Plasma Electronics
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Plasma Electronics
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Author : Toshiaki Makabe
language : en
Publisher: CRC Press
Release Date : 2014-08-27
Plasma Electronics written by Toshiaki Makabe and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-08-27 with Science categories.
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental
Plasma Electronics
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Author : Toshiaki Makabe
language : en
Publisher: CRC Press
Release Date : 2006-03-27
Plasma Electronics written by Toshiaki Makabe and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-03-27 with Science categories.
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Plasma Physics And Plasma Electronics
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Author : L. M. Kovrizhnykh
language : en
Publisher:
Release Date : 1989
Plasma Physics And Plasma Electronics written by L. M. Kovrizhnykh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with Science categories.
Fourteen technical reports of research activity at (what used to the called) the Lebedev Physics Institute. Most of the research derives from stellarator work. The Russian edition appeared in 1985. Production work acceptable, though the crispness of the printing is surpassed by most newspapers. (NW)
Fundamentals Of Gaseous Ionization And Plasma Electronics
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Author : Essam Nasser
language : en
Publisher: John Wiley & Sons
Release Date : 1971
Fundamentals Of Gaseous Ionization And Plasma Electronics written by Essam Nasser and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 1971 with Science categories.
Plasma Electronics Second Edition
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Author : Toshiaki Makabe
language : en
Publisher: CRC Press
Release Date : 2014-08-27
Plasma Electronics Second Edition written by Toshiaki Makabe and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-08-27 with Science categories.
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Plasma Processing Of Materials
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Author : National Research Council
language : en
Publisher: National Academies Press
Release Date : 1991-02-01
Plasma Processing Of Materials written by National Research Council and has been published by National Academies Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991-02-01 with Technology & Engineering categories.
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Plasma Processing For Vlsi
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Author : Norman G. Einspruch
language : en
Publisher: Academic Press
Release Date : 2014-12-01
Plasma Processing For Vlsi written by Norman G. Einspruch and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-12-01 with Technology & Engineering categories.
VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
Plasma Cathode Electron Sources
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Author : Efim Oks
language : en
Publisher: John Wiley & Sons
Release Date : 2007-06-27
Plasma Cathode Electron Sources written by Efim Oks and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-06-27 with Science categories.
This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications.
Plasma And Current Instabilities In Semiconductors
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Author : Juras Pozhela
language : en
Publisher: Elsevier
Release Date : 2017-05-03
Plasma And Current Instabilities In Semiconductors written by Juras Pozhela and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-05-03 with Science categories.
Plasma and Current Instabilities in Semiconductors details the main ideas in the physics of plasma and current instabilities in semiconductors. The title first covers plasma in semiconductors, and then proceeds to tackling waves in plasma. Next, the selection details wave instabilities in plasma and drift instabilities. The text also discusses hot electrons, along with the instabilities due to inter-valley electron transfer. The next chapters talks about avalanche and recombination instabilities. The last chapter deals with plasma streams. The book will be of great use to student and professional electronics engineers and technicians.
Modern Microwave And Millimeter Wave Power Electronics
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Author : Gregory S. Nusinovich
language : en
Publisher: John Wiley & Sons
Release Date : 2005-04-19
Modern Microwave And Millimeter Wave Power Electronics written by Gregory S. Nusinovich and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-04-19 with Technology & Engineering categories.
A comprehensive study of microwave vacuum electronic devices and their current and future applications While both vacuum and solid-state electronics continue to evolve and provide unique solutions, emerging commercial and military applications that call for higher power and higher frequencies to accommodate massive volumes of transmitted data are the natural domain of vacuum electronics technology. Modern Microwave and Millimeter-Wave Power Electronics provides systems designers, engineers, and researchers-especially those with primarily solid-state training-with a thoroughly up-to-date survey of the rich field of microwave vacuum electronic device (MVED) technology. This book familiarizes the R&D and academic communities with the capabilities and limitations of MVED and highlights the exciting scientific breakthroughs of the past decade that are dramatically increasing the compactness, efficiency, cost-effectiveness, and reliability of this entire class of devices. This comprehensive text explores a wide range of topics: Traveling-wave tubes, which form the backbone of satellite and airborne communications, as well as of military electronic countermeasures systems Microfabricated MVEDs and advanced electron beam sources Klystrons, gyro-amplifiers, and crossed-field devices "Virtual prototyping" of MVEDs via advanced 3-D computational models High-Power Microwave (HPM) sources Next-generation microwave structures and circuits How to achieve linear amplification Advanced materials technologies for MVEDs A Web site appendix providing a step-by-step walk-through of a typical MVED design process Concluding with an in-depth examination of emerging applications and future possibilities for MVEDs, Modern Microwave and Millimeter-Wave Power Electronics ensures that systems designers and engineers understand and utilize the significant potential of this mature, yet continually developing technology. SPECIAL NOTE: All of the editors' royalties realized from the sale of this book will fund the future research and publication activities of graduate students in the vacuum electronics field.