Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing
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Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing
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Author : Tadahiro Ohmi
language : en
Publisher: CRC Press
Release Date : 2005-12-21
Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing written by Tadahiro Ohmi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-12-21 with Science categories.
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing
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Author : Tadahiro Ohmi
language : en
Publisher: CRC Press
Release Date : 2018-10-03
Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing written by Tadahiro Ohmi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-10-03 with Science categories.
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
15th International Symposium On Semiconductor Cleaning Science And Technology Scst 15
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Author : T. Hattori
language : en
Publisher: The Electrochemical Society
Release Date :
15th International Symposium On Semiconductor Cleaning Science And Technology Scst 15 written by T. Hattori and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.
Istc Cstic 2009 Cistc
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Author : David Huang
language : en
Publisher: The Electrochemical Society
Release Date : 2009-03
Istc Cstic 2009 Cistc written by David Huang and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-03 with Science categories.
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Proceedings Of The 5th Joint Asme Jsme Fluids Engineering Division Summer Conference 2007 Parts A And B Symposia
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Author : American Society of Mechanical Engineers. Fluids Engineering Division
language : en
Publisher:
Release Date : 2007
Proceedings Of The 5th Joint Asme Jsme Fluids Engineering Division Summer Conference 2007 Parts A And B Symposia written by American Society of Mechanical Engineers. Fluids Engineering Division and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Fluid dynamics categories.
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Author : Julian Serda
language : zh-CN
Publisher:
Release Date : 2001
written by Julian Serda and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Electronic industries categories.
国外电子与通信教材系列
Ultraclean Surface Processing Of Silicon Wafers
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Author : Takeshi Hattori
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Ultraclean Surface Processing Of Silicon Wafers written by Takeshi Hattori and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Technology & Engineering categories.
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Mems Materials And Processes Handbook
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Author : Reza Ghodssi
language : en
Publisher: Springer Science & Business Media
Release Date : 2011-03-18
Mems Materials And Processes Handbook written by Reza Ghodssi and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-03-18 with Technology & Engineering categories.
MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.
Airline Transport Pilot Aircraft Dispatcher And Flight Navigator
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Author :
language : en
Publisher:
Release Date : 1989
Airline Transport Pilot Aircraft Dispatcher And Flight Navigator written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with Aeronautics categories.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.