Advanced Metallization And Interconnect Systems For Ulsi Applications In 1995
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Advanced Metallization And Interconnect Systems For Ulsi Applications In 1995
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Author : Russell C. Ellwanger
language : en
Publisher: Materials Research Society
Release Date : 2000-02-01
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1995 written by Russell C. Ellwanger and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-02-01 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1997
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Author : Robin Cheung
language : en
Publisher: Materials Research Society
Release Date : 2000-02-01
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1997 written by Robin Cheung and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-02-01 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Proceedings Of The Symposium On Interconnect And Contact Metallization
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Author : Harzara S. Rathore
language : en
Publisher: The Electrochemical Society
Release Date : 1998
Proceedings Of The Symposium On Interconnect And Contact Metallization written by Harzara S. Rathore and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Computers categories.
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12
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Author : Robert Havemann
language : en
Publisher: Mrs Conference Proceedings
Release Date : 1997
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12 written by Robert Havemann and has been published by Mrs Conference Proceedings this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Computers categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization Conference 1999 Amc 1999 Volume 15
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Author : Mihal E. Gross
language : en
Publisher: Mrs Conference Proceedings
Release Date : 2000
Advanced Metallization Conference 1999 Amc 1999 Volume 15 written by Mihal E. Gross and has been published by Mrs Conference Proceedings this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Semiconductor Technology Istc 2001
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Author : Ming Yang
language : en
Publisher:
Release Date : 2001
Semiconductor Technology Istc 2001 written by Ming Yang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Semiconductors categories.
Advanced Metallization Conference In
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Author :
language : en
Publisher:
Release Date : 2007
Advanced Metallization Conference In written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Integrated circuits categories.
Chemical Mechanical Polishing In Silicon Processing
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Author :
language : en
Publisher: Academic Press
Release Date : 1999-10-29
Chemical Mechanical Polishing In Silicon Processing written by and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-29 with Technology & Engineering categories.
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Low Dielectric Constant Materials For Ic Applications
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Author : Paul S. Ho
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Low Dielectric Constant Materials For Ic Applications written by Paul S. Ho and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.