Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing
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Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing
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Author :
language : en
Publisher: Elsevier
Release Date : 1998-10-29
Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing written by and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-10-29 with Science categories.
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing
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Author :
language : en
Publisher: Academic Press
Release Date : 1998-11-06
Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing written by and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-11-06 with Technology & Engineering categories.
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Sputtering Materials For Vlsi And Thin Film Devices
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Author : Jaydeep Sarkar
language : en
Publisher: William Andrew
Release Date : 2010-12-13
Sputtering Materials For Vlsi And Thin Film Devices written by Jaydeep Sarkar and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-12-13 with Technology & Engineering categories.
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Handbook Of Physical Vapor Deposition Pvd Processing
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Author : D. M. Mattox
language : en
Publisher: Cambridge University Press
Release Date : 2014-09-19
Handbook Of Physical Vapor Deposition Pvd Processing written by D. M. Mattox and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-09-19 with Technology & Engineering categories.
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing
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Author :
language : en
Publisher: Academic Press
Release Date : 1998-10-23
Pvd For Microelectronics Sputter Desposition To Semiconductor Manufacturing written by and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-10-23 with Technology & Engineering categories.
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Metal Based Thin Films For Electronics
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Author : Klaus Wetzig
language : en
Publisher: John Wiley & Sons
Release Date : 2006-03-06
Metal Based Thin Films For Electronics written by Klaus Wetzig and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-03-06 with Science categories.
This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.
The Foundations Of Vacuum Coating Technology
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Author : Donald M. Mattox
language : en
Publisher: William Andrew
Release Date : 2018-08-21
The Foundations Of Vacuum Coating Technology written by Donald M. Mattox and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-08-21 with Technology & Engineering categories.
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating
Chalcogenide Glasses
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Author : J-L Adam
language : en
Publisher: Woodhead Publishing
Release Date : 2014-02-14
Chalcogenide Glasses written by J-L Adam and has been published by Woodhead Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-02-14 with Technology & Engineering categories.
The unique properties and functionalities of chalcogenide glasses make them promising materials for photonic applications. Chalcogenide glasses are transparent from the visible to the near infrared region and can be moulded into lenses or drawn into fibres. They have useful commercial applications as components for lenses for infrared cameras, and chalcogenide glass fibres and optical components are used in waveguides for use with lasers, for optical switching, chemical and temperature sensing and phase change memories. Chalcogenide glasses comprehensively reviews the latest technological advances in this field and the industrial applications of the technology.Part one outlines the preparation methods and properties of chalcogenide glasses, including the thermal properties, structure, and optical properties, before going on to discuss mean coordination and topological constraints in chalcogenide network glasses, and the photo-induced phenomena in chalcogenide glasses. This section also covers the ionic conductivity and physical aging of chalcogenide glasses, deposition techniques for chalcogenide thin films, and transparent chalcogenide glass-ceramics. Part two explores the applications of chalcogenide glasses. Topics discussed include rare-earth-doped chalcogenide glass for lasers and amplifiers, the applications of chalcogenide glasses for infrared sensing, microstructured optical fibres for infrared applications, and chalcogenide glass waveguide devices for all-optical signal processing. This section also discusses the control of light on the nanoscale with chalcogenide thin films, chalcogenide glass resists for lithography, and chalcogenide for phase change optical and electrical memories. The book concludes with an overview of chalcogenide glasses as electrolytes for batteries.Chalcogenide glasses comprehensively reviews the latest technological advances and applications of chalcogenide glasses, and is an essential text for academics, materials scientists and electrical engineers working in the photonics and optoelectronics industry. Outlines preparation methods and properties, and explores applications of chalcogenide glasses. Covers the ionic conductivity and physical aging of chalcogenide glasses, deposition techniques for chalcogenide thin films, and transparent chalcogenide glass-ceramics Discusses the control of light on the nanoscale with chalcogenide thin films, chalcogenide glass resists for lithography, and chalcogenide for phase change optical and electrical memories
Ionized Physical Vapor Deposition
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Author :
language : en
Publisher: Academic Press
Release Date : 1999-10-14
Ionized Physical Vapor Deposition written by and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-14 with Science categories.
This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes
Springer Handbook Of Electronic And Photonic Materials
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Author : Safa Kasap
language : en
Publisher: Springer
Release Date : 2017-10-04
Springer Handbook Of Electronic And Photonic Materials written by Safa Kasap and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-10-04 with Technology & Engineering categories.
The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.