Soviet Radio Frequency Discharge Research
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Soviet Radio Frequency Discharge Research
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Author : Valery A. Godyak
language : en
Publisher:
Release Date : 1986
Soviet Radio Frequency Discharge Research written by Valery A. Godyak and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1986 with Electric discharges through gases categories.
Physics Of Radiofrequency Capacitive Discharge
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Author : V. P. Savinov
language : en
Publisher: CRC Press
Release Date : 2018-05-23
Physics Of Radiofrequency Capacitive Discharge written by V. P. Savinov and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-05-23 with Science categories.
This book describes the physical mechanism of high-frequency (radio-frequency) capacitive discharge (RFCD) of low and medium pressure and the properties of discharge plasma in detail. The main properties and characteristics of RFCD, the features of electric breakdown in a high-frequency field are also investigated. The properties of near-electrode layers of a spatial discharge, the nature of the electric field in them, and the processes of charge transport to electrodes are explored. The work is intended for scientists engaged in gas discharge physics and low-temperature plasmas, graduate students and students of physics, physical chemistry, and relevant specialties.
Physics Of Radio Frequency Plasmas
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Author : Pascal Chabert
language : en
Publisher: Cambridge University Press
Release Date : 2011-02-24
Physics Of Radio Frequency Plasmas written by Pascal Chabert and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-02-24 with Science categories.
Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.
Radio Frequency Capacitive Discharges
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Author : Yuri P. Raizer
language : en
Publisher: CRC Press
Release Date : 2017-12-14
Radio Frequency Capacitive Discharges written by Yuri P. Raizer and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-14 with Science categories.
The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.
Encyclopedia Of Plasma Technology Two Volume Set
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Author : J. Leon Shohet
language : en
Publisher: CRC Press
Release Date : 2016-12-12
Encyclopedia Of Plasma Technology Two Volume Set written by J. Leon Shohet and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-12-12 with Technology & Engineering categories.
Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Electron Kinetics And Applications Of Glow Discharges
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Author : Uwe Kortshagen
language : en
Publisher: Springer
Release Date : 2006-04-11
Electron Kinetics And Applications Of Glow Discharges written by Uwe Kortshagen and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-04-11 with Science categories.
This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.
A Plasma Chemistry Study On Global Model For Argon Gas As A Propellant To Electrostatic Gridded Ion Thruster
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Author : Bernardo Vieira Magaldi
language : en
Publisher: Editora Dialética
Release Date : 2024-07-31
A Plasma Chemistry Study On Global Model For Argon Gas As A Propellant To Electrostatic Gridded Ion Thruster written by Bernardo Vieira Magaldi and has been published by Editora Dialética this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-07-31 with Business & Economics categories.
Electric propulsion optimizes propellant mass and meets new propulsion device demands. These devices adjust satellite orbits and enable long missions. Among various thrusters, electrostatic ones have well-defined physics, simplifying operational parameter optimization. This study developed a global model for an Inductively Coupled Plasma (ICP) cylindrical ion thruster with an output polarized grid system. Argon propellant is injected into the chamber, and ICP plasma is generated by a radiofrequency current. Neutral and excited species are accelerated out by diffusion, while ionized species are accelerated via the polarized grids' electric field. The polarized grid system was optimized for better plasma sheath use. The model considers single and multi-step ionization, the Electron Energy Distribution Function (EEDF), neutral gas, and electron power balance equations. Excited species influence ionization energy, but not ionic density. However, the ion substitution rate increases, essential for thrust and specific impulse. The model determines the neutral gas temperature by considering the power balance and interactions with other species.
Low Pressure Plasmas And Microstructuring Technology
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Author : Gerhard Franz
language : en
Publisher: Springer Science & Business Media
Release Date : 2009-04-09
Low Pressure Plasmas And Microstructuring Technology written by Gerhard Franz and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-04-09 with Technology & Engineering categories.
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Plasma Chemistry
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Author : Alexander Fridman
language : en
Publisher: Cambridge University Press
Release Date : 2008-05-05
Plasma Chemistry written by Alexander Fridman and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-05-05 with Technology & Engineering categories.
Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.
Principles Of Vapor Deposition Of Thin Films
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Author : Professor K.S. K.S Sree Harsha
language : en
Publisher: Elsevier
Release Date : 2005-12-16
Principles Of Vapor Deposition Of Thin Films written by Professor K.S. K.S Sree Harsha and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-12-16 with Technology & Engineering categories.
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.