Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12
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Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12
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Author : Robert Havemann
language : en
Publisher: Mrs Conference Proceedings
Release Date : 1997
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12 written by Robert Havemann and has been published by Mrs Conference Proceedings this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Computers categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1995
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Author : Russell C. Ellwanger
language : en
Publisher: Materials Research Society
Release Date : 2000-02-01
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1995 written by Russell C. Ellwanger and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-02-01 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Interconnects And Contacts Volume 564
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Author : Daniel C. Edelstein
language : en
Publisher:
Release Date : 1999-10-07
Advanced Interconnects And Contacts Volume 564 written by Daniel C. Edelstein and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-07 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical Mechanical Polishing In Silicon Processing
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Author :
language : en
Publisher: Academic Press
Release Date : 1999-10-29
Chemical Mechanical Polishing In Silicon Processing written by and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-10-29 with Technology & Engineering categories.
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Probing Crystal Plasticity At The Nanoscales
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Author : Arief Suriadi Budiman
language : en
Publisher: Springer
Release Date : 2014-12-27
Probing Crystal Plasticity At The Nanoscales written by Arief Suriadi Budiman and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-12-27 with Technology & Engineering categories.
This Brief highlights the search for strain gradients and geometrically necessary dislocations as a possible source of strength for two cases of deformation of materials at small scales: nanoindented single crystal copper and uniaxially compressed single crystal submicron gold pillars. When crystalline materials are mechanically deformed in small volumes, higher stresses are needed for plastic flow. This has been called the "Smaller is Stronger" phenomenon and has been widely observed. studies suggest that plasticity in one case is indeed controlled by the GNDs (strain gradient hardening), whereas in the other, plasticity is not controlled by strain gradients or sub-structure hardening, but rather by dislocation source starvation, wherein smaller volumes are stronger because fewer sources of dislocations are available (dislocation starvation hardening).
Chemical Mechanical Planarization Of Semiconductor Materials
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Author : M.R. Oliver
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-14
Chemical Mechanical Planarization Of Semiconductor Materials written by M.R. Oliver and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-14 with Technology & Engineering categories.
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
Low Dielectric Constant Materials For Ic Applications
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Author : Paul S. Ho
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Low Dielectric Constant Materials For Ic Applications written by Paul S. Ho and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for
Multilevel Interconnect Technology
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Author :
language : en
Publisher:
Release Date : 1998
Multilevel Interconnect Technology written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Dielectric films categories.
Proceedings Of The Second International Symposium On Low And High Dielectric Constant Materials
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Author : Hazara S. Rathore
language : en
Publisher: The Electrochemical Society
Release Date : 1997
Proceedings Of The Second International Symposium On Low And High Dielectric Constant Materials written by Hazara S. Rathore and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Science categories.