Molecular Layer Deposition For Tailored Organic Thin Film Materials
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Molecular Layer Deposition For Tailored Organic Thin Film Materials
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Author : Tetsuzo Yoshimura
language : en
Publisher: CRC Press
Release Date : 2023-03-14
Molecular Layer Deposition For Tailored Organic Thin Film Materials written by Tetsuzo Yoshimura and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-03-14 with Technology & Engineering categories.
This book provides concepts and experimental demonstrations for various types of molecular layer deposition (MLD) and organic multiple quantum dots (organic MQDs), which are typical tailored organic thin-film materials. Possible applications of MLD to optical interconnects, energy conversion systems, molecular targeted drug delivery, and cancer therapy are also proposed. First, the author reviews various types of MLD processes including vapor-phase MLD, liquid-phase MLD, and selective MLD. Next, he introduces organic MQDs, which are typical tailored organic thin-film materials produced by MLD. The author then describes the design of light modulators/optical switches, predicts their performance, and discusses impacts of the organic MQDs on them. He then also discusses impacts of the organic MQDs on optical interconnects within computers and on optical switching systems. Finally, the author presents MLD applications to molecular targeted drug delivery, photodynamic therapy, and laser surgery for cancer therapy. This book is intended for researchers, engineers, and graduate students in optoelectronics, photonics, and any other field where organic thin-film materials can be applied.
Thin Film Organic Photonics
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Author : Tetsuzo Yoshimura
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Thin Film Organic Photonics written by Tetsuzo Yoshimura and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Science categories.
Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves "three-dimensional growth". MLD facilitates dot-by-dot—or molecule-by-molecule—growth of polymer and molecular wires, and that enhanced level of control creates numerous application possibilities. Explores the wide range of MLD applications in solar energy and optics, as well as proposed uses in biomedical photonics This book addresses the prospects for artificial materials with atomic/molecular-level tailored structures, especially those featuring MLD and conjugated polymers with multiple quantum dots (MQDs), or polymer MQDs. In particular, the author focuses on the application of artificial organic thin films to: Photonics/electronics, particularly in optical interconnects used in computers Optical switching and solar energy conversion systems Bio/ medical photonics, such as photodynamic therapy Organic photonic materials, devices, and integration processes With its clear and concise presentation, this book demonstrates exactly how MLD enables electron wavefunction control, thereby improving material performance and generating new photonic/electronic phenomena.
Precursor Chemistry Of Advanced Materials
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Author : Roland A. Fischer
language : en
Publisher: Springer Science & Business Media
Release Date : 2005-09-29
Precursor Chemistry Of Advanced Materials written by Roland A. Fischer and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-09-29 with Science categories.
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
Molecular Engineering For Thin Film Applications
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Author : Jie Huang
language : en
Publisher:
Release Date : 2014
Molecular Engineering For Thin Film Applications written by Jie Huang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with Atomic layer deposition categories.
In this dissertation, two different approaches to employ organic molecules for thin-film applications will be discussed. One is based on modification of substrates using self-assembled monolayers (SAMs) to prevent (or enhance) nucleation of atomic layer deposition (ALD). We demonstrate area-selective deposition using electron-beam lithography (EBL) patterned octadecyltrichlorosilane (OTS) SAM as a nucleation inhibition layer followed by titanium oxide (TiO2) deposition using ALD. It was found that the e-beam dosage determined the resolution of individual line width, while the accelerating voltage dominated the minimum pitch dimension of dense line patterns achievable. Eventually, using the optimal e-beam parameters, nano-line patterns with sub-30 nm resolution and 50 nm pitch were achieved. This study offers a new approach to fabricate close-packed nano-patterns for IC devices without any challenging etching process. The other approach is direct implementation of small molecules as molecular precursors to deposit self-limiting organic multi-layers which eventually allows layer-by-layer deposition like ALD. Two types of organic molecules, 7-octenytrichlorosilane (7-OTS) and hydroquinone (HQ), were applied as backbones of these multi-layers. Conventional inorganic ALD precursors, such as trimethylaluminum (TMA) and diethylzinc (DEZ), were applied as linkers between the organic layers to form organic-inorganic hybrid thin films and nano-laminates. It was found that resulting materials characteristics can be varied from insulating to semi-conducting by altering the organic component from alkane to aromatic based molecules. This methodology provides a new route to build 2D nano-sheets with unique properties.
