Molecular Beam Epitaxial Growth And Characterization Of Strained Quantum Wires
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Molecular Beam Epitaxial Growth And Characterization Of Strained Quantum Wires
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Author : Yu-Pei Chen
language : en
Publisher:
Release Date : 1995
Molecular Beam Epitaxial Growth And Characterization Of Strained Quantum Wires written by Yu-Pei Chen and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with categories.
Journal Of The Physical Society Of Japan
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Author :
language : en
Publisher:
Release Date : 2002
Journal Of The Physical Society Of Japan written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Physics categories.
Molecular Beam Epitaxy
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Author : Mohamed Henini
language : en
Publisher: Elsevier
Release Date : 2018-06-27
Molecular Beam Epitaxy written by Mohamed Henini and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-06-27 with Science categories.
Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and 'how to' on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. - Condenses the fundamental science of MBE into a modern reference, speeding up literature review - Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research - Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community
Jjap
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Author :
language : en
Publisher:
Release Date : 1999
Jjap written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Engineering categories.
Epitaxy Of Semiconductors
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Author : Udo W. Pohl
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-01-11
Epitaxy Of Semiconductors written by Udo W. Pohl and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-01-11 with Technology & Engineering categories.
Introduction to Epitaxy provides the essential information for a comprehensive upper-level graduate course treating the crystalline growth of semiconductor heterostructures. Heteroepitaxy represents the basis of advanced electronic and optoelectronic devices today and is considered one of the top fields in materials research. The book covers the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and the description of the major growth techniques metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy. Cubic semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures and processes during nucleation and growth are treated in detail. The Introduction to Epitaxy requires only little knowledge on solid-state physics. Students of natural sciences, materials science and electrical engineering as well as their lecturers benefit from elementary introductions to theory and practice of epitaxial growth, supported by pertinent references and over 200 detailed illustrations.
Molecular Beam Epitaxy
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Author : John Orton
language : en
Publisher: OUP Oxford
Release Date : 2015-06-25
Molecular Beam Epitaxy written by John Orton and has been published by OUP Oxford this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-06-25 with Science categories.
The book is a history of Molecular Beam Epitaxy (MBE) as applied to the growth of semiconductor thin films (note that it does not cover the subject of metal thin films). It begins by examining the origins of MBE, first of all looking at the nature of molecular beams and considering their application to fundamental physics, to the development of nuclear magnetic resonance and to the invention of the microwave MASER. It shows how molecular beams of silane (SiH4) were used to study the nucleation of silicon films on a silicon substrate and how such studies were extended to compound semiconductors such as GaAs. From such surface studies in ultra-high vacuum the technique developed into a method of growing high quality single crystal films of a wide range of semiconductors. Comparing this with earlier evaporation methods of deposition and with other epitaxial deposition methods such as liquid phase and vapour phase epitaxy (LPE and VPE). The text describes the development of MBE machines from the early âhome-madeâ variety to that of commercial equipment and show how MBE was gradually refined to produce high quality films with atomic dimensions. This was much aided by the use of various in-situ surface analysis techniques, such as reflection high energy electron diffraction (RHEED) and mass spectrometry, a feature unique to MBE. It looks at various modified versions of the basic MBE process, then proceed to describe their application to the growth of so-called âlow-dimensional structuresâ (LDS) based on ultra-thin heterostructure films with thickness of order a few molecular monolayers. Further chapters cover the growth of a wide range of different compounds and describe their application to fundamental physics and to the fabrication of electronic and opto-electronic devices. The authors study the historical development of all these aspects and emphasise both the (often unexpected) manner of their discovery and development and the unique features which MBE brings to the growth of extremely complex structures with monolayer accuracy.
Japanese Journal Of Applied Physics
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Author :
language : en
Publisher:
Release Date : 2002
Japanese Journal Of Applied Physics written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Physics categories.
Low Dimensional Structures Prepared By Epitaxial Growth Or Regrowth On Patterned Substrates
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Author : K. Eberl
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Low Dimensional Structures Prepared By Epitaxial Growth Or Regrowth On Patterned Substrates written by K. Eberl and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Proceedings of the NATO Advanced Research Workshop, Ringberg in Rottach Egern, Germany, February 20--24, 1995
Materials For Optoelectronic Devices Oeics And Photonics
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Author : H. Schlötterer
language : en
Publisher: Elsevier
Release Date : 1991-10-08
Materials For Optoelectronic Devices Oeics And Photonics written by H. Schlötterer and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991-10-08 with Science categories.
The aim of the contributions in this volume is to give a current overview on the basic properties and applications of semiconductor and nonlinear optical materials for optoelectronics and integrated optics. They provide a cross-linkage between different materials (III-V, II-VI, Si-Ge, glasses, etc.), various sample dimensions (from bulk crystals to quantum dots), and a range of techniques for growth (LPE to MOMBE) and for processing (from surface passivation to ion beams). Major growth techniques and materials are discussed, including the sophisticated technologies required to exploit the exciting properties of low dimensional semiconductors. These proceedings will prove an invaluable guide to the current state of optoelectronic and nonlinear optical materials development, as well as indicating trends and also future markets for optoelectronic devices.
Transmission Electron Microscopy Characterization Of Nanomaterials
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Author : Challa S.S.R. Kumar
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-12-09
Transmission Electron Microscopy Characterization Of Nanomaterials written by Challa S.S.R. Kumar and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-12-09 with Science categories.
Third volume of a 40volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Transmission electron microscopy characterization of nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.