Plasma Electronics Second Edition
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Plasma Electronics Second Edition
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Author : Toshiaki Makabe
language : en
Publisher: CRC Press
Release Date : 2014-08-27
Plasma Electronics Second Edition written by Toshiaki Makabe and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-08-27 with Science categories.
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Plasma Electronics
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Author : Toshiaki Makabe
language : en
Publisher: CRC Press
Release Date : 2006-03-27
Plasma Electronics written by Toshiaki Makabe and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-03-27 with Science categories.
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Plasma Electronics
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Author : Toshiaki Makabe
language : en
Publisher: CRC Press
Release Date : 2006-03-27
Plasma Electronics written by Toshiaki Makabe and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-03-27 with Science categories.
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagnosis. Plasma Electronics: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods necessary to bring these technologies from the laboratory to the factory. Beginning with an overview of the basic characteristics and applications of low-temperature plasma, preeminent experts Makabe and Petrovic explore the physics underlying the complex behavior of non-equilibrium (or low temperature) plasma. They discuss charged particle transport in general and in detail as well as macroscopic plasma characteristics and elementary processes in gas phase and on surfaces. After laying this groundwork, the book examines state-of-the-art computational methods for modeling plasma and reviews various important applications including inductively and capacitively coupled plasma, magnetically enhanced plasma, and various processing techniques, while numerous problems and worked examples reinforce the concepts. Uniquely combining physics, numerical methods, and practical applications, Plasma Electronics: Applications in Microelectronic Device Fabrication equips you with the knowledge necessary to scale up lab bench breakthroughs into industrial innovations.
Plasma Physics And Plasma Electronics
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Author : L. M. Kovrizhnykh
language : en
Publisher:
Release Date : 1989
Plasma Physics And Plasma Electronics written by L. M. Kovrizhnykh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with Science categories.
Fourteen technical reports of research activity at (what used to the called) the Lebedev Physics Institute. Most of the research derives from stellarator work. The Russian edition appeared in 1985. Production work acceptable, though the crispness of the printing is surpassed by most newspapers. (NW)
Basic Data Of Plasma Physics
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Author : Sanborn C. Brown
language : en
Publisher: Mit Press
Release Date : 1966-12-01
Basic Data Of Plasma Physics written by Sanborn C. Brown and has been published by Mit Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1966-12-01 with Science categories.
This second edition of Basic Data of Plasma Physics is, in essence, a new book, for several reasons. First, so voluminous have been the research results in this area since the first edition of 1959 that the basic data themselves are greatly changed and enlarged. Second, whereas the earlier edition presented much of the material in verbal form, this one displays almost all of it in a consistent set of graphic figures. And, finally, this new edition is one of the first implementations of computer-based information transfer, in which the basic data were searched out by means of a remote console tied into a central disk library containing an extensive collection of bibliographic information on physics literature.This last matter deserves further amplification, since the new techniques employed here are likely to be used more and more often in the future--because of the ever more rapidly expanding volume of research results just mentioned. Professor Brown, writing in Physics Today, summarizes his aims and methods:Any collection of data one can make these days is out of date before it is published. This is true, for example, of my Basic Data of Plasma Physics. In the book I tried to bring together in useful form the data of gaseous electronics and plasma physics upon which scientists base calculations and further work with basic parameters.Updating this book seemed an ideal computer experiment. I used the Information Retrieval Service of the TIP (Technical Information Project) program not only to find material that has come out since publication of the book but also to arrange the program so that the computer could continue in the future to retrieve relevant information....The Technical Information Project, upon which this experiment is based, has programmed 25 physics journals from the past few years and The Physical Review from 1959 onto the IBM 7094 operated by Project MAC. Project MAC uses a compatible time-sharing system that is available by standard telephone connections....The TIP program contains title, author, reference and entire bibliography of every article covered by the computer....Entrance into the TIP system is made by choosing a key word or words most likely to be contained in the title of an article in a specific subject....in the revision of Basic Data of Plasma Physics the material is created in an open-ended form so that anyone with access to the computer program can search the literature for material that will appear after the report is printed. This feature of the bibliographic search by computers provides a new dimension to the published literature in book form which, without this open-ended feature, is out of date quite generally long before the actual publication date.
Plasma Physics And Engineering Second Edition
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Author : Alexander Fridman
language : en
Publisher: CRC Press
Release Date : 2011-02-22
Plasma Physics And Engineering Second Edition written by Alexander Fridman and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-02-22 with Science categories.
Plasma plays an important role in a wide variety of industrial processes, including material processing, environmental control, electronic chip manufacturing, light sources, and green energy, not to mention fuel conversion and hydrogen production, biomedicine, flow control, catalysis, and space propulsion. Following the general outline of the bestselling first edition, Plasma Physics and Engineering, Second Edition provides a clear fundamental introduction to all aspects of the modern field. Reflecting recent scientific and technological developments, this resource will be useful to engineers, scientists, and students working with the physics, engineering, chemistry, and combustion of plasma, as well as chemical physics, lasers, electronics, new methods of material treatment, fuel conversion, and environmental control. The book includes many enhancements and some totally new coverage of fundamental subjects such as: Interaction and dynamics of streamers Plasma-flow interaction High-speed plasma aerodynamics Plasma-surface interaction Mechanisms and kinetics of plasma–medical processes Along with these new topics and deeper coverage of material from the first book, this edition presents two new chapters on microdischarges and discharges in liquids. It also contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions. PowerPointTM slides and a solutions manual are available for qualifying instructors who adopt this book for their courses.
Principles Of Plasma Discharges And Materials Processing
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Author : Michael A. Lieberman
language : en
Publisher: John Wiley & Sons
Release Date : 2005-04-08
Principles Of Plasma Discharges And Materials Processing written by Michael A. Lieberman and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-04-08 with Science categories.
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Plasma Antennas Second Edition
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Author : Theodore Anderson
language : en
Publisher: Artech House
Release Date : 2020-11-30
Plasma Antennas Second Edition written by Theodore Anderson and has been published by Artech House this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-11-30 with Technology & Engineering categories.
This updated edition of an Artech House classic contains steering, focusing, and spreading of antenna beams using the physics of refraction of electromagnetic waves through a plasma. Pulsing circuitry for ionizing plasma antennas with low power requirements are covered. New and improved smart plasma antenna and applications to wi-fi and the applications of plasma antennas are discussed. Experimental work on plasma antenna noise and new progress on ruggedization and custom-made plasma tubes are also presented. This unique resource provides readers with a solid understanding of the efficient design and prototype development of plasma antennas to meet the challenge of reducing the power required to ionize the gas at various plasma densities. Thorough coverage of the technical underpinnings of plasma antennas, as well as important discussions on current markets and applications are discussed. Additionally, the book presents experimental work in this cutting-edge area and reveals the latest developments in the field.
Introduction To Plasma Physics And Controlled Fusion
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Author : Francis F. Chen
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Introduction To Plasma Physics And Controlled Fusion written by Francis F. Chen and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.
TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.
Plasma Electronics Vol 2
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Author : A. I. Akhiezer
language : en
Publisher:
Release Date : 1975
Plasma Electronics Vol 2 written by A. I. Akhiezer and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1975 with categories.