Nano Cmos Circuit And Physical Design
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Nano Cmos Circuit And Physical Design
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Author : Ban Wong
language : en
Publisher: John Wiley & Sons
Release Date : 2005-04-08
Nano Cmos Circuit And Physical Design written by Ban Wong and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-04-08 with Technology & Engineering categories.
Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
Nano Cmos Design For Manufacturability
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Author : Ban P. Wong
language : en
Publisher: John Wiley & Sons
Release Date : 2008-12-29
Nano Cmos Design For Manufacturability written by Ban P. Wong and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-12-29 with Technology & Engineering categories.
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
Nano Cmos Design For Manufacturability
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Author : Ban P. Wong
language : en
Publisher: Wiley-Interscience
Release Date : 2008-10-20
Nano Cmos Design For Manufacturability written by Ban P. Wong and has been published by Wiley-Interscience this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-10-20 with Technology & Engineering categories.
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
Cmos Sram Circuit Design And Parametric Test In Nano Scaled Technologies
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Author : Andrei Pavlov
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-06-01
Cmos Sram Circuit Design And Parametric Test In Nano Scaled Technologies written by Andrei Pavlov and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-06-01 with Technology & Engineering categories.
The monograph will be dedicated to SRAM (memory) design and test issues in nano-scaled technologies by adapting the cell design and chip design considerations to the growing process variations with associated test issues. Purpose: provide process-aware solutions for SRAM design and test challenges.
Cmos
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Author : R. Jacob Baker
language : en
Publisher: John Wiley & Sons
Release Date : 2008
Cmos written by R. Jacob Baker and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with Technology & Engineering categories.
This edition provides an important contemporary view of a wide range of analog/digital circuit blocks, the BSIM model, data converter architectures, and more. The authors develop design techniques for both long- and short-channel CMOS technologies and then compare the two.
Flip Flop Design In Nanometer Cmos
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Author : Massimo Alioto
language : en
Publisher: Springer
Release Date : 2014-10-14
Flip Flop Design In Nanometer Cmos written by Massimo Alioto and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-10-14 with Technology & Engineering categories.
This book provides a unified treatment of Flip-Flop design and selection in nanometer CMOS VLSI systems. The design aspects related to the energy-delay tradeoff in Flip-Flops are discussed, including their energy-optimal selection according to the targeted application, and the detailed circuit design in nanometer CMOS VLSI systems. Design strategies are derived in a coherent framework that includes explicitly nanometer effects, including leakage, layout parasitics and process/voltage/temperature variations, as main advances over the existing body of work in the field. The related design tradeoffs are explored in a wide range of applications and the related energy-performance targets. A wide range of existing and recently proposed Flip-Flop topologies are discussed. Theoretical foundations are provided to set the stage for the derivation of design guidelines, and emphasis is given on practical aspects and consequences of the presented results. Analytical models and derivations are introduced when needed to gain an insight into the inter-dependence of design parameters under practical constraints. This book serves as a valuable reference for practicing engineers working in the VLSI design area, and as text book for senior undergraduate, graduate and postgraduate students (already familiar with digital circuits and timing).
Circuits At The Nanoscale
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Author : Krzysztof Iniewski
language : en
Publisher: CRC Press
Release Date : 2018-10-08
Circuits At The Nanoscale written by Krzysztof Iniewski and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-10-08 with Technology & Engineering categories.
