. Senate. Committee on Governmental Affairs and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with Competition, International categories.
Technology And Innovation Management A Practical Guide
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Author : Dr Raj CN Thiagarajan
language : en
Publisher: Notion Press
Release Date : 2024-05-15
Technology And Innovation Management A Practical Guide written by Dr Raj CN Thiagarajan and has been published by Notion Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-05-15 with Business & Economics categories.
In a world driven by technological advancements, the ability to effectively manage technology and innovation is the key to success. "TECHNOLOGY AND INNOVATION MANAGEMENT: A Practical Guide" is your ultimate companion on the journey to becoming a master of technological transformation. Dr. Raj C N. Thiagarajan, a renowned expert in the field, takes you on a captivating exploration of the dynamic intersection between technology, innovation, and management. With a focus on practicality and real-world application, this book equips students, engineers, entrepreneurs, and innovators with the tools and techniques to shape the future and achieve their strategic goals. From the origins of technology and innovation management to the fundamentals of value creation through purpose-driven innovation, each chapter unveils a new layer of knowledge and expertise. Discover the secrets of managing creativity and innovation, learn about powerful technology tools for successful innovation, and explore the process of technological change and its impact on market dynamics. But this book goes beyond theory. It immerses you in the world of technology intelligence, competition, and strategic decision-making. Uncover the art of gathering valuable insights, harness the power of technology roadmaps and strategy models, and explore the organizational structures that foster innovation. Gain a deep understanding of intellectual property strategy and the process of technology deployment in new product development. Dr. Thiagarajan's wealth of experience, spanning over three decades with global corporations, shines through as he shares his expertise through real-life examples and case studies. His passion for multiphysics engineering design and innovation permeates every page, inspiring readers to push the boundaries of what is possible. "TECHNOLOGY AND INNOVATION MANAGEMENT: A Practical Guide" is not just a book—it is a roadmap to success in the ever-evolving landscape of technology and innovation. Whether you are a student, an engineer, an entrepreneur, or a management professional, this comprehensive guide will empower you to make informed decisions, seize opportunities, and become a true champion of innovation. Get ready to embark on an exhilarating journey that will transform your perspective on technology and innovation management. Join Dr. Thiagarajan as he unlocks the secrets to creating a future driven by purpose, innovation, and strategic decision-making. Are you ready to shape the world of tomorrow? The power is in your hands.
Report Of The Defense Science Board Task Force For The Investment Strategy For Darpa
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Author :
language : en
Publisher: DIANE Publishing
Release Date :
Report Of The Defense Science Board Task Force For The Investment Strategy For Darpa written by and has been published by DIANE Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.
Advanced Processes For 193 Nm Immersion Lithography
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Author : Yayi Wei
language : en
Publisher: SPIE Press
Release Date : 2009
Advanced Processes For 193 Nm Immersion Lithography written by Yayi Wei and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Art categories.
This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Fluctuation Mechanisms In Superconductors
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Author : Holger Bartolf
language : en
Publisher: Springer
Release Date : 2015-12-16
Fluctuation Mechanisms In Superconductors written by Holger Bartolf and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-12-16 with Science categories.
Holger Bartolf discusses state-of-the-art detection concepts based on superconducting nanotechnology as well as sophisticated analytical formulæ that model dissipative fluctuation-phenomena in superconducting nanowire single-photon detectors. Such knowledge is desirable for the development of advanced devices which are designed to possess an intrinsic robustness against vortex-fluctuations and it provides the perspective for honorable fundamental science in condensed matter physics. Especially the nanowire detector allows for ultra-low noise detection of signals with single-photon sensitivity and GHz repetition rates. Such devices have a huge potential for future technological impact and might enable unique applications (e.g. high rate interplanetary deep-space data links from Mars to Earth).