Acoustic Thermal Wave And Optical Characterization Of Materials
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Acoustic Thermal Wave And Optical Characterization Of Materials
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Author : G.M. Crean
language : en
Publisher: Elsevier
Release Date : 2014-08-04
Acoustic Thermal Wave And Optical Characterization Of Materials written by G.M. Crean and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-08-04 with Technology & Engineering categories.
This volume focuses on a variety of novel non-destructive techniques for the characterization of materials, processes and devices. Emphasis is placed on probe-specimen interactions, in-situ diagnosis, instrumentation developments and future trends. This was the first time a symposium on this topic had been held, making the response particularly gratifying. The high quality of the contributions are a clear indication that non-destructive materials characterization is becoming a dynamic research area in Europe at the present time.A selection of contents: The role of acoustic properties in designs of acoustic and optical fibers (C.K. Jen). Observation of stable crack growth in Al2O3 ceramics using a scanning acoustic microscope (A. Quinten, W. Arnold). Mechanical characterization by acoustic techniques of SIC chemical vapour deposited thin films (J.M. Saurel et al.). Efficient generation of acoustic pressure waves by short laser pulses (S. Fassbender et al.). Use of scanning electron acoustic microscopy for the analysis of III-V compound devices (J.F. Bresse). Waves and vibrations in periodic piezoelectric composite materials (B.A. Auld). Precision ultrasonic velocity measurements for the study of the low temperature acoustic properties in defective materials (A. Vanelstraete, C. Laermans). Thermally induced concentration wave imaging (P. Korpiun et al.). Interferometric measurement of thermal expansion (V. Kurzmann et al.). Quantitative analyses of power loss mechanisms in semiconductor devices by thermal wave calorimetry (B. Büchner et al.). Thermal wave probing of the optical electronic and thermal properties of semiconductors (D. Fournier, A. Boccara). Thermal wave measurements in ion-implanted silicon (G. Queirola et al.). Optical-thermal non-destructive examination of surface coatings (R.E. Imhof et al.). Bonding analysis of layered materials by photothermal radiometry (M. Heuret et al.). Thermal non-linearities of semiconductor-doped glasses in the near-IR region (M. Bertolotti et al.). Theory of picosecond transient reflectance measurement of thermal and eisatic properties of thin metal films (Z. Bozóki et al.). The theory and application of contactless microwave lifetime measurement (T. Otaredian et al.). Ballistic phonon signal for imaging crystal properties (R.P. Huebener et al.). Determination of the elastic constants of a polymeric Langmuir-Blodgett film by Briliouin spectroscopy (F. Nizzoli et al.). Quantum interference effects in the optical second-harmonic response tensor of a metal surface (O. Keller). Study of bulk and surface phonons and plasmons in GaAs/A1As superlattices by far-IR and Raman spectroscopy (T. Dumslow et al.). Far-IR spectroscopy of bulk and surface phonon-polaritons on epitaxial layers of CdTe deposited by plasma MOCVD on GaAs substrates (T. Dumelow et al.). In-situ characterization by reflectance difference spectroscopy of III-V materials and heterojunctions grown by low pressure metal organic chemical vapour deposition (O. Acher et al.). Optical evidence of precipitates in arsenic-implanted silicon (A. Borghesi et al.). Polarized IR reflectivity of CdGeAs2 (L. Artús et al.). Raman and IR spectroscopies: a useful combination to study semiconductor interfaces (D.R.T. Zahn et al.). Silicon implantation of GaAs at low and medium doses: Raman assessment of the dopant activation (S. Zakang et al.). Ellipsometric characterization of thin films and superlattices (J. Bremer et al.). Ellipsometric characterization of multilayer transistor structures (J.A. Woollam et al.). Quality of molecular-beam-epitaxy-grown GaAs on Si(100) studied by ellipsometry (U. Rossow et al.). An ellipsometric and RBS study of TiSi2 formation (J.M.M. de Nijs, A. van Silfhout). A new microscope for semiconductor luminescence studies (P.S. Aplin, J.C. Day). Structural analysis of optical fibre preforms fabricated by the sol-gel process (A.M. Elas et al.). Author index.
Acoustic Thermal Wave And Optical Characterization Of Materials
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Author : G. M. Crean
language : en
Publisher:
Release Date : 1989
Acoustic Thermal Wave And Optical Characterization Of Materials written by G. M. Crean and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with categories.
Nondestructive Characterization Of Materials X
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Author : R.E. Green
language : en
Publisher: Elsevier
Release Date : 2001-03-20
Nondestructive Characterization Of Materials X written by R.E. Green and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-03-20 with Technology & Engineering categories.
