Molecular Layer Deposition
DOWNLOAD
Download Molecular Layer Deposition PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Molecular Layer Deposition book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Molecular Layer Deposition For Tailored Organic Thin Film Materials
DOWNLOAD
Author : Tetsuzo Yoshimura
language : en
Publisher: CRC Press
Release Date : 2023-03-14
Molecular Layer Deposition For Tailored Organic Thin Film Materials written by Tetsuzo Yoshimura and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-03-14 with Technology & Engineering categories.
This book provides concepts and experimental demonstrations for various types of molecular layer deposition (MLD) and organic multiple quantum dots (organic MQDs), which are typical tailored organic thin-film materials. Possible applications of MLD to optical interconnects, energy conversion systems, molecular targeted drug delivery, and cancer therapy are also proposed. First, the author reviews various types of MLD processes including vapor-phase MLD, liquid-phase MLD, and selective MLD. Next, he introduces organic MQDs, which are typical tailored organic thin-film materials produced by MLD. The author then describes the design of light modulators/optical switches, predicts their performance, and discusses impacts of the organic MQDs on them. He then also discusses impacts of the organic MQDs on optical interconnects within computers and on optical switching systems. Finally, the author presents MLD applications to molecular targeted drug delivery, photodynamic therapy, and laser surgery for cancer therapy. This book is intended for researchers, engineers, and graduate students in optoelectronics, photonics, and any other field where organic thin-film materials can be applied.
Thin Film Organic Photonics
DOWNLOAD
Author : Tetsuzo Yoshimura
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Thin Film Organic Photonics written by Tetsuzo Yoshimura and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Science categories.
Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves "three-dimensional growth". MLD facilitates dot-by-dot—or molecule-by-molecule—growth of polymer and molecular wires, and that enhanced level of control creates numerous application possibilities. Explores the wide range of MLD applications in solar energy and optics, as well as proposed uses in biomedical photonics This book addresses the prospects for artificial materials with atomic/molecular-level tailored structures, especially those featuring MLD and conjugated polymers with multiple quantum dots (MQDs), or polymer MQDs. In particular, the author focuses on the application of artificial organic thin films to: Photonics/electronics, particularly in optical interconnects used in computers Optical switching and solar energy conversion systems Bio/ medical photonics, such as photodynamic therapy Organic photonic materials, devices, and integration processes With its clear and concise presentation, this book demonstrates exactly how MLD enables electron wavefunction control, thereby improving material performance and generating new photonic/electronic phenomena.
Atomic Layer Deposition And Molecular Layer Deposition On Polymers
DOWNLOAD
Author : Bo Gong
language : en
Publisher:
Release Date : 2012
Atomic Layer Deposition And Molecular Layer Deposition On Polymers written by Bo Gong and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012 with categories.
Molecular Layer Deposition Of Photocatalytic Thin Films
DOWNLOAD
Author : Sergei Ishchuk
language : en
Publisher:
Release Date : 2013
Molecular Layer Deposition Of Photocatalytic Thin Films written by Sergei Ishchuk and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with Photosynthesis categories.
Developing New Chemistries And Applications In Molecular Layer Deposition
DOWNLOAD
Author : Jingwei Shi
language : en
Publisher:
Release Date : 2022
Developing New Chemistries And Applications In Molecular Layer Deposition written by Jingwei Shi and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022 with categories.
