Optical Diagnostics For Thin Film Processing
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Optical Diagnostics For Thin Film Processing
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Author : Irving P. Herman
language : en
Publisher: Elsevier
Release Date : 1996-10-23
Optical Diagnostics For Thin Film Processing written by Irving P. Herman and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-23 with Technology & Engineering categories.
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic
Handbook Of Thin Film Process Technology
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Author : D Glocker
language : en
Publisher: CRC Press
Release Date : 2018-01-18
Handbook Of Thin Film Process Technology written by D Glocker and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-01-18 with Science categories.
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.
Handbook Of Thin Film Process Technology
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Author : David A Glocker
language : en
Publisher: CRC Press
Release Date : 2018-01-18
Handbook Of Thin Film Process Technology written by David A Glocker and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-01-18 with Science categories.
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies
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Author : Y. Pauleau
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies written by Y. Pauleau and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Handbook Of Semiconductor Interconnection Technology
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Author : Geraldine Cogin Shwartz
language : en
Publisher: CRC Press
Release Date : 2006-02-22
Handbook Of Semiconductor Interconnection Technology written by Geraldine Cogin Shwartz and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-02-22 with Technology & Engineering categories.
First introduced about a decade ago, the first edition of the Handbook of Semiconductor Interconnection Technology became widely popular for its thorough, integrated treatment of interconnect technologies and its forward-looking perspective. The field has grown tremendously in the interim and many of the "likely directions" outlined in the first ed
Database Needs For Modeling And Simulation Of Plasma Processing
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Author : National Research Council
language : en
Publisher: National Academies Press
Release Date : 1996-10-21
Database Needs For Modeling And Simulation Of Plasma Processing written by National Research Council and has been published by National Academies Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-21 with Science categories.
In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.
Handbook Of Silicon Semiconductor Metrology
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Author : Alain C. Diebold
language : en
Publisher: CRC Press
Release Date : 2001-06-29
Handbook Of Silicon Semiconductor Metrology written by Alain C. Diebold and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-06-29 with Technology & Engineering categories.
Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
Optical Engineering
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Author :
language : en
Publisher:
Release Date : 1997
Optical Engineering written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Optical instruments categories.
Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Handbook Of Ellipsometry
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Author : Harland Tompkins
language : en
Publisher: William Andrew
Release Date : 2005-01-06
Handbook Of Ellipsometry written by Harland Tompkins and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-01-06 with Science categories.
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
Plasma Polymer Films
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Author : Hynek Biederman
language : en
Publisher: World Scientific
Release Date : 2004
Plasma Polymer Films written by Hynek Biederman and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Science categories.
Annotation. Plasma Polymer Films examines the current status of the deposition and characterization of fluorocarbon-, hydrocarbon- and silicon-containing plasma polymer films and nanocomposites, with plasma polymer matrix. It introduces plasma polymerization process diagnostics such as optical emission spectroscopy (OES, AOES), and describes special deposition techniques such as atmospheric pressure glow discharge. Important issues for applications such as degradation and stability are treated in detail, and structural characterization, basic electrical and optical properties and biomedical applications are discussed.