Circuits for Emerging Technologies Beyond CMOS New exciting opportunities are abounding in the field of body area networks, wireless communications, data networking, and optical imaging. In response to these developments, top-notch international experts in industry and academia present Circuits at the Nanoscale: Communications, Imaging, and Sensing. This volume, unique in both its scope and its focus, addresses the state-of-the-art in integrated circuit design in the context of emerging systems. A must for anyone serious about circuit design for future technologies, this book discusses emerging materials that can take system performance beyond standard CMOS. These include Silicon on Insulator (SOI), Silicon Germanium (SiGe), and Indium Phosphide (InP). Three-dimensional CMOS integration and co-integration with Microelectromechanical (MEMS) technology and radiation sensors are described as well. Topics in the book are divided into comprehensive sections on emerging design techniques, mixed-signal CMOS circuits, circuits for communications, and circuits for imaging and sensing. Dr. Krzysztof Iniewski is a director at CMOS Emerging Technologies, Inc., a consulting company in Vancouver, British Columbia. His current research interests are in VLSI ciruits for medical applications. He has published over 100 research papers in international journals and conferences, and he holds 18 international patents granted in the United States, Canada, France, Germany, and Japan. In this volume, he has assembled the contributions of over 60 world-reknown experts who are at the top of their field in the world of circuit design, advancing the bank of knowledge for all who work in this exciting and burgeoning area.
Low Power High Level Synthesis For Nanoscale Cmos Circuits
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Author : Saraju P. Mohanty
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-05-31
Low Power High Level Synthesis For Nanoscale Cmos Circuits written by Saraju P. Mohanty and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-05-31 with Technology & Engineering categories.
Low-Power High-Level Synthesis for Nanoscale CMOS Circuits addresses the need for analysis, characterization, estimation, and optimization of the various forms of power dissipation in the presence of process variations of nano-CMOS technologies. The authors show very large-scale integration (VLSI) researchers and engineers how to minimize the different types of power consumption of digital circuits. The material deals primarily with high-level (architectural or behavioral) energy dissipation because the behavioral level is not as highly abstracted as the system level nor is it as complex as the gate/transistor level. At the behavioral level there is a balanced degree of freedom to explore power reduction mechanisms, the power reduction opportunities are greater, and it can cost-effectively help in investigating lower power design alternatives prior to actual circuit layout or silicon implementation. The book is a self-contained low-power, high-level synthesis text for Nanoscale VLSI design engineers and researchers. Each chapter has simple relevant examples for a better grasp of the principles presented. Several algorithms are given to provide a better understanding of the underlying concepts. The initial chapters deal with the basics of high-level synthesis, power dissipation mechanisms, and power estimation. In subsequent parts of the text, a detailed discussion of methodologies for the reduction of different types of power is presented including: • Power Reduction Fundamentals • Energy or Average Power Reduction • Peak Power Reduction • Transient Power Reduction • Leakage Power Reduction Low-Power High-Level Synthesis for Nanoscale CMOS Circuits provides a valuable resource for the design of low-power CMOS circuits.
Low Dimensional Nanoelectronic Devices
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Author : Angsuman Sarkar
language : en
Publisher: CRC Press
Release Date : 2022-10-27
Low Dimensional Nanoelectronic Devices written by Angsuman Sarkar and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022-10-27 with Science categories.
Providing cutting-edge research on nanoelectronics and photonic devices and its application in future integrated circuits, this state-of-the-art book tackles the challenges of the different detailed theoretical and analytical models of solving the problems of various nanodevices. The volume also explores from different angles the roles of material composition and choice of materials that now play the most critical role in determining outcomes of low-dimensional nanoelectronic devices. The applications of those findings are extremely beneficial for the computing and telecommunication industries. Beginning with a solid theoretical background for every chapter, this volume covers the hottest areas of present-day electronic engineering. The continuous miniaturization of devices, components, and systems requires corresponding cutting-edge theoretical analysis supported by simulated findings before actual fabrication. That purpose is given maximum focus in this volume, which has interdisciplinary appeal, making it a comprehensive technological volume that deals with underlying aspects of physics, materials, structures in nano-regime, and the corresponding end-product in the form of devices.
Design Rules In A Semiconductor Foundry
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Author : Eitan N. Shauly
language : en
Publisher: CRC Press
Release Date : 2022-11-30
Design Rules In A Semiconductor Foundry written by Eitan N. Shauly and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022-11-30 with Technology & Engineering categories.
Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.