Metrology Inspection And Process Control For Microlithography Xxvi
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Metrology Inspection And Process Control For Microlithography Xxvi
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Author : Alexander Starikov
language : en
Publisher:
Release Date : 2012-03-09
Metrology Inspection And Process Control For Microlithography Xxvi written by Alexander Starikov and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-03-09 with Integrated circuits categories.
Includes Proceedings Vol. 7821
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Metrology Inspection And Process Control For Microlithography Xviii
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Author :
language : en
Publisher:
Release Date : 2004
Metrology Inspection And Process Control For Microlithography Xviii written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Integrated circuits categories.
Metrology Inspection And Process Control For Microlithography Xxvi
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Author :
language : en
Publisher:
Release Date : 2012
Metrology Inspection And Process Control For Microlithography Xxvi written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012 with Integrated circuits categories.
Metrology Inspection And Process Control For Microlithography
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Author :
language : en
Publisher:
Release Date : 2000
Metrology Inspection And Process Control For Microlithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Measurement categories.
Developments In Surface Contamination And Cleaning Volume 7
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Author : Rajiv Kohli
language : en
Publisher: William Andrew
Release Date : 2014-11-18
Developments In Surface Contamination And Cleaning Volume 7 written by Rajiv Kohli and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-11-18 with Technology & Engineering categories.
As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects
Nanoscience
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Author : Neerish Revaprasadu
language : en
Publisher: Royal Society of Chemistry
Release Date : 2024-09-04
Nanoscience written by Neerish Revaprasadu and has been published by Royal Society of Chemistry this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-09-04 with Technology & Engineering categories.
With a vast landscape of material, careful distillation of the most important discoveries helps researchers find the key information. Publications in nanoscience cross conventional boundaries from chemistry to specialised areas of physics and nanomedicine. This volume provides a critical and comprehensive assessment of the most recent research and opinion from across the globe. Topics covered include, but are not limited to, advancing lithium-ion battery technology, sonochemistry in nanomaterial synthesis, mechanoluminescence and electronic and optical features of 2D materials. Appealing to anyone practising in nano-allied fields or wishing to enter the nano-world, this useful resource provides a succinct reference on recent developments in this area now and looking to the future.
Handbook Of Vlsi Microlithography
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Author : John N. Helbert
language : en
Publisher: William Andrew
Release Date : 2001-04-01
Handbook Of Vlsi Microlithography written by John N. Helbert and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04-01 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Metrology Inspection And Process Control For Microlithography Xxvii
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Author :
language : en
Publisher:
Release Date : 2013
Metrology Inspection And Process Control For Microlithography Xxvii written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
Microscopy Methods In Nanomaterials Characterization
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Author : Sabu Thomas
language : en
Publisher: Elsevier
Release Date : 2017-05-17
Microscopy Methods In Nanomaterials Characterization written by Sabu Thomas and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-05-17 with Technology & Engineering categories.
Microscopy Methods in Nanomaterials Characterization fills an important gap in the literature with a detailed look at microscopic and X-ray based characterization of nanomaterials. These microscopic techniques are used for the determination of surface morphology and the dispersion characteristics of nanomaterials. This book deals with the detailed discussion of these aspects, and will provide the reader with a fundamental understanding of morphological tools, such as instrumentation, sample preparation and different kinds of analyses, etc. In addition, it covers the latest developments and trends morphological characterization using a variety of microscopes. Materials scientists, materials engineers and scientists in related disciplines, including chemistry and physics, will find this to be a detailed, method-orientated guide to microscopy methods of nanocharacterization. - Takes a method-orientated approach that includes case studies that illustrate how to carry out each characterization technique - Discusses the advantages and disadvantages of each microscopy characterization technique, giving the reader greater understanding of conditions for different techniques - Presents an in-depth discussion of each technique, allowing the reader to gain a detailed understanding of each