Molecular Layer Deposition Of Polymeric Thin Films For Applications In Semiconductor Fabrication
DOWNLOAD
Author : Han Zhou
language : en
Publisher:
Release Date : 2013
Molecular Layer Deposition Of Polymeric Thin Films For Applications In Semiconductor Fabrication written by Han Zhou and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
The electronics industry has been developing improvements in its products at a rapid pace for five decades, an achievement that stems from its ability to continuously decrease the smallest feature sizes in microelectronic devices. To keep step with the miniaturization of next-generation devices, the constituent polymeric films of microelectronics need to meet requirements such as providing conformal, uniform, pinhole-free and ultrathin coatings. Molecular layer deposition (MLD), as an analogue to atomic layer deposition, is a layer-by-layer technique that utilizes sequential, self-limiting reactions of organic precursors to deposit films with one molecular unit at a time, which in turn allows for fine tuning of the position and concentration of various functionalities in the deposited film. Hence MLD can be a powerful method for deposition of polymer films used in semiconductor device fabrication. In this thesis, novel MLD processes are developed for fabricating ultrathin films and improving the film properties with applications in semiconductor manufacturing. The first part of this thesis explores the application of MLD films as chemically amplified photoresist materials. Acid-labile groups are embedded in the backbone of the precursor and incorporated into the photoresist film with a uniform distribution. Two methods of incorporating photo acid generator (PAG) are employed. The first method is to directly soak the PAG into the resist film after deposition and the second approach is to form in-situ polymer-bound PAG. By this novel synthetic approach, several polyurea films were deposited by MLD and tested for patterning, including an aromatic polyurea film with a soaked-in PAG, an aromatic polyurea film with an in-situ polymer-bound PAG, and an aliphatic polyurea film with soaked-in PAG. All these films were successfully deposited and characterized for both materials properties and resist response. Ellipsometry measurements show that the film thicknesses have a linear dependence on the number of MLD cycles. The presence of the urea linkage is confirmed by infrared (IR) spectroscopy, and x-ray photoelectron spectroscopy (XPS) show that the films are deposited with stoichiometric composition. Both of the aromatic films show cross-linking behavior under e-beam exposure, probably due to reaction at the aromatic rings. Moreover, the in-situ polymer-bound aromatic PAG has a lower activity than the soaked-in aromatic PAG, likely due to a lower photoacid yield. Finally, among the three MLD films studied, the aliphatic film performs best as a photoresist material and good sensitivity and resolution are achieved. To be applied in semiconductor device fabrication, polymeric thin films need to be thermally stable. Two approaches are investigated to improve the thermal stability of the MLD films. First, a series of cross-linked polyurea thin films are deposited by using multifunctional precursors. The cross-linked films show constant growth rate, urea chemical bonding, and stoichiometric compositions. More importantly, they exhibit higher film density and thermal stability compared to the non-cross-linked polyurea film. Second, a MLD process for depositing inorganic-organic hybrid carbosiloxane films is developed. Characteristic MLD growth behavior such as a constant growth rate and saturation behaviors are observed with this process as well. Significant improvement of film stability is achieved with the carbosiloxane films. This thesis concludes with thoughts and perspectives on the future of MLD in semiconductor device fabrication.
Molecular Layer Deposition
DOWNLOAD
Author : David S. Bergsman
language : en
Publisher:
Release Date : 2018
Molecular Layer Deposition written by David S. Bergsman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018 with categories.
In recent years, many technological advancements in medicine, renewable energy, water purification, and semiconductor processing have resulted from access to nanotechnology. Though we have many methods for creating nano-sized features, our current nanomaterials toolkit must continue to expand in order to meet the increasing demand for smaller features, more complex architectures, and reduced defect frequencies required by these applications. Molecular layer deposition (MLD) is a promising new method for expanding that toolkit, allowing for the incorporation of organic components into ultrathin materials and nanostructures through a vapor-phase, layer-by-layer synthesis approach. Although a decade and a half of development has already gone into MLD, there is still a significant gap in our understanding of the mechanisms behind MLD growth and the microscopic properties of the resulting films, such as their molecular-level structure. This dissertation presents work to better understand these fundamental properties of MLD and use that understanding to control the thermal, mechanical, and catalytic properties of these materials. In the first half of this work, a study of the structure and growth behavior of organic MLD films is performed. First, the properties of polyurea films are explored as a function of backbone flexibility. Our results suggest that changes in growth rate between the most rigid and most flexible backbones (4 Å/cycle vs 1 Å/cycle) are not caused by differences in the length of molecular precursors, chain orientation (~25° on average for each backbone), or film density (1.0 -- 1.2 g/cm3), but instead are caused by an increased frequency of terminations in the more flexible chemistries. Measurement of the crystallinity and growth angle further suggest that polyurea MLD films exhibit multiple domains, with some chains adopting horizontally packed structures and some chains growing more out-of-plane, leading to an average growth angle of 25°. Interestingly, the observed terminations do not result in the complete cessation of film growth, suggesting that precursors may be absorbing into the film through non-covalent linkages. To observe these absorptions events, MLD is performed on surfaces whose reaction sites have been intentionally eliminated. These terminations are shown to be effective at reducing the growth rate of MLD, suggesting that MLD growth rates are heavily dependent on the number of reaction sites. However, after several cycles, the film growth rate is able to recover, suggesting that monomers have absorbed into the films to reintroduce new reaction sites. A model of growth is developed based on a site balance which suggests that roughly 3% of the chains are terminated by double reactions every cycle. Taken as a whole, this work provides a new paradigm for the growth of MLD films, showing that the films do not adopt the simple layer-by-layer covalent network that is typically portrayed for MLD. MLD has many potential applications in energy and semiconductor manufacturing. In the second half of this thesis, two studies related to the development of MLD are explored. First, a relatively unstudied "manganicone" manganese hybrid MLD chemistry is synthesized using bis(ethylcyclopentadienyl)manganese and ethylene glycol for use as an electrochemically-relevant catalyst material. Characterization of the composition and crystal structure of these films shows them to grow as manganese alkoxides, which partially degrade upon exposure to air into manganese carboxylates. Annealing the hybrid films to remove the carbon is shown to eliminate any porosity introduced through the incorporation of the organic components. However, annealed hybrid films are shown to be less prone to restructuring than ALD-grown MnOx, making them potentially desirable materials for electrodes in thin film batteries. Second, an investigation of the self-assembly of dodecanethiols from the vapor phase onto copper oxide was performed. Dodecanethiols are often used as a blocking layer in area-selective ALD and MLD. The thiols are shown to etch the surface of the CuO to create well-ordered copper-thiolate multilayers several nanometers thick, with crystallites oriented parallel and perpendicular to the substrate surface. In addition, after exposure to air for several days, the multilayer films ripen into particles several microns wide and several hundred nanometers high over the course of several days. This ripening has never before been observed for thiols deposited on copper or copper oxide Finally, a conclusion is presented with several perspectives on the possible use of MLD in the future.
