Silicides Fundamentals And Applications
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Silicides Fundamentals And Applications
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Author : Leo Miglio
language : en
Publisher: World Scientific
Release Date : 2000-12-18
Silicides Fundamentals And Applications written by Leo Miglio and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-12-18 with Science categories.
Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications. The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics. Contents:Crystal Chemistry of Metal Silicides (R Madar)Bonding and Polymorphism in Transition Metal Disilicides (L Miglio et al.)Diffusion in Silicides: Basic Approach and Practical Applications (P Gas & F M d'Heurle)Silicides and Thermodynamics (C Bernard & A Pisch)Optical Properties of Silicides: Theory and Experiment (V Antonov & F Marabelli)Fundamental Electronic Properties of Semiconducting Silicides (V Borisenko)Semiconducting Silicides — Thermoelectric Properties and Applications (A Heinrich)Metallic Silicides (G Ottaviani)The Kinetics of Reactive Phase Formation: Silicides (F M d'Heurle)Reactive Phase Formation in Binary and Ternary Silicide Systems (A A Kodentsov et al.)Epitaxial Silicides (H von Känel)Ion Beam Synthesis, Molecular Beam Allotaxy and Self-Assembled Patterning of Epitaxial Silicides (S Mantl)Silicides: Materials Science and Applications for Microelectronics (K Maex & A Lauwers)The Changing Views on the Schottky Barrier (R Tung)Metal Rich Structural Silicides (A J Thom et al.)and several other papers on more topical subjects Readership: Researchers in applied physics, condensed matter physics, and electrical & electronic engineering. Keywords:Silicides;Solid State Physics;Silicon;Metallurgy;Materials Science;Microelectronics
Silicides
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Author : L. Miglio
language : en
Publisher: World Scientific Publishing Company Incorporated
Release Date : 2000
Silicides written by L. Miglio and has been published by World Scientific Publishing Company Incorporated this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Science categories.
The 16th Course of the International School of Solid State Physics was intended to break artificial barriers between disciplines, and to gather people dealing with the properties and applications of silicides, regardless of their fields or practical goals. The Course assembled investigators concerned with theory as well as applications, and involved not only in electronics but also in the use of silicides for thermoelectric devices, and in structural applications, for example in jet engines.
Semiconducting Silicides
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Author : Victor E. Borisenko
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-07
Semiconducting Silicides written by Victor E. Borisenko and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-07 with Technology & Engineering categories.
A comprehensive presentation and analysis of properties and methods of formation of semiconducting silicides. Fundamental electronic, optical and transport properties of the silicides collected from recent publications will help readers choose their application in new generations of solid-state devices. A comprehensive presentation of thermodynamic and kinetic data is given in combination with their technical application, as is information on corresponding thin-film or bulk crystal formation techniques.
Multicomponent Silicides For Thermoelectric Materials
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Author : Jean-Claude Tedenac
language : en
Publisher: Springer
Release Date : 2017-06-02
Multicomponent Silicides For Thermoelectric Materials written by Jean-Claude Tedenac and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-06-02 with Technology & Engineering categories.
This book provides a comprehensive review of the current state of the art in silicon compounds for thermoelectric applications. Silicides are materials with good initial thermoelectric properties, which can be enhanced through tuning of their micro- and macrostructure. These compounds present various conduction mechanisms and complex band structures. Moreover, some are isotropic, and others anisotropic, which is highly beneficial for device tailoring. Silicides are a particularly attractive material for sensors, thermoelectric generators, and other applications because they are environmentally friendly, abundant, and low cost. This concise volume covers fundamentals and applications for an audience of materials scientists, chemists, solid-state physicists, and engineers.
Silicides For Vlsi Applications
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Author : Shyam P. Murarka
language : en
Publisher: Academic Press
Release Date : 2012-12-02
Silicides For Vlsi Applications written by Shyam P. Murarka and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.
Silicide Technology For Integrated Circuits
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Author : Institution of Electrical Engineers
language : en
Publisher: IET
Release Date : 2004-12-21
Silicide Technology For Integrated Circuits written by Institution of Electrical Engineers and has been published by IET this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-12-21 with Social Science categories.
