Proceedings Of The Symposia On Interconnects Contact Metallization And Multilevel Metallization And Reliability For Semiconductor Devices Interconnects And Thin Insulator Materials
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Proceedings Of The Symposia On Interconnects Contact Metallization And Multilevel Metallization And Reliability For Semiconductor Devices Interconnects And Thin Insulator Materials
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Author : T. O. Herndon
language : en
Publisher:
Release Date : 1993
Proceedings Of The Symposia On Interconnects Contact Metallization And Multilevel Metallization And Reliability For Semiconductor Devices Interconnects And Thin Insulator Materials written by T. O. Herndon and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Dielectrics categories.
Cleaning Technology In Semiconductor Device Manufacturing
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Author :
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Cleaning Technology In Semiconductor Device Manufacturing written by and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
Handbook For Cleaning For Semiconductor Manufacturing
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Author : Karen A. Reinhardt
language : en
Publisher: John Wiley & Sons
Release Date : 2011-04-12
Handbook For Cleaning For Semiconductor Manufacturing written by Karen A. Reinhardt and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-04-12 with Technology & Engineering categories.
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Proceedings Of The Symposia On Reliability Of Semiconductor Devices And Interconnection And Multilevel Metallization Interconnection And Contact Technologies
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Author : Harzara S. Rathore
language : en
Publisher:
Release Date : 1989
Proceedings Of The Symposia On Reliability Of Semiconductor Devices And Interconnection And Multilevel Metallization Interconnection And Contact Technologies written by Harzara S. Rathore and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with Integrated circuits categories.
Cleaning Technology In Semiconductor Device Manufacturing
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Author :
language : en
Publisher:
Release Date : 2000
Cleaning Technology In Semiconductor Device Manufacturing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Semiconductor wafers categories.
Optical Characterization Techniques For High Performance Microelectronic Device Manufacturing
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Author :
language : en
Publisher:
Release Date : 1995
Optical Characterization Techniques For High Performance Microelectronic Device Manufacturing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Integrated circuits categories.
Concise Encyclopedia Of Semiconducting Materials Related Technologies
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Author : S. Mahajan
language : en
Publisher: Elsevier
Release Date : 2013-10-22
Concise Encyclopedia Of Semiconducting Materials Related Technologies written by S. Mahajan and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-22 with Technology & Engineering categories.
The development of electronic materials and particularly advances in semiconductor technology have played a central role in the electronics revolution by allowing the production of increasingly cheap and powerful computing equipment and advanced telecommunications devices. This Concise Encyclopedia, which incorporates relevant articles from the acclaimed Encyclopedia of Materials Science and Engineering as well as newly commissioned articles, emphasizes the materials aspects of semiconductors and the technologies important in solid-state electronics. Growth of bulk crystals and epitaxial layers are discussed in the volume and coverage is included of defects and their effects on device behavior. Metallization and passivation issues are also covered. Over 100 alphabetically arranged articles, written by world experts in the field, are each intended to serve as the first source of information on a particular aspect of electronic materials. The volume is extensively illustrated with photographs, diagrams and tables. A bibliography is provided at the end of each article to guide the reader to recent literature. A comprehensive system of cross-references, a three-level subject index and an alphabetical list of articles are included to aid readers in the abstraction of information.
Index Of Conference Proceedings
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Author : British Library. Document Supply Centre
language : en
Publisher:
Release Date : 2000
Index Of Conference Proceedings written by British Library. Document Supply Centre and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Conference proceedings categories.
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon
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Author : Krishna Seshan
language : en
Publisher: CRC Press
Release Date : 2002-02-01
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon written by Krishna Seshan and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-02-01 with Science categories.
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Handbook Of Thin Film Deposition Processes And Techniques
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Author : Krishna Seshan
language : en
Publisher: William Andrew
Release Date : 2001-02-01
Handbook Of Thin Film Deposition Processes And Techniques written by Krishna Seshan and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-02-01 with Technology & Engineering categories.
New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.