Low Dielectric Constant Materials For Ic Applications
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Low Dielectric Constant Materials For Ic Applications
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Author : Paul S. Ho
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Low Dielectric Constant Materials For Ic Applications written by Paul S. Ho and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for
Handbook Of Low And High Dielectric Constant Materials And Their Applications Two Volume Set
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Author : Hari Singh Nalwa
language : en
Publisher: Elsevier
Release Date : 1999-09-07
Handbook Of Low And High Dielectric Constant Materials And Their Applications Two Volume Set written by Hari Singh Nalwa and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-09-07 with Science categories.
Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, etc., are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source. Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.
Low High Dielectric Constant Mtrls V1
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Author : Hari Singh Nalwa
language : en
Publisher: Academic Press
Release Date : 1999-08-03
Low High Dielectric Constant Mtrls V1 written by Hari Singh Nalwa and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-08-03 with Science categories.
Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, et cetera, are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source. Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.
Chemical Mechanical Polishing Of Low Dielectric Constant Polymers And Organosilicate Glasses
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Author : Christopher Lyle Borst
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-27
Chemical Mechanical Polishing Of Low Dielectric Constant Polymers And Organosilicate Glasses written by Christopher Lyle Borst and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-27 with Technology & Engineering categories.
As semiconductor manufacturers implement copper conductors in advanced interconnect schemes, research and development efforts shift toward the selection of an insulator that can take maximum advantage of the lower power and faster signal propagation allowed by copper interconnects. One of the main challenges to integrating a low-dielectric constant (low-kappa) insulator as a replacement for silicon dioxide is the behavior of such materials during the chemical-mechanical planarization (CMP) process used in Damascene patterning. Low-kappa dielectrics tend to be softer and less chemically reactive than silicon dioxide, providing significant challenges to successful removal and planarization of such materials. The focus of this book is to merge the complex CMP models and mechanisms that have evolved in the past decade with recent experimental results with copper and low-kappa CMP to develop a comprehensive mechanism for low- and high-removal-rate processes. The result is a more in-depth look into the fundamental reaction kinetics that alter, selectively consume, and ultimately planarize a multi-material structure during Damascene patterning.
Low Dielectric Constant Materials
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Author :
language : en
Publisher:
Release Date : 1999
Low Dielectric Constant Materials written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Electric insulators and insulation categories.
Low Dielectric Constant Materials And Processes For Interlayer Dielectric Applications
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Author : Ramakrishna Vedula
language : en
Publisher:
Release Date : 2006
Low Dielectric Constant Materials And Processes For Interlayer Dielectric Applications written by Ramakrishna Vedula and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Dielectric films categories.
Low And High Dielectric Constant Materials
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Author : Mark J. Lododa
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Low And High Dielectric Constant Materials written by Mark J. Lododa and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
Contains papers from a May 2000 symposium, representing the state of the art in areas of dielectric materials science and process integration. Papers are arranged in sections on low and high dielectric constant materials, covering topics such as ammonia plasma passivation effects on properties of post-CMP low-k HSQ, characterization of ashing effects on low-k dielectric films, and electron beam curing of thin film polymer dielectrics. Other subjects include characterization of high-k dielectrics using the non-contact surface charge profiler method, and processing effects and electrical evaluation of ZrO2 formed by RTP oxidation of Zr. Loboda is affiliated with Dow Corning Corporation. c. Book News Inc.
Low Dielectric Constant Materials Ii Volume 443
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Author : André Lagendijk
language : en
Publisher:
Release Date : 1997-08-19
Low Dielectric Constant Materials Ii Volume 443 written by André Lagendijk and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997-08-19 with Technology & Engineering categories.
Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is testimony to the global significance of the topic to the future of semiconductor manufacturing. Presentations include those by semiconductor equipment manufacturers and chemical source suppliers, academia from six countries, four government laboratories and five major device manufacturers. Approaches to designing and implementing reduction in dielectric constant for intermetal dielectric materials are featured and range from the evolution of silicon dioxide to fluorinated silicate glass, to the use of inorganic/organic polymers and spin-on-material, to fluorinated diamond-like carbon and nanoporous silica. The book also addresses the practical aspects of the use of low-dielectric constant materials such as chemical mechanical polishing of these materials and optimization of wiring delays in devices utilizing low-k material.
High Dielectric Constant Materials
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Author : Howard Huff
language : en
Publisher: Springer Science & Business Media
Release Date : 2005
High Dielectric Constant Materials written by Howard Huff and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Science categories.
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Handbook Of Low And High Dielectric Constant Materials And Their Applications Materials And Processing
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Author : Hari Singh Nalwa
language : en
Publisher:
Release Date : 1999
Handbook Of Low And High Dielectric Constant Materials And Their Applications Materials And Processing written by Hari Singh Nalwa and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Dielectrics categories.