Optical Imaging In Projection Microlithography
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Optical Imaging In Projection Microlithography
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Author : Alfred Kwok-Kit Wong
language : en
Publisher: SPIE Press
Release Date : 2005
Optical Imaging In Projection Microlithography written by Alfred Kwok-Kit Wong and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Fundamental Principles Of Optical Lithography
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Author : Chris Mack
language : en
Publisher: John Wiley & Sons
Release Date : 2011-08-10
Fundamental Principles Of Optical Lithography written by Chris Mack and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-08-10 with Technology & Engineering categories.
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Handbook Of Algorithms For Physical Design Automation
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Author : Charles J. Alpert
language : en
Publisher: CRC Press
Release Date : 2008-11-12
Handbook Of Algorithms For Physical Design Automation written by Charles J. Alpert and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-11-12 with Computers categories.
The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Matrix Methods For Optical Layout
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Author : Gerhard Kloos
language : en
Publisher: SPIE Press
Release Date : 2007
Matrix Methods For Optical Layout written by Gerhard Kloos and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Mathematics categories.
This book is intended to familiarize the reader with the method of Gaussian matrices and some related tools of optical design. The matrix method provides a means to study an optical system in the paraxial approximation. This text contains new results such as theorems on the design of variable optics, on integrating rods, on the optical layout of prism devices, etc. The results are derived in a step-by-step way so that the reader might apply the methods presented here to resolve design problems with ease.
Introduction To Confocal Fluorescence Microscopy
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Author : Michiel Muller
language : en
Publisher: SPIE Press
Release Date : 2006
Introduction To Confocal Fluorescence Microscopy written by Michiel Muller and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Science categories.
This book provides a comprehensive account of the theory of image formation in a confocal fluorescence microscope as well as a practical guideline to the operation of the instrument, its limitations, and the interpretation of confocal microscopy data. The appendices provide a quick reference to optical theory, microscopy-related formulas and definitions, and Fourier theory.
Fundamentals Of Polarimetric Remote Sensing
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Author : John Robert Schott
language : en
Publisher: SPIE Press
Release Date : 2009
Fundamentals Of Polarimetric Remote Sensing written by John Robert Schott and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Science categories.
This text is for those who need an introduction to polarimetric signals to begin working in the field of polarimetric remote sensing, particularly where the contrast between manmade objects and natural backgrounds are the subjects of interest. The book takes a systems approach to the physical processes involved with formation, collection, and analysis of polarimetric remote sensing data in the visible through longwave infrared. (pBRDF) is then introduced as a way to characterize the reflective and emissive polarimetric behavior of materials. With Dr. Schott's text, you will gain an introduction to polarimetric remote sensing, an appreciation of its issues, and the tools to begin to work in the field.
Applied Digital Optics
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Author : Bernard C. Kress
language : en
Publisher: John Wiley & Sons
Release Date : 2009-11-04
Applied Digital Optics written by Bernard C. Kress and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-11-04 with Science categories.
Miniaturization and mass replications have begun to lead the optical industry in the transition from traditional analog to novel digital optics. As digital optics enter the realm of mainstream technology through the worldwide sale of consumer electronic devices, this timely book aims to present the topic of digital optics in a unified way. Ranging from micro-optics to nanophotonics, and design to fabrication through to integration in final products, it reviews the various physical implementations of digital optics in either micro-refractives, waveguide (planar lightwave chips), diffractive and hybrid optics or sub-wavelength structures (resonant gratings, surface plasmons, photonic crystals and metamaterials). Finally, it presents a comprehensive list of industrial and commercial applications that are taking advantage of the unique properties of digital optics. Applied Digital Optics is aimed primarily at optical engineers and product development and technical marketing managers; it is also of interest to graduate-level photonics students and micro-optic foundries. Helps optical engineers review and choose the appropriate software tools to design, model and generate fabrication files. Gives product managers access to an exhaustive list of applications available in today’s market for integrating such digital optics, as well as where the next potential application of digital optics might be. Provides a broad view for technical marketing managers in all aspects of digital optics, and how such optics can be classified. Explains the numerical implementation of optical design and modelling techniques. Enables micro-optics foundries to integrate the latest fabrication and replication techniques, and accordingly fine tune their own fabrication processes.
Optical Microlithography
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Author :
language : en
Publisher:
Release Date : 2000
Optical Microlithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Integrated circuits categories.
Computational Lithography
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Author : Xu Ma
language : en
Publisher: John Wiley & Sons
Release Date : 2011-01-06
Computational Lithography written by Xu Ma and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-01-06 with Technology & Engineering categories.
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Handbook Of Microlithography Micromachining And Microfabrication Microlithography
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Author : P. Rai-Choudhury
language : en
Publisher: SPIE Press
Release Date : 1997
Handbook Of Microlithography Micromachining And Microfabrication Microlithography written by P. Rai-Choudhury and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Technology & Engineering categories.
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.