Advanced Interconnects And Contacts Volume 564
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Advanced Interconnects And Contacts Volume 564
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Author : Daniel C. Edelstein
language : en
Publisher:
Release Date : 1999-10-07
Advanced Interconnects And Contacts Volume 564 written by Daniel C. Edelstein and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-07 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Interconnects And Contact Materials And Processes For Future Integrated Circuits Volume 514
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Author : S. P. Murarka
language : en
Publisher:
Release Date : 1998-11-02
Advanced Interconnects And Contact Materials And Processes For Future Integrated Circuits Volume 514 written by S. P. Murarka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-11-02 with Technology & Engineering categories.
Comprising the proceedings of an MRS symposium held in April of 1998, contributions in this volume are divided into ten sections: interconnection frontiers; aluminum interconnects; cobalt and other silicides; titanium silicide; MOSFET, source, drain, and interconnect engineering; copper interconnects and barriers; a poster session on advanced interconnects and contacts; contacts to compound semiconductor devices; novel interconnect materials and schemes; and diffusion barriers. Annotation copyrighted by Book News, Inc., Portland, OR
Morphological Evolution Of Electrodeposits And Electrochemical Processing In Ulsi Fabrication And Electrodeposition Of And On Semiconductors Iv
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Author : Kazuo Kondo
language : en
Publisher: The Electrochemical Society
Release Date : 2005
Morphological Evolution Of Electrodeposits And Electrochemical Processing In Ulsi Fabrication And Electrodeposition Of And On Semiconductors Iv written by Kazuo Kondo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Copper plating categories.
Papers in this volume are from the 199th ECS Meeting, held in Washington, DC, Spring 2001. Morphology evolution encompasses electrochemical processing in ULSI fabrication, shape evolution, growth habit, and microstructure of electrodeposits. The most prominent example at present is the electrochemical deposition of copper for ULSI interconnects. Many other electrochemical processes at various stages of emergence and development hold promise for the electronics industry and beyond.
Advanced Hard And Soft Magnetic Materials Volume 577
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Author :
language : en
Publisher:
Release Date : 1999-11-03
Advanced Hard And Soft Magnetic Materials Volume 577 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-11-03 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Multicomponent Oxide Films For Electronics Volume 574
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Author : Marilyn Hawley
language : en
Publisher:
Release Date : 1999-10-06
Multicomponent Oxide Films For Electronics Volume 574 written by Marilyn Hawley and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-06 with Science categories.
The exceptional properties of multicomponent oxides, combined with the inability of simpler materials to meet the increasing demands of the electronics industry, have motivated tremendous interest and activity in utilizing multicomponent oxides for electronic applications. For these applications, it is often desirable to integrate complex oxides in thin-film form with other materials. This book focuses on common materials issues involved in the processing and characterization of multicomponent oxides and how these issues relate to device applications. Papers range from theoretical explanations of the magnetic and electronic properties of transition metal oxides, to integration with silicon technology. Noteworthy is the progress being made in the deposition and characterization of these complex materials, as well as their applicability in ferroelectric memories, MOSFETs, optical devices, infrared imaging arrays, etc. Topics include: epitaxial multicomponent oxide film growth; properties, characterization and modeling; properties of multicomponent oxides; and multicomponent oxide devices.
Advances In Materials Problem Solving With The Electron Microscope Volume 589
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Author : Jim Bentley
language : en
Publisher:
Release Date : 2001
Advances In Materials Problem Solving With The Electron Microscope Volume 589 written by Jim Bentley and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Organic Inorganic Hybrid Materials Ii Volume 576
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Author : Lisa C. Klein
language : en
Publisher:
Release Date : 1999-11-10
Organic Inorganic Hybrid Materials Ii Volume 576 written by Lisa C. Klein and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-11-10 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
In Situ Process Diagnostics And Modeling Volume 569
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Author : Orlando Auciello
language : en
Publisher:
Release Date : 1999-08-11
In Situ Process Diagnostics And Modeling Volume 569 written by Orlando Auciello and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-08-11 with Technology & Engineering categories.
Papers from an April 1999 symposium demonstrate the need for the development and application of a variety of complementary in situ, real-time characterization techniques to advance the science and technology of thin films and interfaces critical to the development of a new generation of thin-film-based devices. Papers are arranged in sections on in situ ion and electron-beam analysis, in situ spectroscopic ellipsometry and other optical characterization, in situ diagnostics and modeling, in situ emission and optical characterization techniques, and in situ X-ray, TEM, and STM/AFM characterization and processing control. Auciello is affiliated with Argonne National Laboratory. Annotation copyrighted by Book News, Inc., Portland, OR
Interfacial Engineering For Optimized Properties Ii Volume 586
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Author : C. Barry Carter
language : en
Publisher:
Release Date : 2000-10-02
Interfacial Engineering For Optimized Properties Ii Volume 586 written by C. Barry Carter and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-10-02 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2000, concentrates on the preparation and processing of interfaces, the relationships between chemistry and structure and the properties and behavior of interfaces, particularly in relation to strength and bonding.
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures Volume 592
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Author : D. A. Buchanan
language : en
Publisher:
Release Date : 2000-10-17
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures Volume 592 written by D. A. Buchanan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-10-17 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.