Handbook Of Silicon Based Mems Materials And Technologies
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Author : Markku Tilli
language : en
Publisher: William Andrew
Release Date : 2015-09-02
Handbook Of Silicon Based Mems Materials And Technologies written by Markku Tilli and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-09-02 with Technology & Engineering categories.
The Handbook of Silicon Based MEMS Materials and Technologies, Second Edition, is a comprehensive guide to MEMS materials, technologies, and manufacturing that examines the state-of-the-art with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, manufacturing, processing, system integration, measurement, and materials characterization techniques, sensors, and multi-scale modeling methods of MEMS structures, silicon crystals, and wafers, also covering micromachining technologies in MEMS and encapsulation of MEMS components. Furthermore, it provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques, shows how to protect devices from the environment, and provides tactics to decrease package size for a dramatic reduction in costs. Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques Shows how to protect devices from the environment and decrease package size for a dramatic reduction in packaging costs Discusses properties, preparation, and growth of silicon crystals and wafers Explains the many properties (mechanical, electrostatic, optical, etc.), manufacturing, processing, measuring (including focused beam techniques), and multiscale modeling methods of MEMS structures Geared towards practical applications rather than theory
Molecular Layer Deposition
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Author : David S. Bergsman
language : en
Publisher:
Release Date : 2018
Molecular Layer Deposition written by David S. Bergsman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018 with categories.
In recent years, many technological advancements in medicine, renewable energy, water purification, and semiconductor processing have resulted from access to nanotechnology. Though we have many methods for creating nano-sized features, our current nanomaterials toolkit must continue to expand in order to meet the increasing demand for smaller features, more complex architectures, and reduced defect frequencies required by these applications. Molecular layer deposition (MLD) is a promising new method for expanding that toolkit, allowing for the incorporation of organic components into ultrathin materials and nanostructures through a vapor-phase, layer-by-layer synthesis approach. Although a decade and a half of development has already gone into MLD, there is still a significant gap in our understanding of the mechanisms behind MLD growth and the microscopic properties of the resulting films, such as their molecular-level structure. This dissertation presents work to better understand these fundamental properties of MLD and use that understanding to control the thermal, mechanical, and catalytic properties of these materials. In the first half of this work, a study of the structure and growth behavior of organic MLD films is performed. First, the properties of polyurea films are explored as a function of backbone flexibility. Our results suggest that changes in growth rate between the most rigid and most flexible backbones (4 Å/cycle vs 1 Å/cycle) are not caused by differences in the length of molecular precursors, chain orientation (~25° on average for each backbone), or film density (1.0 -- 1.2 g/cm3), but instead are caused by an increased frequency of terminations in the more flexible chemistries. Measurement of the crystallinity and growth angle further suggest that polyurea MLD films exhibit multiple domains, with some chains adopting horizontally packed structures and some chains growing more out-of-plane, leading to an average growth angle of 25°. Interestingly, the observed terminations do not result in the complete cessation of film growth, suggesting that precursors may be absorbing into the film through non-covalent linkages. To observe these absorptions events, MLD is performed on surfaces whose reaction sites have been intentionally eliminated. These terminations are shown to be effective at reducing the growth rate of MLD, suggesting that MLD growth rates are heavily dependent on the number of reaction sites. However, after several cycles, the film growth rate is able to recover, suggesting that monomers have absorbed into the films to reintroduce new reaction sites. A model of growth is developed based on a site balance which suggests that roughly 3% of the chains are terminated by double reactions every cycle. Taken as a whole, this work provides a new paradigm for the growth of MLD films, showing that the films do not adopt the simple layer-by-layer covalent network that is typically portrayed for MLD. MLD has many potential applications in energy and semiconductor manufacturing. In the second half of this thesis, two studies related to the development of MLD are explored. First, a relatively unstudied "manganicone" manganese hybrid MLD chemistry is synthesized using bis(ethylcyclopentadienyl)manganese and ethylene glycol for use as an electrochemically-relevant catalyst material. Characterization of the composition and crystal structure of these films shows them to grow as manganese alkoxides, which partially degrade upon exposure to air into manganese carboxylates. Annealing the hybrid films to remove the carbon is shown to eliminate any porosity introduced through the incorporation of the organic components. However, annealed hybrid films are shown to be less prone to restructuring than ALD-grown MnOx, making them potentially desirable materials for electrodes in thin film batteries. Second, an investigation of the self-assembly of dodecanethiols from the vapor phase onto copper oxide was performed. Dodecanethiols are often used as a blocking layer in area-selective ALD and MLD. The thiols are shown to etch the surface of the CuO to create well-ordered copper-thiolate multilayers several nanometers thick, with crystallites oriented parallel and perpendicular to the substrate surface. In addition, after exposure to air for several days, the multilayer films ripen into particles several microns wide and several hundred nanometers high over the course of several days. This ripening has never before been observed for thiols deposited on copper or copper oxide Finally, a conclusion is presented with several perspectives on the possible use of MLD in the future.
