Optimization Techniques For Vlsi Process Modeling And Tcad In Semiconductor Manufacturing
DOWNLOAD
Download Optimization Techniques For Vlsi Process Modeling And Tcad In Semiconductor Manufacturing PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Optimization Techniques For Vlsi Process Modeling And Tcad In Semiconductor Manufacturing book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Optimization Techniques For Vlsi Process Modeling And Tcad In Semiconductor Manufacturing
DOWNLOAD
Author : Luigi Capodieci
language : en
Publisher:
Release Date : 1997
Optimization Techniques For Vlsi Process Modeling And Tcad In Semiconductor Manufacturing written by Luigi Capodieci and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with categories.
Technology Computer Aided Design
DOWNLOAD
Author : Chandan Kumar Sarkar
language : en
Publisher: CRC Press
Release Date : 2013-05-16
Technology Computer Aided Design written by Chandan Kumar Sarkar and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-16 with Technology & Engineering categories.
Responding to recent developments and a growing VLSI circuit manufacturing market, Technology Computer Aided Design: Simulation for VLSI MOSFET examines advanced MOSFET processes and devices through TCAD numerical simulations. The book provides a balanced summary of TCAD and MOSFET basic concepts, equations, physics, and new technologies related to TCAD and MOSFET. A firm grasp of these concepts allows for the design of better models, thus streamlining the design process, saving time and money. This book places emphasis on the importance of modeling and simulations of VLSI MOS transistors and TCAD software. Providing background concepts involved in the TCAD simulation of MOSFET devices, it presents concepts in a simplified manner, frequently using comparisons to everyday-life experiences. The book then explains concepts in depth, with required mathematics and program code. This book also details the classical semiconductor physics for understanding the principle of operations for VLSI MOS transistors, illustrates recent developments in the area of MOSFET and other electronic devices, and analyzes the evolution of the role of modeling and simulation of MOSFET. It also provides exposure to the two most commercially popular TCAD simulation tools Silvaco and Sentaurus. • Emphasizes the need for TCAD simulation to be included within VLSI design flow for nano-scale integrated circuits • Introduces the advantages of TCAD simulations for device and process technology characterization • Presents the fundamental physics and mathematics incorporated in the TCAD tools • Includes popular commercial TCAD simulation tools (Silvaco and Sentaurus) • Provides characterization of performances of VLSI MOSFETs through TCAD tools • Offers familiarization to compact modeling for VLSI circuit simulation R&D cost and time for electronic product development is drastically reduced by taking advantage of TCAD tools, making it indispensable for modern VLSI device technologies. They provide a means to characterize the MOS transistors and improve the VLSI circuit simulation procedure. The comprehensive information and systematic approach to design, characterization, fabrication, and computation of VLSI MOS transistor through TCAD tools presented in this book provides a thorough foundation for the development of models that simplify the design verification process and make it cost effective.
Performance Modeling And Optimization Techniques In The Presence Of Random Process Variations To Improve Parametric Yield Of Vlsi Circuits
DOWNLOAD
Author : Shubhankar Basu
language : en
Publisher:
Release Date : 2008
Performance Modeling And Optimization Techniques In The Presence Of Random Process Variations To Improve Parametric Yield Of Vlsi Circuits written by Shubhankar Basu and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with categories.
As semiconductor industry continues to follow Moore's Law of doubled device count every 18 months, it is challenged by the rising uncertainties in the manufacturing process for nanometer technologies. Manufacturing defects lead to a random variation in physical parameters like the dopant density, critical dimensions and oxide thickness. These physical defects manifest themselves as variations in device process parameters like threshold voltage and effective channel length of transistors. The randomness in process parameters affect the performance of VLSI circuits which leads to a loss in parametric yield. Conventional design methodologies, with corner case based analysis techniques fail to predict the performance of circuits reliably in the presence of random process variations. Moreover, the analysis techniques for detection of defects in the later stages of the design cycle result in significant overhead in cost due to re-spins. In recent times, VLSI computer aided design methodologies have shifted to statistical analysis techniques for performance measurements with specific yield targets. However, the adoption of statistical techniques in commercial design flows has been limited by the complexity of their usage and the need for generating specially characterized models. This also makes them unsuitable in repeated loops during the synthesis process. In this dissertation, we present an alternate approach to model and optimize the performance of digital and analog circuits in the presence of random process variations. Our work is targeted for a bottom-up methodology providing incremental tolerance to the circuits under the impact of random process variations. The methodologies presented, can be used to generate fast evaluating accurate macromodels to compute the bounds of performance due to the underlying variations in device parameters. The primary goal of our methodology is to capture the statistical aspects of variation in the lower levels of abstraction, while aiding deterministic analysis during the top level design optimization. We also attempt to build our solutions as a wrapper around a conventional design flow, without the requirement for special characterization. The modeling and optimization techniques are perfectly scalable across technology generations and can find practical usage during variation-tolerant synthesis of VLSI circuit performance.
Optimization Models For Semiconductor Devices
DOWNLOAD
Author : Martin Burger
language : en
Publisher:
Release Date : 2015-12
Optimization Models For Semiconductor Devices written by Martin Burger and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-12 with categories.
Computational Modeling In Semiconductor Processing
DOWNLOAD
Author : M. Meyyappan
language : en
Publisher: Artech House Publishers
Release Date : 1995
Computational Modeling In Semiconductor Processing written by M. Meyyappan and has been published by Artech House Publishers this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Computers categories.
This book provides you with in-depth coverage of the models, governing equations, and numerical techniques suitable for process simulation -- so you can give your designs the competitive edge. You will understand the basic principles of transport phenomena, gas phase, and surface reactions in electronics material processing, and learn practical numerical techniques used in process simulations.