New Chemistries And Applications In Molecular Layer Deposition
DOWNLOAD
Author : Richard Gene Closser
language : en
Publisher:
Release Date : 2019
New Chemistries And Applications In Molecular Layer Deposition written by Richard Gene Closser and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with categories.
Recent advancements in nanotechnologies have highlighted the need for thin film deposition capabilities that allow for fine thickness and compositional control. One technique that could help meet these needs is molecular layer deposition (MLD). MLD is a vapor-to-surface organic deposition method that utilizes sequential, self-limiting surface reactions, whereby thin film polymers can be grown. Since its inception, there has been significant progress in MLD synthesis capability, but certain challenges remain. Due to its vapor-phase nature, MLD is unable to utilize solvents and catalysts available to solution phase chemistry. This constraint has limited the variety of polymers that can be grown by MLD, including those formed by carbon-carbon bond synthesis. Another challenge for MLD is to enable area selective (AS) deposition, a process of significant interest in the semiconductor industry because of its potential to reduce fabrication processing steps and facilitate the scale-down of device feature sizes. The first portion of this work discusses a technique allowing for enhanced selectivity in AS-MLD. To achieve these highly selective depositions, a self-assembled monolayer (SAM) layer is used to act as a resist towards MLD. A chemical lift-off step is also employed, which is shown to significantly increase the overall selectivity of the AS-MLD process. Next, a new method for MLD of a silicon oxycarbide (SiOC) material is introduced. SiOC films are typically made with highly oxidizing reactants at elevated temperatures, causing film degradation during the deposition. The new MLD process, however, utilizes mild reactants at room temperature, thereby eliminating degradation problems, resulting in well defined SiOC films. The SiOC films crosslink during the deposition forming a robust film with exceptional thermal stability. The films show a low dielectric (k) constant, supporting their potential use in semiconductor devices where thermally resistant coatings with low-k properties are needed. Lastly, the development of a new MLD polymer is introduced. By utilizing UV light for radical polymerization, direct formation of carbon-carbon bonds is enabled in a photoactivated MLD (pMLD) synthesis. An alternating hydrocarbon-fluorocarbon copolymer, grown via pMLD using iodo-ene coupling, polymerizes by new carbon-carbon bond formation. The fluoropolymer exhibits high thermal stability and chemical resistance as well as the ability to be patterned using a photomask. The pMLD film also shows the ability to be used as a resist for selective deposition. The continued development of thin film techniques such as MLD is essential for progress to be made in nanoscale technologies and could have significant impact towards increasing energy efficiency, providing clean air and water, and improving healthcare. The focus of this work, therefore, is to advance the capabilities of MLD, allowing for new materials and applications.
Nanoporous Thin Films Made By Atomic Layer Deposition And Molecular Layer Deposition
DOWNLOAD
Author : Lilit Ghazaryan
language : en
Publisher:
Release Date : 2017
Nanoporous Thin Films Made By Atomic Layer Deposition And Molecular Layer Deposition written by Lilit Ghazaryan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with categories.
Molecular Layer Deposition Chemistry And Morphology Of Thin Polyurethane Layers On Native Metals
DOWNLOAD
Author : Frank Fug
language : en
Publisher:
Release Date : 2022
Molecular Layer Deposition Chemistry And Morphology Of Thin Polyurethane Layers On Native Metals written by Frank Fug and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022 with categories.