This is the first book to provide guidance on the development and application of metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages. Other key topics covered are fundamentals, present and future silicide technology for Si-based devices, and characterisation methods. Suitable for engineers and students in microelectronics.
Silicide Thin Films Volume 402
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Author : Raymond T. Tung
language : en
Publisher:
Release Date : 1996
Silicide Thin Films Volume 402 written by Raymond T. Tung and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Technology & Engineering categories.
Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.
Electronics Fundamentals And Applications
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Author : D. Chattopadhyay
language : en
Publisher: New Age International
Release Date : 2006
Electronics Fundamentals And Applications written by D. Chattopadhyay and has been published by New Age International this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Electronic engineering categories.
The Book Is Meant For The Students Pursuing A Beginners' Course In Electronics. Current Syllabi Of Basic Electronics Included In Physics (Honours) Curriculum Of Different Universities And Those Offered In Various Engineering And Technical Institutions Have Been Consulted In Preparing The Material Contained Herein.In 22 Chapters, The Book Deals With Formation Of Energy Bands In Solids; Electron Emission From Solid Surfaces; Vacuum Tubes; Properties Of Semiconductors; Pn Junction Diodes; Rectifiers; Voltage Multipliers; Clipping And Clamping Circuits; Bipolar Junction Transistors; Basic Voltage And Poweramplifiers; Feedback In Amplifiers; Regulated Power Supply; Sinusoidal Oscillators; Multivibrators; Modulation And Demodulation; Jfet And Mosfet; Ics; Op Amps; Special Semiconductor Devices, Such As Phototransistor, Scr, Triac, Diac, Ujt, Impatt Diode, Gunn Diode, Pin Diode, Igbt; Digital Circuits; Cathode Ray Oscilloscope; Radio Communication; Television; Radar And Laser.Fundamental Principles And Applications Are Discussed Herein With Explanatory Diagrams In A Clear Concise Way.Physical Aspects Are Emphasized; Mathematical Details Are Given, When Necessary. Many Of The Problems And Review Questions Included In The Book Are Taken From Recent Examination Papers. Some Objective-Type Questions Typically Set In Different Competitive Examinations Are Also Given At The End Of Each Chapter.Salient Features: * Small Geometry Effects And Effects Of Interconnects Included In Chapter 18. * A Quick Discussion On Fibre Optic Communication System In Chapter 22. * Revised And Updated To Cope With The Current Syllabii Of Some More Universities And Technical Institutions. * Chapters 6, 8, 16, 18, And 22 Have Been Changed With The Addition Of New Material. * Some More University Questions And Problems Have Been Included.
Advanced Nanoscale Ulsi Interconnects Fundamentals And Applications
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Author : Yosi Shacham-Diamand
language : en
Publisher: Springer Science & Business Media
Release Date : 2009-09-19
Advanced Nanoscale Ulsi Interconnects Fundamentals And Applications written by Yosi Shacham-Diamand and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-09-19 with Science categories.
In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home appliances to a- planes and space shuttles. Electronics systems form the hardware that together with software are the bases of the modern information society. The rapid growth and vast exploitation of modern electronics system create a strong demand for new and improved electronic circuits as demonstrated by the amazing progress in the ?eld of ULSI technology. This progress is well described by the famous “Moore’s law” which states, in its most general form, that all the metrics that describe integrated circuit performance (e. g. , speed, number of devices, chip area) improve expon- tially as a function of time. For example, the number of components per chip d- bles every 18 months and the critical dimension on a chip has shrunk by 50% every 2 years on average in the last 30 years. This rapid growth in integrated circuits te- nology results in highly complex integrated circuits with an increasing number of interconnects on chips and between the chip and its package. The complexity of the interconnect network on chips involves an increasing number of metal lines per interconnect level, more interconnect levels, and at the same time a reduction in the interconnect line critical dimensions.
Silicides For Vlsi Applications
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Author : S. P. Murarka
language : en
Publisher:
Release Date : 1983
Silicides For Vlsi Applications written by S. P. Murarka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1983 with Electronics categories.