Standard Cell Optimization And Physical Design In Advanced Technology Nodes
DOWNLOAD
Author : Xiaoqing Xu (Ph. D.)
language : en
Publisher:
Release Date : 2017
Standard Cell Optimization And Physical Design In Advanced Technology Nodes written by Xiaoqing Xu (Ph. D.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with categories.
Integrated circuits (ICs) are at the heart of modern electronics, which rely heavily on the state-of-the-art semiconductor manufacturing technology. The key to pushing forward semiconductor technology is IC feature-size miniaturization. However, this brings ever-increasing design complexities and manufacturing challenges to the $340 billion semiconductor industry. The manufacturing of two-dimensional layout on high-density metal layers depends on complex design-for-manufacturing techniques and sophisticated empirical optimizations, which introduces huge amounts of turnaround time and yield loss in advanced technology nodes. Our study reveals that unidirectional layout design can significantly reduce the manufacturing complexities and improve the yield, which is becoming increasingly adopted in semiconductor industry [61, 89]. The lithography printing of unidirectional layout can be tightly controlled using advanced patterning techniques, such as self-aligned double and quadruple patterning. Despite the manufacturing benefits, unidirectional layout leads to more restrictive solution space and brings significant impacts on the IC design automation ow for routing closure. Notably, unidirectional routing limits the standard cell pin accessibility, which further exacerbates the resource competitions during routing. Moreover, for post-routing optimization, traditional redundant-via insertion has become obsolete under unidirectional routing style, which makes the yield enhancement task extremely challenging. Regardless of complex multiple patterning and design-for-manufacturing approaches, mask optimization through resolution enhancement techniques remains as the key strategy to improve the yield of the semiconductor manufacturing processes. Among them, Sub-Resolution Assist Feature (SRAF) generation is a very important method to improve lithographic process windows. Model-based SRAF generation has been widely used to achieve high accuracy but it is time-consuming and hard to obtain consistent SRAFs. This dissertation proposes novel CAD algorithms and methodologies for standard cell optimization and physical design in advanced technology nodes, which ultimately reduces the design cycle and manufacturing cost of IC design. First, a standard cell pin access optimization engine is proposed to evaluate the pin accessibility of a given standard cell library. We further propose novel pin access planning techniques and concurrent pin access optimizations to efficiently resolve the routing resource competitions, which generates much better routing solutions than state-of-the-art, manufacturing-friendly routers. To systematically improve the manufacturing yield in the post-routing stage, a global optimization engine has been introduced for redundant local-loop insertion considering advanced manufacturing constraints. Finally, we propose the first machine learning-based framework for fast yet consistent SRAF generation with the high quality of results.
Industrial Engineering Concepts Methodologies Tools And Applications
DOWNLOAD
Author : Management Association, Information Resources
language : en
Publisher: IGI Global
Release Date : 2012-08-31
Industrial Engineering Concepts Methodologies Tools And Applications written by Management Association, Information Resources and has been published by IGI Global this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-08-31 with Technology & Engineering categories.
Industrial engineering affects all levels of society, with innovations in manufacturing and other forms of engineering oftentimes spawning cultural or educational shifts along with new technologies. Industrial Engineering: Concepts, Methodologies, Tools, and Applications serves as a vital compendium of research, detailing the latest research, theories, and case studies on industrial engineering. Bringing together contributions from authors around the world, this three-volume collection represents the most sophisticated research and developments from the field of industrial engineering and will prove a valuable resource for researchers, academics, and practitioners alike.
American Doctoral Dissertations
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1996
American Doctoral Dissertations written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Dissertation abstracts categories.
Integrating Technology Simulation Into Semiconductor Manufacturing
DOWNLOAD
Author : Rainer Minixhofer
language : de
Publisher: VDM Publishing
Release Date : 2008
Integrating Technology Simulation Into Semiconductor Manufacturing written by Rainer Minixhofer and has been published by VDM Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with categories.
Semiconductor Industry is the main driving force for technology innovation and "New Economy" markets. The ongoing development of faster integrated circuits with higher device density has led to highly complex and sophisticated products which are widely accepted by society. A modern integrated circuit cannot be developed without the massive use of computer aided design (CAD) in any step of the complex flow from the idea to the final product. This work concentrates on technology computer aided design (TCAD) and its integration into the semiconductor fabrication process flow. An analysis of the current semiconductor manufacturing flow and its implications on how TCAD can be integrated into it is shown. By doing a structured approach it is demonstrated how such a system can be implemented in real conditions. Furthermore the flexibility and advantages of the integration is shown by a couple of real examples. This book is intended to be a reference to TCAD engineers which are facing support requests from manufacturing and to manufacturing engineers to get new ideas of how TCAD can be used in their every day business.
Simulation Of Semiconductor Devices And Processes
DOWNLOAD
Author : Heiner Ryssel
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Simulation Of Semiconductor Devices And Processes written by Heiner Ryssel and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Computers categories.
SISDEP ’95 provides an international forum for the presentation of state-of-the-art research and development results in the area of numerical process and device simulation. Continuously shrinking device dimensions, the use of new materials, and advanced processing steps in the manufacturing of semiconductor devices require new and improved software. The trend towards increasing complexity in structures and process technology demands advanced models describing all basic effects and sophisticated two and three dimensional tools for almost arbitrarily designed geometries. The book contains the latest results obtained by scientists from more than 20 countries on process simulation and modeling, simulation of process equipment, device modeling and simulation of novel devices, power semiconductors, and sensors, on device simulation and parameter extraction for circuit models, practical application of simulation, numerical methods, and software.