The papers published in these peer-reviewed proceedings represent the latest developments in nondestructive characterization of materials and were presented at the Tenth International Symposium on Nondestructive Characterization of Materials held on June 26 - 30, 2000 in Karuizawa, Japan. The symposium was held concurrently with three other symposia and one workshop. This symposium is the tenth in the series that began in 1983 and became an international meeting in 1986. The symposium started with a Plenary Lecture entitled 'Application of Non-contact Ultrasonics to Nondestrctive Characterization of Materials' by Professor R.E. Green, Jr. Various characterization methods were presented at the symposium, including ultrasonics, X-ray, eddy currents, laser, thermal wave, acoustic emission, optical fibers, optics, magnetics and ultrasonic microscope. Thin films and coatings as well as smart materials were also emphasized in this symposium.
Synthetic Materials For Non Linear Optics And Electronics
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Author : C. Taliani
language : en
Publisher: Elsevier
Release Date : 1993-04-21
Synthetic Materials For Non Linear Optics And Electronics written by C. Taliani and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993-04-21 with Science categories.
Recent progress in organic and LED structures, in photorefractive response in molecular ferromagnetism, as well as the ultrafast and large non-linear optical response in conjugated systems are attracting great interest from the scientific community. The discovery of fullerenes has added further impetus to this field. Two areas bear particular promise for the development of a new electronics based on SEM materials: the integration of organic materials into the planar silicon technology such as, for instance, the advances in "all organic" field-effect transistors (FET) and the new organic light emitting diodes (LED); and secondly the appearance of a totally new electronics in which photons, rather than electrons, carry the information and SEM materials act as switching devices. Both aspects and more are covered in this volume. The quality of the 52 contributions attests to the fact that this subject area has progressed from the level of a scientific curiosity to a mature field of materials science introducing important technological perspectives for electronic applications.
Nondestructive Characterization Of Materials Vi
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Author : Robert E. Green
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Nondestructive Characterization Of Materials Vi written by Robert E. Green and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Traditionally the vast majority of materials characterization techniques have been destructive, e. g. , chemical compositional analysis, metallographic determination of microstructure, tensile test measurement of mechanical properties, etc. Also, traditionally, nondestructive techniques have been used almost exclusively for the detection of macroscopic defects, mostly cracks, in structures and devices which have already been constructed and have already been in service for an extended period of time. Following these conventional nondestructive tests, it has been common practice to use somewhat arbitrary accept-reject criteria to decide whether or not the structure or device should be removed from service. The present unfavorable status of a large segment of industry, coupled with the desire to keep structures in service well past their original design life, dramatically show that our traditional approaches must be drastically modified if we are to be able to meet future needs. The role of nondestructive characterization of materials is changing and will continue to change dramatically. It has become increasingly evident that it is both practical and cost effective to expand the role of nondestructive evaluation to include all aspects of materials' production and application and to introduce it much earlier in the manufacturing cycle. In fact, the recovery of a large portion of industry from severe economic problems is dependent, in part, on the successful implementation of this expanded role.
Analytical Techniques For The Characterization Of Compound Semiconductors
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Author : G. Bastard
language : en
Publisher: Elsevier
Release Date : 1991-07-26
Analytical Techniques For The Characterization Of Compound Semiconductors written by G. Bastard and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991-07-26 with Science categories.
This volume is a collection of 96 papers presented at the above Conference. The scope of the work includes optical and electrical methods as well as techniques for structural and compositional characterization. The contributed papers report on topics such as X-ray diffraction, TEM, depth profiling, photoluminescence, Raman scattering and various electrical methods. Of particular interest are combinations of different techniques providing complementary information. The compound semiconductors reviewed belong mainly to the III-V and III-VI families. The papers in this volume will provide a useful reference on the implications of new technologies in the characterization of compound semiconductors.
C H N And O In Si And Characterization And Simulation Of Materials And Processes
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Author : A. Borghesi
language : en
Publisher: Newnes
Release Date : 2012-12-02
C H N And O In Si And Characterization And Simulation Of Materials And Processes written by A. Borghesi and has been published by Newnes this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Semiconductor Materials Analysis And Fabrication Process Control
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Author : G.M. Crean
language : en
Publisher: Elsevier
Release Date : 2012-12-02
Semiconductor Materials Analysis And Fabrication Process Control written by G.M. Crean and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Science categories.
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
Photorefractive Materials
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Author : G. Roosen
language : en
Publisher: Elsevier
Release Date : 2013-10-22
Photorefractive Materials written by G. Roosen and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-22 with Science categories.
The papers presented here reflect the core of the scientific activities that took place at the 1994 E-MRS conference. The contributions indicate that the field of photorefractive materials is advancing vigorously, moving into new classes of compounds, finding ways for the judicious tailoring of the microscopic properties of the materials - based on increased insight into the features of defects or quantum wells - and leading to new applications, often made possible by the advances at the forefront of the materials. The many papers presented by European participants emphasised the large amount of work being carried out here. Stimulating contributions also came from the United States and Japan, while papers presented by members from the industrial world indicate the importance of the field in this sector.
Laser Surface Processing And Characterization
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Author : I.W. Boyd
language : en
Publisher: Elsevier
Release Date : 1992-03-09
Laser Surface Processing And Characterization written by I.W. Boyd and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992-03-09 with Technology & Engineering categories.
The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.