Optical Imaging In Projection Microlithography

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Optical Imaging In Projection Microlithography

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Author : Alfred Kwok-Kit Wong
language : en
Publisher: SPIE Press
Release Date : 2005

Optical Imaging In Projection Microlithography written by Alfred Kwok-Kit Wong and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.

Resolution Enhancement Techniques In Optical Lithography

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Author : Alfred Kwok-Kit Wong
language : en
Publisher: SPIE Press
Release Date : 2001

Resolution Enhancement Techniques In Optical Lithography written by Alfred Kwok-Kit Wong and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Science categories.

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers

Investigation Of A Focused Image Lens Hologram Projection System For Microlithography

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Author : Ginetto Addiego
language : en
Publisher:
Release Date : 1989

Investigation Of A Focused Image Lens Hologram Projection System For Microlithography written by Ginetto Addiego and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with categories.

Evanescent Wave Assist Features For Optical Projection Lithography

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Author : Neal Vincent Lafferty
language : en
Publisher:
Release Date : 2011

Evanescent Wave Assist Features For Optical Projection Lithography written by Neal Vincent Lafferty and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with Microlithography categories.

"Evanescent Wave Assist Features (EWAFs) are features that are sensitive to near-field radiation that modify diffracted order intensities from photomask patterns. In implementations studied in this thesis, the EWAFs increase a transmitting feature's image contrast and Normalized Image Log Slope (NILS). In this way, the EWAFs are a way to improve image fidelity for high-resolution features. the assist features consist of local, buried grooves located around transmitting mask regions. These grooves reside in otherwise unused areas, since they are located under or on top of opaque mask absorber regions. In these 'buried' locations, they are not optically visible to the lithographic system in a traditional sense. Designs are explored for both top-surface and bottom-surface EWAFs on 1-D and 2-D layouts. Using EWAFs, 27% image contrast improvements have been shown on contact layouts, as well as best-case image contrast improvements of over 2X on 1-D slot-type mask layouts. Dependence of EWAF effect on mask absorber material and bottom-surface relief shape is studied, as well as polarization sensitivity and the role of Surface Plasmon Polaritons (SPP). TM polarized light creates a normal-component field enhancement that amplifies surface waves across suitably conductive absorbers. These waves can then interact with bottom-surface EWAF grooves, and convert to propagating based on grating action. The converted orders may then interact with standard transmitted orders from a transmission feature, resulting in enhancement or suppression, depending on EWAF tone, pitch regime, and illumination angle. A demonstration EWAF sample, as well as a reference sample with no grooves, was fabricated at the RIT SMFL and tested using a Variable Angle Spectroscopic Ellipsometer (VASE). Accounting for pitch deviations during fabrication, as well as lateral inter-layer alignment offsets gives diffracted order responses that agree with SPP resonances observed in the samples at normal incidence and diffracted order enhancement factors that agree with simulation."--Abstract.

Microlithography

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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01

Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.

The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Fundamental Principles Of Optical Lithography

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Author : Chris Mack
language : en
Publisher: John Wiley & Sons
Release Date : 2011-08-10

Fundamental Principles Of Optical Lithography written by Chris Mack and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-08-10 with Technology & Engineering categories.

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Selected Papers On Optical Microlithography

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Author : Harry L. Stover
language : en
Publisher:
Release Date : 1992

Selected Papers On Optical Microlithography written by Harry L. Stover and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Masks (Electronics). categories.

SPIE Milestones are collections of seminal papers from the world literature covering important discoveries and developments in optics and photonics.

Optical Compressive Imaging

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Author : Adrian Stern
language : en
Publisher: CRC Press
Release Date : 2016-11-17

Optical Compressive Imaging written by Adrian Stern and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-11-17 with Mathematics categories.

This dedicated overview of optical compressive imaging addresses implementation aspects of the revolutionary theory of compressive sensing (CS) in the field of optical imaging and sensing. It overviews the technological opportunities and challenges involved in optical design and implementation, from basic theory to optical architectures and systems for compressive imaging in various spectral regimes, spectral and hyperspectral imaging, polarimetric sensing, three-dimensional imaging, super-resolution imaging, lens-free, on-chip microscopy, and phase sensing and retrieval. The reader will gain a complete introduction to theory, experiment, and practical use for reducing hardware, shortening image scanning time, and improving image resolution as well as other performance parameters. Optics practitioners and optical system designers, electrical and optical engineers, mathematicians, and signal processing professionals will all find the book a unique trove of information and practical guidance.

Special Section On Optical Imaging

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Author : Gabriele Gratton
language : en
Publisher:
Release Date : 2003

Special Section On Optical Imaging written by Gabriele Gratton and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with categories.

Computational Lithography

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Author : Xu Ma
language : en
Publisher: John Wiley & Sons
Release Date : 2011-01-06

Computational Lithography written by Xu Ma and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-01-06 with Technology & Engineering categories.

A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.