Molecular Layer Deposition Of Polymeric Thin Films For Applications In Semiconductor Fabrication
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Author : Han Zhou
language : en
Publisher:
Release Date : 2013
Molecular Layer Deposition Of Polymeric Thin Films For Applications In Semiconductor Fabrication written by Han Zhou and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
The electronics industry has been developing improvements in its products at a rapid pace for five decades, an achievement that stems from its ability to continuously decrease the smallest feature sizes in microelectronic devices. To keep step with the miniaturization of next-generation devices, the constituent polymeric films of microelectronics need to meet requirements such as providing conformal, uniform, pinhole-free and ultrathin coatings. Molecular layer deposition (MLD), as an analogue to atomic layer deposition, is a layer-by-layer technique that utilizes sequential, self-limiting reactions of organic precursors to deposit films with one molecular unit at a time, which in turn allows for fine tuning of the position and concentration of various functionalities in the deposited film. Hence MLD can be a powerful method for deposition of polymer films used in semiconductor device fabrication. In this thesis, novel MLD processes are developed for fabricating ultrathin films and improving the film properties with applications in semiconductor manufacturing. The first part of this thesis explores the application of MLD films as chemically amplified photoresist materials. Acid-labile groups are embedded in the backbone of the precursor and incorporated into the photoresist film with a uniform distribution. Two methods of incorporating photo acid generator (PAG) are employed. The first method is to directly soak the PAG into the resist film after deposition and the second approach is to form in-situ polymer-bound PAG. By this novel synthetic approach, several polyurea films were deposited by MLD and tested for patterning, including an aromatic polyurea film with a soaked-in PAG, an aromatic polyurea film with an in-situ polymer-bound PAG, and an aliphatic polyurea film with soaked-in PAG. All these films were successfully deposited and characterized for both materials properties and resist response. Ellipsometry measurements show that the film thicknesses have a linear dependence on the number of MLD cycles. The presence of the urea linkage is confirmed by infrared (IR) spectroscopy, and x-ray photoelectron spectroscopy (XPS) show that the films are deposited with stoichiometric composition. Both of the aromatic films show cross-linking behavior under e-beam exposure, probably due to reaction at the aromatic rings. Moreover, the in-situ polymer-bound aromatic PAG has a lower activity than the soaked-in aromatic PAG, likely due to a lower photoacid yield. Finally, among the three MLD films studied, the aliphatic film performs best as a photoresist material and good sensitivity and resolution are achieved. To be applied in semiconductor device fabrication, polymeric thin films need to be thermally stable. Two approaches are investigated to improve the thermal stability of the MLD films. First, a series of cross-linked polyurea thin films are deposited by using multifunctional precursors. The cross-linked films show constant growth rate, urea chemical bonding, and stoichiometric compositions. More importantly, they exhibit higher film density and thermal stability compared to the non-cross-linked polyurea film. Second, a MLD process for depositing inorganic-organic hybrid carbosiloxane films is developed. Characteristic MLD growth behavior such as a constant growth rate and saturation behaviors are observed with this process as well. Significant improvement of film stability is achieved with the carbosiloxane films. This thesis concludes with thoughts and perspectives on the future of MLD in semiconductor device fabrication.
