Advanced Microlithography Technologies
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Advanced Microlithography Technologies
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Author : Yangyuan Wang
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 2005
Advanced Microlithography Technologies written by Yangyuan Wang and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2018-10-03
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-10-03 with Technology & Engineering categories.
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Handbook Of Microlithography Micromachining And Microfabrication Micromachining And Microfabrication
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Author : P. Rai-Choudhury
language : en
Publisher: SPIE Press
Release Date : 1997
Handbook Of Microlithography Micromachining And Microfabrication Micromachining And Microfabrication written by P. Rai-Choudhury and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Technology & Engineering categories.
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Optical Imaging In Projection Microlithography
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Author : Alfred Kwok-Kit Wong
language : en
Publisher: SPIE Press
Release Date : 2005
Optical Imaging In Projection Microlithography written by Alfred Kwok-Kit Wong and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
America S Dual Use Technology Future
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Author : United States. Congress. House. Committee on Science, Space, and Technology. Subcommittee on Technology, Environment, and Aviation
language : en
Publisher:
Release Date : 1994
America S Dual Use Technology Future written by United States. Congress. House. Committee on Science, Space, and Technology. Subcommittee on Technology, Environment, and Aviation and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Business & Economics categories.
Usitc Publication
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Author :
language : en
Publisher:
Release Date : 1997
Usitc Publication written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with categories.
Principles Of Lithography
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Author : Harry J. Levinson
language : en
Publisher: SPIE Press
Release Date : 2005
Principles Of Lithography written by Harry J. Levinson and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Fundamental Principles Of Optical Lithography
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Author : Chris Mack
language : en
Publisher: John Wiley & Sons
Release Date : 2008-03-11
Fundamental Principles Of Optical Lithography written by Chris Mack and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-03-11 with Technology & Engineering categories.
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Concise Polymeric Materials Encyclopedia
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Author : Joseph C. Salamone
language : en
Publisher: CRC Press
Release Date : 1998-08-28
Concise Polymeric Materials Encyclopedia written by Joseph C. Salamone and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-08-28 with Technology & Engineering categories.
Concise Polymeric Materials Encyclopedia culls the most used, widely applicable articles from the Polymeric Materials Encyclopedia - more than 1,100 - and presents them to you in a condensed, well-ordered format. Featuring contributions from more than 1,800 scientists from all over the world, the book discusses a vast array of subjects related to the: synthesis, properties, and applications of polymeric materials development of modern catalysts in preparing new or modified polymers modification of existing polymers by chemical and physical processes biologically oriented polymers This comprehensive, easy-to-use resource on modern polymeric materials serves as an invaluable addition to reference collections in the polymer field.