Growth Characterization And Post Processing Of Inorganic And Hybrid Organic Inorganic Thin Films Deposited Using Atomic And Molecular Layer Deposition Techniques
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Author : Aziz Ilmutdinovich Abdulagatov
language : en
Publisher:
Release Date : 2015
Growth Characterization And Post Processing Of Inorganic And Hybrid Organic Inorganic Thin Films Deposited Using Atomic And Molecular Layer Deposition Techniques written by Aziz Ilmutdinovich Abdulagatov and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015 with Atomic layer deposition categories.
Atomic layer deposition (ALD) and molecular layer deposition (MLD) are advanced thin film coating techniques developed for deposition of inorganic and hybrid organic-inorganic films respectively. Decreasing device dimensions and increasing aspect ratios in semiconductor processing has motivated developments in ALD. The beginning of this thesis will cover study of new ALD chemistry for high dielectric constant Y 2 O3 . In addition, the feasibility of conducting low temperature ALD of TiN and TiAlN is explored using highly reactive hydrazine as a new nitrogen source. Developments of these ALD processes are important for the electronics industry. As the search for new materials with more advanced properties continues, attention has shifted toward exploring the synthesis of hierarchically nanostructured thin films. Such complex architectures can provide novel functions important to the development of state of the art devices for the electronics industry, catalysis, energy conversion and memory storage as a few examples. Therefore, the main focus of this thesis is on the growth, characterization, and post-processing of ALD and MLD films for fabrication of novel composite (nanostructured) thin films. Novel composite materials are created by annealing amorphous ALD oxide alloys in air and by heat treatment of hybrid organic-inorganic MLD films in inert atmosphere (pyrolysis). The synthesis of porous TiO2 or Al2 O3 supported V2 O5 for enhanced surface area catalysis was achieved by the annealing of inorganic TiVx Oy and AlV x Oy ALD films in air. The interplay between phase separation, surface energy difference, crystallization, and melting temperature of individual oxides were studied for their control of film morphology. In other work, a class of novel metal oxide-graphitic carbon composite thin films was produced by pyrolysis of MLD hybrid organic-inorganic films. For example, annealing in argon of titania based hybrid films enabled fabrication of thin films of intimately mixed TiO2 and nanographitized carbon. The graphitized carbon in the film was formed as a result of the removal of hydrogen by pyrolysis of the organic constituency of the MLD film. The presence of graphitic carbon allowed a 14 orders of magnitude increase in the electrical conductivity of the composite material compared fully oxidized rutile TiO2 .
Photonics Volume 2
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Author : David L. Andrews
language : en
Publisher: John Wiley & Sons
Release Date : 2015-01-28
Photonics Volume 2 written by David L. Andrews and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-01-28 with Technology & Engineering categories.
Discusses the basic physical principles underlying thescience and technology of nanophotonics, its materials andstructures This volume presents nanophotonic structures and Materials.Nanophotonics is photonic science and technology that utilizeslight/matter interactions on the nanoscale where researchers arediscovering new phenomena and developing techniques that go wellbeyond what is possible with conventional photonics andelectronics.The topics discussed in this volume are: CavityPhotonics; Cold Atoms and Bose-Einstein Condensates; Displays;E-paper; Graphene; Integrated Photonics; Liquid Crystals;Metamaterials; Micro-and Nanostructure Fabrication; Nanomaterials;Nanotubes; Plasmonics; Quantum Dots; Spintronics; Thin FilmOptics Comprehensive and accessible coverage of the whole of modernphotonics Emphasizes processes and applications that specifically exploitphoton attributes of light Deals with the rapidly advancing area of modern optics Chapters are written by top scientists in their field Written for the graduate level student in physical sciences;Industrial and academic researchers in photonics, graduate studentsin the area; College lecturers, educators, policymakers,consultants, Scientific and technical libraries, governmentlaboratories, NIH.
Atomic Layer Deposition
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Author : Tommi Kääriäinen
language : en
Publisher: John Wiley & Sons
Release Date : 2013-05-28
Atomic Layer Deposition written by Tommi Kääriäinen and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-28 with Technology & Engineering categories.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
